Researchr is a web site for finding, collecting, sharing, and reviewing scientific publications, for researchers by researchers.
Sign up for an account to create a profile with publication list, tag and review your related work, and share bibliographies with your co-authors.
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Yao. Layout Decomposition Approaches for Double Patterning Lithography. IEEE Trans. on CAD of Integrated Circuits and Systems, 29(6):939-952, 2010. [doi]
Possibly Related PublicationsThe following publications are possibly variants of this publication: Layout decomposition for double patterning lithographyAndrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Yao. iccad 2008: 465-472 [doi] Fast and scalable parallel layout decomposition in double patterning lithographyWei Zhao, Hailong Yao, Yici Cai, Subarna Sinha, Charles Chiang. integration, 47(2):175-183, 2014. [doi]
The following publications are possibly variants of this publication: