Journal: Microelectronics Reliability

Volume 42, Issue 9-11

1249 -- 0Fausto Fantini, Massimo Vanzi. Editorial
1251 -- 1258H. Iwai, S. Ohmi. Trend of CMOS downsizing and its reliability
1259 -- 1266Michael G. Pecht, Diganta Das, Arun Ramakrishnan. The IEEE standards on reliability program and reliability prediction methods for electronic equipment
1267 -- 1274Wolfgang Stadler, K. Esmark, Harald Gossner, M. Streibl, M. Wendel, Wolfgang Fichtner, Dionyz Pogany, Martin Litzenberger, E. Gornik. Device Simulation and Backside Laser Interferometry--Powerful Tools for ESD Protection Development
1275 -- 1280F. Zängl, Harald Gossner, K. Esmark, R. Owen, G. Zimmermann. Case study of a technology transfer causing ESD problems
1281 -- 1286M. Blaho, Dionyz Pogany, L. Zullino, A. Andreini, E. Gornik. Experimental and simulation analysis of a BCD ESD protection element under the DC and TLP stress conditions
1287 -- 1292M. S. B. Sowariraj, Theo Smedes, Cora Salm, Ton J. Mouthaan, Fred G. Kuper. The influence of technology variation on ggNMOSTs and SCRs against CDM BSD stress
1293 -- 1298Gaudenzio Meneghesso, A. Cocco, G. Mura, Simona Podda, Massimo Vanzi. Backside Failure Analysis of GaAs ICs after ESD tests
1299 -- 1302P. Galy, V. Berland, B. Foucher, A. Guilhaume, J. P. Chante, S. Bardy, F. Blanc. Experimental and 3D simulation correlation of a gg-nMOS transistor under high current pulse
1303 -- 1306L. Sponton, L. Cerati, G. Croce, G. Mura, Simona Podda, Massimo Vanzi, Gaudenzio Meneghesso, Enrico Zanoni. ESD protection structures for 20 V and 40 V power supply suitable for BCD6 smart power technology
1307 -- 1310J. L. Goudard, P. Berthier, X. Boddaert, D. Laffitte, J. Périnet. New qualification approach for optoelectronic components
1311 -- 1315M. Giglio, G. Martines, G. Mura, Simona Podda, Massimo Vanzi. An automated lifetest equipment for optical emitters
1317 -- 1321Massimo Vanzi, G. Salmini, R. Pastorelli, S. Pessina, P. Furcas. Reliability tests on WDM filters
1323 -- 1328François Caloz, Daniel Ernst, Patrick Rossini, Laura Gherardi, Lisa Grassi, Jean Arnaud. Reliability of optical connectors - Humidity behavior of the adhesive
1329 -- 1332Klaus Duerr, Reinhard Pusch, Gottfried Schmitt. Reliability Problems of Passive Optical Devices and Modules after Mechanical, Thermal and Humidity Testing
1333 -- 1338T. Tomasi, I. De Munari, V. Lista, L. Gherardi, A. Righetti, M. Villa. Passive optical components: from degradation data to reliability assessment - preliminary results
1339 -- 1345L. Tielemans, R. Rongen, Ward De Ceuninck. How reliable are reliability tests?
