Journal: IBM Journal of Research and Development

Volume 41, Issue 6

651 -- 668Jack L. Zable, Ho Chong Lee. An overview of impact printing
669 -- 678Mikel J. Stanich. Print-quality enhancement in electrophotographic printers
679 -- 692Scott D. Mastie. Use of the transform exit sequence in printing and as a framework for the solution of complex problems
693 -- 704Yehuda Bassok, Ann Bixby, Ramesh Srinivasan, Harry Z. Wiesel. Design of component-supply contract with commitment-revision flexibility
705 -- 710René J. Glaise. A two-step computation of cyclic redundancy code CRC-32 for ATM networks
711 -- 726Sivan Toledo. Improving the memory-system performance of sparse-matrix vector multiplication
727 -- 736Manuel Alfonseca, Alfonso Ortega. A study of the representation of fractal curves by L systems and their equivalences
737 -- 756Fred G. Gustavson. Recursion leads to automatic variable blocking for dense linear-algebra algorithms

Volume 41, Issue 4&5

397 -- 404Gururaj S. Rao, Thomas A. Gregg, Cyril A. Price, Chitta L. Rao, Steven J. Repka. IBM S/390 Parallel Enterprise Servers G3 and G4
405 -- 428Gerhard Döttling, Klaus Joerg Getzlaff, Bernd Leppla, Walter Lipponer, Thomas Pflueger, Thomas Schlipf, Dietmar Schmunkamp, Udo Wille. S/390 Parallel Enterprise Server Generation 3: A balanced system and cache structure
429 -- 448Pak-kin Mak, Michael A. Blake, Christine C. Jones, Gary E. Strait, Paul R. Turgeon. Shared-cache clusters in a system with a fully shared memory
449 -- 462Thomas A. Gregg. S/390 CMOS server I/O: The continuing evolution
463 -- 474Charles F. Webb, John S. Liptay. A high-frequency custom CMOS S/390 microprocessor
475 -- 488Eric M. Schwarz, Leon J. Sigal, Thomas J. McPherson. CMOS floating-point unit for the S/390 Parallel Enterprise Server G4
489 -- 504Leon J. Sigal, James D. Warnock, Brian W. Curran, Yuen H. Chan, Peter J. Camporese, Mark D. Mayo, William V. Huott, Daniel R. Knebel, Ching-Te Chuang, James P. Eckhardt, Philip T. Wu. Circuit design techniques for the high-performance CMOS IBM S/390 Parallel Enterprise Server G4 microprocessor
505 -- 514Bernhard Kick, Ulrich Baur, Jürgen Koehl, Thomas Ludwig 0004, Thomas Pflueger. Standard-cell-based design methodology for high-performance support chips
515 -- 548Kenneth L. Shepard, Sean M. Carey, Ee Kin Cho, Brian W. Curran, Robert F. Hatch, Dale E. Hoffman, Scott A. McCabe, Gregory A. Northrop, A. E. (Rick) Seigler. Design methodology for the S/390 Parallel Enterprise Server G4 microprocessors
549 -- 566Bruce Wile, Michael P. Mullen, Cara Hanson, Dean G. Bair, Kevin M. Lasko, Patrick J. Duffy, Edward J. Kaminski Jr., Thomas E. Gilbert, Steven M. Licker, Robert G. Sheldon, William D. Wollyung, William J. Lewis, Robert J. Adkins. Functional verification of the CMOS S/390 Parallel Enterprise Server G4 system
567 -- 576Thomas Schlipf, Thomas Buechner, Rolf Fritz, Markus M. Helms, Juergen Koehl. Formal verification made easy
577 -- 580Stefan Koerner, Steven M. Licker. Run-control and service element code simulation for the S/390 microprocessor
581 -- 592Bruce Wile. Designer-level verification using TIMEDIAG/GENRAND
593 -- 600Gary A. Van Huben. The role of two-cycle simulation in the S/390 verification process
601 -- 610Gary G. Hallock, Edward J. Kaminski Jr., Kevin M. Lasko, Michael P. Mullen. SimAPI - A common programming interface for simulation
611 -- 628William V. Huott, Timothy J. Koprowski, Bryan J. Robbins, Mary P. Kusko, Stephen Pateras, Dale E. Hoffman, Timothy G. McNamara, Thomas J. Snethen. Advanced microprocessor test strategy and methodology

