The following publications are possibly variants of this publication:
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- Ferroelectric Tunnel Junctions based on Ferroelectric-Dielectric Hf0.5Zr0.5.O2/ A12O3Capacitor StacksBenjamin Max, Michael Hoffmann, Stefan Slesazeck, Thomas Mikolajick. essderc 2018: 142-145 [doi]
- Reducing the tunneling barrier thickness of bilayer ferroelectric tunnel junctions with metallic electrodesSuzanne Lancaster, Mattia Segatto, Cláudia Silva, Benjamin Max, Thomas Mikolajick, David Esseni, Francesco Driussi, Stefan Slesazeck. drc 2023: 1-2 [doi]