1347 -- 1351G. Scandurra, C. Ciofi, C. Pace, F. Speroni, F. Alagi. True constant temperature MTF test system for the characterization of electromigration of thick Cu interconnection lines
1353 -- 1358B. Mongellaz, F. Marc, N. Milet-Lewis, Y. Danto. Contribution to ageing simulation of complex analogue circuit using VHDL-AMS behavioural modelling language
1359 -- 1363R. Petersen, Ward De Ceuninck, Jan D Haen, Marc D Olieslaeger, Luc De Schepper, O. Vendier, H. Blanck, D. Pons. Exploring the limits of Arrhenius-based life testing with heterojunction bipolar transistor technology
1365 -- 1368A. Mervic, A. Lanzani, M. Menchise, P. Serra, D. Gerosa. Contact resistivity instability in embedded SRAM memory
1369 -- 1372E. Carvou, F. Le Bihan, A. C. Salaün, R. Rogel, Olivier Bonnaud, Yannick Rey-Tauriac, Xavier Gagnard, L. Roland. Reliability improvement of high value doped polysilicon-based resistors
1373 -- 1376M. Mugnaini, M. Catelani, G. Ceschini, A. Masi, F. Nocentini. Pseudo Time-Variant parameters in centrifugal compressor availability studies by means of Markov models
1377 -- 1380G. Ceschini, M. Mugnaini, A. Masi. A reliability study for a submarine compression application
1381 -- 1384M. Catelani, R. Nicoletti. A Custom-designed automatic measurement system for acquisition and management of reliability data
1385 -- 1388Yong-Ha Song, Myoung-Lae Park, Gye-Won Jung, Taek-Soo Kim. A study of advanced layout verification to prevent leakage current failure during power down mode operation
1389 -- 1392V. Lista, P. Garbossa, T. Tomasi, M. Borgarino, Fausto Fantini, L. Gherardi, A. Righetti, M. Villa. Degradation Based Long-Term Reliability Assessment for Electronic Components in Submarine Applications
1393 -- 1396P. Battista, M. Catelani, G. Fasano, A. Materassi. On the reliability of instruments for environmental monitoring: some practical considerations
1397 -- 1403D. M. Fleetwood. Hydrogen-related reliability issues for advanced microelectronics
1405 -- 1408B. Cretu, F. Balestra, G. Ghibaudo, G. Guégan. Origin of hot carrier degradation in advanced nMOSFET devices
1409 -- 1413E. Andries, R. Dreesen, K. Croes, Ward De Ceuninck, Luc De Schepper, Guido Groeseneken, K. F. Lo, Marc D Olieslaeger, Jan D Haen. Statistical aspects of the degradation of LDD nMOSFETs
1415 -- 1420H. V. Nguyen, Cora Salm, J. Vroemen, J. Voets, B. Krabbenborg, J. Bisschop, A. J. Mouthaan, Fred G. Kuper. Fast temperature cycling and electromigration induced thin film cracking in multilevel interconnection: experiments and modeling
1421 -- 1425H. V. Nguyen, Cora Salm, R. Wenzel, A. J. Mouthaan, Fred G. Kuper. Simulation and experimental characterization of reservoir and via layout effects on electromigration lifetime
1427 -- 1432Ruggero Feruglio, Fernanda Irrera, Bruno Riccò. Microscopic aspects of defect generation in SiO::2::
1433 -- 1438Mahesh S. Krishnan, Viktor Kol dyaev, Eiji Morifoji, Koji Miyamoto, Tomasz Brozek, Xiaolei Li. Series resistance degradation due to NBTI in PMOSFET
1445 -- 1448R. Rodríguez, James H. Stathis, Barry P. Linder, S. Kowalczyk, Ching-Te Chuang, Rajiv V. Joshi, Gregory A. Northrop, Kerry Bernstein, A. J. Bhavnagarwala, Salvatore Lombardo. Analysis of the effect of the gate oxide breakdown on SRAM stability
1449 -- 1452B. Domengès, P. Schwindenhammer, P. Poirier, Felix Beaudoin, Ph. Descamps. Comprehensive failure analysis of leakage faults in bipolar transistors