Volume 41, Issue 4&5

395 -- 396Ross A. Mauri. Preface

Volume 41, Issue 3

204 -- 204Pradip Bose. Preface
205 -- 214David R. Kaeli, Liana L. Fong, Richard C. Booth, Kerry C. Imming, Joseph P. Weigel. Performance analysis on a CC-NUMA prototype
215 -- 232Philip G. Emma. Understanding some simple processor-performance limits
233 -- 264Vivek Sarkar. Automatic selection of high-order transformations in the IBM XL FORTRAN compilers
265 -- 286Mark J. Charney, Thomas R. Puzak. Prefetching and memory system behavior of the SPEC95 benchmark suite
287 -- 302Jaime H. Moreno, Mayan Moudgill, Kemal Ebcioglu, Erik R. Altman, C. Brian Hall, Rene Miranda, Shyh-Kwei Chen, Arkady Polyak. Simulation/evaluation environment for a VLIW processor architecture
303 -- 330José E. Moreira, Vijay K. Naik. Dynamic resource management on distributed systems using reconfigurable applications
331 -- 344Peter A. Sandon, Yu-Chung Liao, Thomas E. Cook, David M. Schultz, Pedro Martin-de-Nicolas. NStrace: A bus-driven instruction trace tool for PowerPC microprocessors
345 -- 356Frank E. Levine, Charles P. Roth. A programmer s view of performance monitoring in the PowerPC microprocessor
357 -- 366Redha M. Bournas. Optimization of TCP segment size for file transfer

Volume 41, Issue 1&2

3 -- 6George L.-T. Chiu, Jane M. Shaw. Optical lithography: Introduction
7 -- 20Steven J. Holmes, Peter H. Mitchell, Mark C. Hakey. Manufacturing with DUV lithography
21 -- 38Christopher P. Ausschnitt, Allan C. Thomas, Timothy J. Wiltshire. Advanced DUV photolithography in a pilot lineenvironment
39 -- 48Rama N. Singh, Alan E. Rosenbluth, George L.-T. Chiu, J. S. Wilczynski. High-numerical-aperture optical designs
49 -- 56Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek. Lithography at a wavelength of 193 nm
57 -- 68Timothy A. Brunner. Impact of lens aberrations on optical lithography
69 -- 80Hiroshi Ito. Chemical amplification resists: History and development within IBM
81 -- 94Jane M. Shaw, Jeffrey D. Gelorme, Nancy C. LaBianca, Will E. Conley, Steven J. Holmes. Negative photoresists for optical lithography
95 -- 104Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz. Photoresists for 193-nm lithography
105 -- 118David E. Seeger, Douglas C. La Tulipe Jr., Roderick R. Kunz, Cesar M. Garza, Maureen A. Hanratty. Thin-film imaging: Past, present, prognosis
119 -- 130Russell A. Budd, Derek B. Dove, John L. Staples, Ronald M. Martino, Richard A. Ferguson, J. Tracy Weed. Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS
131 -- 142Fuad E. Doany, Thomas Ainsworth, Norman Bobroff, Douglas Goodman, Alan E. Rosenbluth. Large-field scanning laser ablation system
143 -- 150James L. Speidell, Doris P. Pulaski, Rajesh S. Patel. Masks for laser ablation technology: New requirements and challenges
151 -- 158Fuad E. Doany, Chandrasekhar Narayanaswami. Laser release process to obtain freestanding multilayer metal-polyimide circuits
159 -- 170Hans A. Biebuyck, Niels B. Larsen, Emmanuel Delamarche, Bruno Michel. Lithography beyond light: Microcontact printing with monolayer resists
171 -- 184Anshul Gupta. Fast and effective algorithms for graph partitioning and sparse-matrix ordering