Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, David Z. Pan. A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography. In Proceedings of the 15th Asia South Pacific Design Automation Conference, ASP-DAC 2010, Taipei, Taiwan, January 18-21, 2010. pages 637-644, IEEE, 2010. [doi]
Abstract is missing.