CAD utilities to comprehend layout-dependent stress effects in 45 nm high- performance SOI custom macro design - researchr publication authors

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Akif Sultan, John Faricelli, Sushant Suryagandh, Hans vanMeer, Kaveri Mathur, James Pattison, Sean Hannon, Greg Constant, Kalyana Kumar, Kevin Carrejo, Joe Meier, Rasit Onur Topaloglu, Darin Chan, Uwe Hahn, Thorsten Knopp, Victor Andrade, Bill Gardiol, Steve Hejl, David Wu, James Buller, Larry Bair, Ali Icel, Yuri Apanovich. CAD utilities to comprehend layout-dependent stress effects in 45 nm high- performance SOI custom macro design. In 10th International Symposium on Quality of Electronic Design (ISQED 2009), 16-18 March 2009, San Jose, CA, USA. pages 442-446, IEEE, 2009. [doi]

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