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Minimizing hydrogen content in silicon oxynitride by thermal oxidation of silicon-rich silicon nitride

C. K. Wong, H. Wong, M. Chan, C. W. Kok, H. P. Chan. Minimizing hydrogen content in silicon oxynitride by thermal oxidation of silicon-rich silicon nitride. Microelectronics Reliability, 46(12):2056-2061, 2006. [doi]

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C. K. Wong

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H. Wong

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M. Chan

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C. W. Kok

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H. P. Chan

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