Jing-Bo Xu, Feng Hui, Wen-Zhong Xu, Xu Wang, Peng-Fei Nan, Yu-ling Liu, Xin-Ping Qu. Barrier and low k polish with a novel alkaline barrier slurry combining with FA/O chelating agent. In IEEE 10th International Conference on ASIC, ASICON 2013, Shenzhen, China, October 28-31, 2013. pages 1-4, IEEE, 2013. [doi]
@inproceedings{XuFXXNLQ13,
title = {Barrier and low k polish with a novel alkaline barrier slurry combining with FA/O chelating agent},
author = {Jing-Bo Xu and Feng Hui and Wen-Zhong Xu and Xu Wang and Peng-Fei Nan and Yu-ling Liu and Xin-Ping Qu},
year = {2013},
doi = {10.1109/ASICON.2013.6812070},
url = {http://dx.doi.org/10.1109/ASICON.2013.6812070},
researchr = {https://researchr.org/publication/XuFXXNLQ13},
cites = {0},
citedby = {0},
pages = {1-4},
booktitle = {IEEE 10th International Conference on ASIC, ASICON 2013, Shenzhen, China, October 28-31, 2013},
publisher = {IEEE},
isbn = {978-1-4673-6415-7},
}