Akif Sultan, John Faricelli, Sushant Suryagandh, Hans vanMeer, Kaveri Mathur, James Pattison, Sean Hannon, Greg Constant, Kalyana Kumar, Kevin Carrejo, Joe Meier, Rasit Onur Topaloglu, Darin Chan, Uwe Hahn, Thorsten Knopp, Victor Andrade, Bill Gardiol, Steve Hejl, David Wu, James Buller, Larry Bair, Ali Icel, Yuri Apanovich. CAD utilities to comprehend layout-dependent stress effects in 45 nm high- performance SOI custom macro design. In 10th International Symposium on Quality of Electronic Design (ISQED 2009), 16-18 March 2009, San Jose, CA, USA. pages 442-446, IEEE, 2009. [doi]
@inproceedings{SultanFSvMPHCKCMTCHKAGHWBBIA09,
title = {CAD utilities to comprehend layout-dependent stress effects in 45 nm high- performance SOI custom macro design},
author = {Akif Sultan and John Faricelli and Sushant Suryagandh and Hans vanMeer and Kaveri Mathur and James Pattison and Sean Hannon and Greg Constant and Kalyana Kumar and Kevin Carrejo and Joe Meier and Rasit Onur Topaloglu and Darin Chan and Uwe Hahn and Thorsten Knopp and Victor Andrade and Bill Gardiol and Steve Hejl and David Wu and James Buller and Larry Bair and Ali Icel and Yuri Apanovich},
year = {2009},
doi = {10.1109/ISQED.2009.4810335},
url = {http://dx.doi.org/10.1109/ISQED.2009.4810335},
tags = {layout, macros, design},
researchr = {https://researchr.org/publication/SultanFSvMPHCKCMTCHKAGHWBBIA09},
cites = {0},
citedby = {0},
pages = {442-446},
booktitle = {10th International Symposium on Quality of Electronic Design (ISQED 2009), 16-18 March 2009, San Jose, CA, USA},
publisher = {IEEE},
}