| 3 | -- | 6 | George L.-T. Chiu, Jane M. Shaw. Optical lithography: Introduction |
| 7 | -- | 20 | Steven J. Holmes, Peter H. Mitchell, Mark C. Hakey. Manufacturing with DUV lithography |
| 21 | -- | 38 | Christopher P. Ausschnitt, Allan C. Thomas, Timothy J. Wiltshire. Advanced DUV photolithography in a pilot lineenvironment |
| 39 | -- | 48 | Rama N. Singh, Alan E. Rosenbluth, George L.-T. Chiu, J. S. Wilczynski. High-numerical-aperture optical designs |
| 49 | -- | 56 | Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek. Lithography at a wavelength of 193 nm |
| 57 | -- | 68 | Timothy A. Brunner. Impact of lens aberrations on optical lithography |
| 69 | -- | 80 | Hiroshi Ito. Chemical amplification resists: History and development within IBM |
| 81 | -- | 94 | Jane M. Shaw, Jeffrey D. Gelorme, Nancy C. LaBianca, Will E. Conley, Steven J. Holmes. Negative photoresists for optical lithography |
| 95 | -- | 104 | Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz. Photoresists for 193-nm lithography |
| 105 | -- | 118 | David E. Seeger, Douglas C. La Tulipe Jr., Roderick R. Kunz, Cesar M. Garza, Maureen A. Hanratty. Thin-film imaging: Past, present, prognosis |
| 119 | -- | 130 | Russell A. Budd, Derek B. Dove, John L. Staples, Ronald M. Martino, Richard A. Ferguson, J. Tracy Weed. Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS |
| 131 | -- | 142 | Fuad E. Doany, Thomas Ainsworth, Norman Bobroff, Douglas Goodman, Alan E. Rosenbluth. Large-field scanning laser ablation system |
| 143 | -- | 150 | James L. Speidell, Doris P. Pulaski, Rajesh S. Patel. Masks for laser ablation technology: New requirements and challenges |
| 151 | -- | 158 | Fuad E. Doany, Chandrasekhar Narayanaswami. Laser release process to obtain freestanding multilayer metal-polyimide circuits |
| 159 | -- | 170 | Hans A. Biebuyck, Niels B. Larsen, Emmanuel Delamarche, Bruno Michel. Lithography beyond light: Microcontact printing with monolayer resists |
| 171 | -- | 184 | Anshul Gupta. Fast and effective algorithms for graph partitioning and sparse-matrix ordering |