Contribution of oxide traps on defect creation and LVSILC conduction in ultra thin gate oxide devices

D. Zander, F. Saigné, A. Meinertzhagen, C. Petit. Contribution of oxide traps on defect creation and LVSILC conduction in ultra thin gate oxide devices. Microelectronics Reliability, 43(9-11):1489-1493, 2003. [doi]

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