Jung Hwan Choi, Jayathi Murthy, Kaushik Roy. The effect of process variation on device temperature in FinFET circuits. In Georges G. E. Gielen, editor, 2007 International Conference on Computer-Aided Design (ICCAD 07), November 5-8, 2007, San Jose, CA, USA. pages 747-751, IEEE, 2007. [doi]
@inproceedings{ChoiMR07, title = {The effect of process variation on device temperature in FinFET circuits}, author = {Jung Hwan Choi and Jayathi Murthy and Kaushik Roy}, year = {2007}, doi = {10.1145/1326073.1326230}, url = {http://doi.acm.org/10.1145/1326073.1326230}, researchr = {https://researchr.org/publication/ChoiMR07}, cites = {0}, citedby = {0}, pages = {747-751}, booktitle = {2007 International Conference on Computer-Aided Design (ICCAD 07), November 5-8, 2007, San Jose, CA, USA}, editor = {Georges G. E. Gielen}, publisher = {IEEE}, isbn = {1-4244-1382-6}, }