Contribution of oxide traps on defect creation and LVSILC conduction in ultra thin gate oxide devices

D. Zander, F. Saigné, A. Meinertzhagen, C. Petit. Contribution of oxide traps on defect creation and LVSILC conduction in ultra thin gate oxide devices. Microelectronics Reliability, 43(9-11):1489-1493, 2003. [doi]

@article{ZanderSMP03,
  title = {Contribution of oxide traps on defect creation and LVSILC conduction in ultra thin gate oxide devices},
  author = {D. Zander and F. Saigné and A. Meinertzhagen and C. Petit},
  year = {2003},
  doi = {10.1016/S0026-2714(03)00264-6},
  url = {http://dx.doi.org/10.1016/S0026-2714(03)00264-6},
  tags = {C++},
  researchr = {https://researchr.org/publication/ZanderSMP03},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {43},
  number = {9-11},
  pages = {1489-1493},
}