The following publications are possibly variants of this publication:
- Methodology for Standard Cell Compliance and Detailed Placement for Triple Patterning LithographyBei Yu, Xiaoqing Xu, Jhih-Rong Gao, Yibo Lin, Zhuo Li 0001, Charles J. Alpert, David Z. Pan. tcad, 34(5):726-739, 2015. [doi]
- Triple patterning lithography aware optimization for standard cell based designJian Kuang 0001, Wing-Kai Chow, Evangeline F. Y. Young. iccad 2014: 108-115 [doi]