Simultaneous Layout Migration and Decomposition for Double Patterning Technology

Chin-Hsiung Hsu, Yao-Wen Chang, Sani R. Nassif. Simultaneous Layout Migration and Decomposition for Double Patterning Technology. IEEE Trans. on CAD of Integrated Circuits and Systems, 30(2):284-294, 2011. [doi]

Abstract

Abstract is missing.