1453 -- 1456A. Muehlhoff. Inversion of degradation direction of n-channel MOS-FETs in off-state operation
1457 -- 1460Hajdin Ceric, Siegfried Selberherr. Simulative prediction of the resistance change due to electromigration induced void evolution
1461 -- 1464A. N. Nazarov, I. N. Osiyuk, V. S. Lysenko, T. Gebel, L. Rebohle, W. Skorupa. Charge trapping and degradation in Ge:::+::: ion implanted SiO::2:: layers during high-field electron injection
1465 -- 1468Ninoslav Stojadinovic, I. Manic, S. Djoric-Veljkovic, V. Davidovic, D. Dankovic, S. Golubovic, S. Dimitrijev. Mechanisms of spontaneous recovery in positive gate bias stressed power VDMOSFETs
1469 -- 1472M. R. Carriero, S. Di Pascoli, Giuseppe Iannaccone. Simulation of failure time distributions of metal lines under electromigration
1473 -- 1480G. Ghidini, D. Brazzelli. Evaluation methodology of thin dielectrics for non-volatile memory application
1481 -- 1484Salvatore Lombardo, James H. Stathis, Barry P. Linder. Dependence of Post-Breakdown Conduction on Gate Oxide Thickness
1485 -- 1489S. Aresu, Ward De Ceuninck, R. Dreesen, K. Croes, E. Andries, J. Manca, Luc De Schepper, Robin Degraeve, Ben Kaczer, Marc D Olieslaeger. High-resolution SILC measurements of thin SiO::2:: at ultra low voltages
1491 -- 1496E. Viganò, A. Ghetti, G. Ghidini, A. S. Spinelli. Post-breakdown characterization in thin gate oxides
1497 -- 1500D. Roy, S. Bruyère, E. Vincent, F. Monsieur. Series resistance and oxide thickness spread influence on Weibull breakdown distribution: New experimental correction for reliability projection improvement
1501 -- 1504J. M. Rafí, B. Vergnet, F. Campabadal, C. Fleta, L. Fonseca, M. Lozano, C. Martínez, M. Ullán. Electrical characteristics of high-energy proton irradiated ultra-thin gate oxides
1505 -- 1508F. Monsieur, E. Vincent, D. Roy, S. Bruyère, G. Pananakakis, G. Ghibaudo. Gate oxide Reliability assessment optimization
1509 -- 1511P. Caprara, A. Barcella, M. Beltramello, C. Brambilla, S. Cereda, C. Caimi, V. Contin, V. Daniele, M. Fontana, P. Lucarno. Analyses on NVM Circuitry Delay Induced by Source & Drain BF::2:: Implant
1513 -- 1516X. Blasco, M. Nafría, X. Aymerich. Conduction and Breakdown Behaviour of Atomic Force Microscopy Grown SiO::2:: Gate Oxide on MOS Structures
1517 -- 1522J. Augereau, Y. Ousten, L. Béchou, Y. Danto. Acoustic analysis of an assembly: Structural identification by signal processing (wavelets)
1523 -- 1528C. Passagrilli, L. Gobbato, R. Tiziani. Reliability of Au/Al bonding in plastic packages for high temperature (200degreeC) and high current applications
1529 -- 1533P. Guilbault, E. Woirgard, C. Zardini, D. Lambert. Reliability study of the assembly of a large EGA on a build up board using thermo-mechanical simulations
1535 -- 1540Mohandass Sivakumar, Vaidyanathan Kripesh, Chong Ser Choong, Chai Tai Chong, Loon Aik Lim. Reliability of Wire Bonding on Low-k Dielectric Material in Damascene Copper Integrated Circuits PBGA Assembly
1541 -- 1546Giulio Di Giacomo, Stefano Oggioni. Reliability of Flip Chip Applications with Ceramic and Organic Chip Carriers
1547 -- 1550A. Seppälä, T. Allinniemi, Eero Ristolainen. Failure mechanisms of adhesive flip chip joints
1551 -- 1554G. Duchamp, Y. Ousten, Y. Danto. Evaluation of a micropackaging analysis technique by highfrequency microwaves
1555 -- 1558Alexandrine Guédon, Eric Woirgard, Christian Zardini. Evaluation of lead-free soldering for automotive applications
