28 nm 50% Power-Reducing Contacted Mask Read Only Memory Macro With 0.72-ns Read Access Time Using 2T Pair Bitcell and Dynamic Column Source Bias Control Technique

Yukiko Umemoto, Koji Nii, Jiro Ishikawa, Makoto Yabuuchi, Kazuyoshi Okamoto, Yasumasa Tsukamoto, Shinji Tanaka, Koji Tanaka, Tetsuya Matsumura, Kazutaka Mori, Kazumasa Yanagisawa. 28 nm 50% Power-Reducing Contacted Mask Read Only Memory Macro With 0.72-ns Read Access Time Using 2T Pair Bitcell and Dynamic Column Source Bias Control Technique. IEEE Trans. VLSI Syst., 22(3):575-584, 2014. [doi]

Abstract

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