Rigorous extraction of process variations for 65nm CMOS design

Wei Zhao, Yu Cao 0001, Frank Liu, Kanak Agarwal, Dhruva Acharyya, Sani R. Nassif, Kevin J. Nowka. Rigorous extraction of process variations for 65nm CMOS design. In Doris Schmitt-Landsiedel, Tobias Noll, editors, 33rd European Solid-State Circuits Conference, ESSCIRC 2007, Munich, Germany, 11-13 September 2007. pages 89-92, IEEE, 2007. [doi]

Abstract

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