Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Yao. Layout decomposition for double patterning lithography. In Sani R. Nassif, Jaijeet S. Roychowdhury, editors, 2008 International Conference on Computer-Aided Design (ICCAD 08), November 10-13, 2008, San Jose, CA, USA. pages 465-472, IEEE, 2008. [doi]
Abstract is missing.