Chen Wu, Adrian Chasin, A. Padovani, Alicja Lesniewska, Steven Demuynck, Kris Croes. Role of Defects in the Reliability of HfO2/Si-Based Spacer Dielectric Stacks for Local Interconnects. In IEEE International Reliability Physics Symposium, IRPS 2019, Monterey, CA, USA, March 31 - April 4, 2019. pages 1-6, IEEE, 2019. [doi]
Abstract is missing.