On the role of holes in oxide breakdown mechanism in inverted nMOSFETs

F. Monsieur, E. Vincent, V. Huard, S. Bruyère, D. Roy, Thomas Skotnicki, G. Pananakakis, G. Ghibaudo. On the role of holes in oxide breakdown mechanism in inverted nMOSFETs. Microelectronics Reliability, 43(8):1199-1202, 2003. [doi]

@article{MonsieurVHBRSPG03,
  title = {On the role of holes in oxide breakdown mechanism in inverted nMOSFETs},
  author = {F. Monsieur and E. Vincent and V. Huard and S. Bruyère and D. Roy and Thomas Skotnicki and G. Pananakakis and G. Ghibaudo},
  year = {2003},
  doi = {10.1016/S0026-2714(03)00172-0},
  url = {http://dx.doi.org/10.1016/S0026-2714(03)00172-0},
  tags = {e-science},
  researchr = {https://researchr.org/publication/MonsieurVHBRSPG03},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {43},
  number = {8},
  pages = {1199-1202},
}