The following publications are possibly variants of this publication:
- STOMA: Simultaneous Template Optimization and Mask Assignment for Directed Self-Assembly Lithography With Multiple PatterningJian Kuang 0001, Junjie Ye, Evangeline F. Y. Young. tcad, 37(6):1251-1264, 2018. [doi]
- Fast mask assignment using positive semidefinite relaxation in LELECUT triple patterning lithographyYukihide Kohira, Tomomi Matsui, Yoko Yokoyama, Chikaaki Kodama, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka. aspdac 2015: 665-670 [doi]
- Simultaneous template optimization and mask assignment for DSA with multiple patterningJian Kuang 0001, Junjie Ye, Evangeline F. Y. Young. aspdac 2016: 75-82 [doi]
- Optimization for Multiple Patterning Lithography with cutting process and beyondJian Kuang 0001, Evangeline F. Y. Young. date 2016: 43-48 [doi]