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Publications by 'S. Brus'

Publications

Viewing Publication 1 - 6 from 6

2024

Vt Fine-Tuning in Multi-Vt Gate-All-Around Nanosheet nFETs Using Rare-Earth Oxide-Based Dipole-First Gate Stack Compatible with CFET IntegrationHiroaki Arimura, Hans Mertens, Jacopo Franco, L. Lukose, W. Maqsood, S. Brus, Thomas Chiarella, A. Impagnatiello, S. Homkar, V. K. Mootheri, C. Yin, G. Alessio Verni, M. Givens, L. Petersen Barbosa Lima, S. Biesemans, N. Horiguchi. vlsit 2024: 1-2 [doi]

DRAM-Peri FinFET - A Thermally-Stable High-Performance Advanced CMOS RMG Platform with Mo-Based pWFM for sub-10nm DRAMJ. Ganguly, Hiroaki Arimura, Romain Ritzenthaler, H. Bana, J. W. Maes, J. G. Lai, S. Brus, W. Maqsood, R. Sarkar, B. Kannan, Elena Capogreco, V. Machkaoutsan, S. Yoon, Alessio Spessot, M. Givens, Naoto Horiguchi. vlsit 2024: 1-2 [doi]

2023

Molybdenum Nitride as a Scalable and Thermally Stable pWFM for CFETHiroaki Arimura, S. Brus, Jacopo Franco, Y. Oniki, A. Vandooren, T. Conard, B. T. Chan, B. Kannan, M. Samiee, W. Li, P. Deminskyi, E. Shero, J. Bakke, N. Jourdan, G. Alessio Verni, J. W. Maes, M. Givens, Lars-Åke Ragnarsson, Jérôme Mitard, E. Dentoni Litta, N. Horiguchi. vlsit 2023: 1-2 [doi]

Novel Low Thermal Budget CMOS RMG: Performance and Reliability Benchmark Against Conventional High Thermal Budget Gate Stack SolutionsJacopo Franco, Hiroaki Arimura, J.-F. de Marneffe, S. Brus, Romain Ritzenthaler, E. Dentoni Litta, Kris Croes, Ben Kaczer, N. Horiguchi. vlsit 2023: 1-2 [doi]

2017

WS2 transistors on 300 mm wafers with BEOL compatibilityTom Schram, Quentin Smets, B. Groven, M. H. Heyne, E. Kunnen, A. Thiam, K. Devriendt, Annelies Delabie, Dennis Lin, M. Lux, Daniele Chiappe, I. Asselberghs, S. Brus, Cedric Huyghebaert, S. Sayan, A. Juncker, Matty Caymax, Iuliana P. Radu. essderc 2017: 212-215 [doi]

2009

Migrating from planar to FinFET for further CMOS scaling: SOI or bulk?Thomas Chiarella, Liesbeth Witters, Abdelkarim Mercha, C. Kerner, R. Dittrich, Michal Rakowski, C. Ortolland, L.-Å. Ragnarsson, Bertrand Parvais, A. De Keersgieter, S. Kubicek, A. Redolfi, R. Rooyackers, C. Vrancken, S. Brus, A. Lauwers, Philippe Absil, S. Biesemans, Thomas K. Hoffmann. esscirc 2009: 84-87 [doi]

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