Fault isolation of short defect in through silicon via (TSV) based 3D-IC

Daniel H. Jung, Jonghyun Cho, Heegon Kim, Jonghoon J. Kim, Hongseok Kim, Joungho Kim, Hyun-Cheol Bae, Kwang-Seong Choi. Fault isolation of short defect in through silicon via (TSV) based 3D-IC. In 2013 IEEE International 3D Systems Integration Conference (3DIC), San Francisco, CA, USA, October 2-4, 2013. pages 1-4, IEEE, 2013. [doi]

Authors

Daniel H. Jung

This author has not been identified. Look up 'Daniel H. Jung' in Google

Jonghyun Cho

This author has not been identified. Look up 'Jonghyun Cho' in Google

Heegon Kim

This author has not been identified. Look up 'Heegon Kim' in Google

Jonghoon J. Kim

This author has not been identified. Look up 'Jonghoon J. Kim' in Google

Hongseok Kim

This author has not been identified. Look up 'Hongseok Kim' in Google

Joungho Kim

This author has not been identified. Look up 'Joungho Kim' in Google

Hyun-Cheol Bae

This author has not been identified. Look up 'Hyun-Cheol Bae' in Google

Kwang-Seong Choi

This author has not been identified. Look up 'Kwang-Seong Choi' in Google