François Andrieu, Mikaël Casse, E. Baylac, P. Perreau, O. Nier, D. Rideau, R. Berthelon, F. Pourchon, A. Pofelski, B. De Salvo, C. Gallon, Vincent Mazzocchi, D. Barge, C. Gaumer, O. Gourhant, A. Cros, V. Barral, R. Ranica, N. Planes, W. Schwarzenbach, E. Richard, E. Josse, O. Weber, F. Arnaud, Maud Vinet, Olivier Faynot, M. Haond. Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs. In 44th European Solid State Device Research Conference, ESSDERC 2014, Venice Lido, Italy, September 22-26, 2014. pages 106-109, IEEE, 2014. [doi]
Abstract is missing.