Shuyuan Sun, Fan Yang 0001, Bei Yu 0001, Li Shang, Xuan Zeng 0001. Efficient ILT via Multi-level Lithography Simulation. In 60th ACM/IEEE Design Automation Conference, DAC 2023, San Francisco, CA, USA, July 9-13, 2023. pages 1-6, IEEE, 2023. [doi]
Abstract is missing.