Reliability computer-aided design tool for full-chip electromigration analysis and comparison with different interconnect metallizations - researchr publication authors

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Syed M. Alam, Chee Lip Gan, Carl V. Thompson, Donald E. Troxel. Reliability computer-aided design tool for full-chip electromigration analysis and comparison with different interconnect metallizations. Microelectronics Journal, 38(4-5):463-473, 2007. [doi]

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