Minimizing hydrogen content in silicon oxynitride by thermal oxidation of silicon-rich silicon nitride

C. K. Wong, H. Wong, M. Chan, C. W. Kok, H. P. Chan. Minimizing hydrogen content in silicon oxynitride by thermal oxidation of silicon-rich silicon nitride. Microelectronics Reliability, 46(12):2056-2061, 2006. [doi]

@article{WongWCKC06,
  title = {Minimizing hydrogen content in silicon oxynitride by thermal oxidation of silicon-rich silicon nitride},
  author = {C. K. Wong and H. Wong and M. Chan and C. W. Kok and H. P. Chan},
  year = {2006},
  doi = {10.1016/j.microrel.2006.01.006},
  url = {http://dx.doi.org/10.1016/j.microrel.2006.01.006},
  tags = {C++},
  researchr = {https://researchr.org/publication/WongWCKC06},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {46},
  number = {12},
  pages = {2056-2061},
}