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Youngmin Kim, Dusan Petranovic, Dennis Sylvester. Simple and Accurate Models for Capacitance Considering Floating Metal Fill Insertion. IEEE Trans. VLSI Syst., 17(8):1166-1170, 2009. [doi]
Possibly Related PublicationsThe following publications are possibly variants of this publication: Simple and Accurate Models for Capacitance Increment due to Metal Fill InsertionYoungmin Kim, Dusan Petranovic, Dennis Sylvester. aspdac 2007: 456-461 [doi] Investigation of the capacitance deviation due to metal-fills and the effective interconnect geometry modelingWon-Seok Lee, Keun-Ho Lee, Jin-Kyu Park, Tae-Kyung Kim, Young-Kwan Park, Jeong-Taek Kong. isqed 2003: 373-376 [doi]
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