Barrier and low k polish with a novel alkaline barrier slurry combining with FA/O chelating agent - researchr publication authors

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Jing-Bo Xu, Feng Hui, Wen-Zhong Xu, Xu Wang, Peng-Fei Nan, Yu-ling Liu, Xin-Ping Qu. Barrier and low k polish with a novel alkaline barrier slurry combining with FA/O chelating agent. In IEEE 10th International Conference on ASIC, ASICON 2013, Shenzhen, China, October 28-31, 2013. pages 1-4, IEEE, 2013. [doi]

This author has not been identified. Look up 'Jing-Bo Xu' in GoogleThis author has not been identified. Look up 'Feng Hui' in GoogleThis author has not been identified. Look up 'Wen-Zhong Xu' in GoogleThis author has not been identified. Look up 'Xu Wang' in GoogleThis author has not been identified. Look up 'Peng-Fei Nan' in GoogleThis author has not been identified. Look up 'Yu-ling Liu' in GoogleThis author has not been identified. Look up 'Xin-Ping Qu' in Google

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