Steven J. Holmes - researchr alias

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Viewing Publication 1 - 5 from 5

1997

Manufacturing with DUV lithographySteven J. Holmes, Peter H. Mitchell, Mark C. Hakey. ibmrd, 41(1&2):7-20, 1997. [doi]

Negative photoresists for optical lithographyJane M. Shaw, Jeffrey D. Gelorme, Nancy C. LaBianca, Will E. Conley, Steven J. Holmes. ibmrd, 41(1&2):81-94, 1997. [doi]

1995

The evolution of IBM CMOS DRAM technologyEric Adler, John K. DeBrosse, Stephen F. Geissler, Steven J. Holmes, Mark D. Jaffe, Jeffrey B. Johnson, Charles W. Koburger III, Jerome B. Lasky, Brian Lloyd, Glen L. Miles, James S. Nakos, Wendell P. Noble Jr., Steven H. Voldman, Michael Armacost, Richard Ferguson. ibmrd, 39(1-2):167-188, 1995. [doi]

Overview of gate linewidth control in the manufacture of CMOS logic chipsDonald G. Chesebro, James W. Adkisson, Lyman R. Clark, Steven N. Eslinger, Margaret A. Faucher, Steven J. Holmes, Raymond P. Mallette, Edward J. Nowak, Edward W. Sengle, Steven H. Voldman, Thomas W. Weeks. ibmrd, 39(1-2):189-200, 1995.

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