Minimizing hydrogen content in silicon oxynitride by thermal oxidation of silicon-rich silicon nitride

C. K. Wong, H. Wong, M. Chan, C. W. Kok, H. P. Chan. Minimizing hydrogen content in silicon oxynitride by thermal oxidation of silicon-rich silicon nitride. Microelectronics Reliability, 46(12):2056-2061, 2006. [doi]

Abstract

Abstract is missing.