Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Yao. Layout decomposition for double patterning lithography. In Sani R. Nassif, Jaijeet S. Roychowdhury, editors, 2008 International Conference on Computer-Aided Design (ICCAD 08), November 10-13, 2008, San Jose, CA, USA. pages 465-472, IEEE, 2008. [doi]
@inproceedings{KahngPXY08,
title = {Layout decomposition for double patterning lithography},
author = {Andrew B. Kahng and Chul-Hong Park and Xu Xu and Hailong Yao},
year = {2008},
doi = {10.1145/1509456.1509563},
url = {http://doi.acm.org/10.1145/1509456.1509563},
tags = {layout},
researchr = {https://researchr.org/publication/KahngPXY08},
cites = {0},
citedby = {0},
pages = {465-472},
booktitle = {2008 International Conference on Computer-Aided Design (ICCAD 08), November 10-13, 2008, San Jose, CA, USA},
editor = {Sani R. Nassif and Jaijeet S. Roychowdhury},
publisher = {IEEE},
isbn = {978-1-4244-2820-5},
}