Impact of stress on various circuit characteristics in 65nm PDSOI technology

Sushant Suryagandh, Mayank Gupta, Zhiyuan Wu, Srinath Krishnan, Mario Pelella, Jung-Suk Goo, Ciby Thuruthiyil, Judy X. An, Brian Q. Chen, Niraj Subba, Luis Zamudio, James Yonemura, Ali B. Icel. Impact of stress on various circuit characteristics in 65nm PDSOI technology. In Doris Schmitt-Landsiedel, Tobias Noll, editors, 33rd European Solid-State Circuits Conference, ESSCIRC 2007, Munich, Germany, 11-13 September 2007. pages 119-122, IEEE, 2007. [doi]

Abstract

Abstract is missing.