The effect of process variation on device temperature in FinFET circuits - researchr publication authors

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Jung Hwan Choi, Jayathi Murthy, Kaushik Roy. The effect of process variation on device temperature in FinFET circuits. In Georges G. E. Gielen, editor, 2007 International Conference on Computer-Aided Design (ICCAD 07), November 5-8, 2007, San Jose, CA, USA. pages 747-751, IEEE, 2007. [doi]

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