Scaling Behaviour of State-to-State Coupling During Hole Trapping at Si/SiO2

Xiaolei Ma, Xiangwei Jiang, Jiezhi Chen, Liwei Wang 0003, Yunfei En. Scaling Behaviour of State-to-State Coupling During Hole Trapping at Si/SiO2. In IEEE International Reliability Physics Symposium, IRPS 2019, Monterey, CA, USA, March 31 - April 4, 2019. pages 1-4, IEEE, 2019. [doi]

Abstract

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