The following publications are possibly variants of this publication:
- Characteristics of ZnO thin films prepared by radio frequency magnetron sputteringPing-Feng Yang, Hua-Chiang Wen, Sheng-Rui Jian, Yi-Shao Lai, Sean Wu, Rong-Sheng Chen. mr, 48(3):389-394, 2008. [doi]
- Properties of transparent conductive ZnO: Al thin films prepared by magnetron sputteringEn-Gang Fu, Da-Ming Zhuang, Gong Zhang, Zhao Ming, Wei-Fang Yang, Jia-Jun Liu. mj, 35(4):383-387, 2004. [doi]
- x High-Entropy Films Prepared by RF Magnetron SputteringQiuwei Xing, Haijiang Wang, Mingbiao Chen, Zhaoyun Chen, Rongbin Li, Peipeng Jin, Yong Zhang 0003. entropy, 21(4):396, 2019. [doi]
- Preparation and performance study of TiN films deposited by MF unbalanced magnetron sputtering techniqueY. C. Zhang, Y. F. Wu, S. G. Ma, S. N. Sun, Y. Zhou, M. Geng. ijcat, 29(2/3/4):173-177, 2007. [doi]
- ZnO thin films produced by the RF magnetron sputteringHuawa Yu, Jing Wang, Yangan Yan, Xin Wang, Bin Gao, Hanchen Liu, Yali Du. emeit 2011: 2486-2489 [doi]