Process monitoring of deep drawing using machine learning - researchr publication authors

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Tomohiro Tsuruya, Musashi Danseko, Katsuhiko Sasaki, Shinya Honda, Ryo Takeda. Process monitoring of deep drawing using machine learning. In IEEE/ASME International Conference on Advanced Intelligent Mechatronics, AIM 2019, Hong Kong, SAR, China, July 8-12, 2019. pages 1227-1232, IEEE, 2019. [doi]

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