Jing-Bo Xu, Feng Hui, Wen-Zhong Xu, Xu Wang, Peng-Fei Nan, Yu-ling Liu, Xin-Ping Qu. Barrier and low k polish with a novel alkaline barrier slurry combining with FA/O chelating agent. In IEEE 10th International Conference on ASIC, ASICON 2013, Shenzhen, China, October 28-31, 2013. pages 1-4, IEEE, 2013. [doi]
Abstract is missing.