Investigation on dependency of thermal characteristics on gate/drain bias voltages in stacked nanosheet transistors

Peng Zhao, Lei Cao, Fan Zhang, Haoqing Xu, Weizhuo Gan, Qingzhu Zhang, Zhaohao Zhang, Jiaxin Yao, Guoliang Tian, Kun Luo, Zhenhua Wu, Huaxiang Yin. Investigation on dependency of thermal characteristics on gate/drain bias voltages in stacked nanosheet transistors. Microelectronics Journal, 141:105970, November 2023. [doi]

@article{ZhaoCZXGZZYTLWY23,
  title = {Investigation on dependency of thermal characteristics on gate/drain bias voltages in stacked nanosheet transistors},
  author = {Peng Zhao and Lei Cao and Fan Zhang and Haoqing Xu and Weizhuo Gan and Qingzhu Zhang and Zhaohao Zhang and Jiaxin Yao and Guoliang Tian and Kun Luo and Zhenhua Wu and Huaxiang Yin},
  year = {2023},
  month = {November},
  doi = {10.1016/j.mejo.2023.105970},
  url = {https://doi.org/10.1016/j.mejo.2023.105970},
  researchr = {https://researchr.org/publication/ZhaoCZXGZZYTLWY23},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Journal},
  volume = {141},
  pages = {105970},
}