1559 -- 1562L. Frisk, J. Järvinen, R. Ristolainen. Chip on flex attachment with thermoplastic ACF for RFID applications
1563 -- 1568Cezary Sydlo, M. Saglam, Bastian Mottet, M. Rodríguez-Gironés, Hans L. Hartnagel. Reliability investigations on HBV using pulsed electrical stress
1569 -- 1573M. Dammann, F. Benkhelifa, M. Meng, W. Jantz. Reliability of Metamorphic HEMTs for Power Applications
1575 -- 1580N. Labat, N. Malbert, B. Lambert, A. Touboul, F. Garat, B. Proust. Degradation mechanisms induced by thermal and bias stresses in InP HEMTs
1581 -- 1585Felix Beaudoin, D. Carisetti, Romain Desplats, Philippe Perdu, D. Lewis, J. C. Clement. Backside Defect Localizations and Revelations Techniques on Gallium Arsenide (GaAs) Devices
1587 -- 1592P. Cova, Roberto Menozzi, M. Dammann, T. Feltgen, W. Jantz. High-field step-stress and long term stability of PHEMTs with different gate and recess lengths
1593 -- 1596V. Ichizli, M. Rodríguez-Gironés, L. Marchand, C. Garden, O. Cojocari, Bastian Mottet, Hans L. Hartnagel. Process Control and Failure Analysis Implementation for THz Schottky-based components
1597 -- 1604N. Seliger, E. Wolfgang, G. Lefranc, H. Berg, T. Licht. Reliable power electronics for automotive applications
1605 -- 1610Alberto Castellazzi, R. Kraus, N. Seliger, Doris Schmitt-Landsiedel. Reliability analysis of power MOSFET s with the help of compact models and circuit simulation
1611 -- 1616R. Tiziani, G. Passoni, G. Santospirito. Adhesive die attach for power application: Performance and reliability in plastic package
1617 -- 1622Sebastiano Russo, Romeo Letor, Orazio Viscuso, Lucia Torrisi, Gianluigi Vitali. Fast thermal fatigue on top metal layer of power devices
1623 -- 1628Sudha Gopalan, Benno H. Krabbenborg, Jan-Hein Egbers, Bart van Velzen, Rene Zingg. Reliability of power transistors against application driven temperature swings
1629 -- 1634F. Velardi, F. Iannuzzo, G. Busatto, J. Wyss, A. Kaminksy. The Reliability of New Generation Power MOSFETs in Radiation Environment
1635 -- 1640G. Busatto, B. Cascone, L. Fratelli, M. Balsamo, F. Iannuzzo, F. Velardi. Non-destructive high temperature characterisation of high-voltage IGBTs
1641 -- 1646G. Lefranc, T. Licht, G. Mitic. Properties of solders and their fatigue in power modules
1647 -- 1652Masanori Usui, Takahide Sugiyama, Masayasu Ishiko, Jun Morimoto, Hirokazu Saitoh, Masaki Ajioka. Characterization of Trench MOS Gate Structures Utilizing Photon Emission Microscopy
1653 -- 1658Mauro Ciappa, Flavio Carbognani, P. Cova, Wolfgang Fichtner. A Novel Thermomechanics -Based Lifetime Prediction Model for Cycle Fatigue Failure Mechanisms in Power Semiconductors
1659 -- 1662G. Curro, R. Greco, A. Scandurra. Growth process and chemical characterization of an ultrathin phosphate film grafted onto Al-alloy metallization surfaces relevant to microelectronic devices reliability
1663 -- 1666S. Moreau, S. Forster, T. Lequeu, R. Jérisian. Influence of the turn-on mechanism on TRIACs reliability: di/dt thermal fatigue study in Q1 compared to Q2
1667 -- 1672Chun-Cheng Tsao, Bill Thompson, Ted Lundquist. Imaging and Material Analysis from Sputter-Induced Light Emission Using Coaxial Ion-Photon Column
1673 -- 1677Dionyz Pogany, J. Kuzmik, J. Darmo, Martin Litzenberger, Scrgey Bychikhin, K. Unterrainer, Z. Mozolova, S. Hascik, Tibor Lalinsky, E. Gornik. Electrical field mapping in InGaP HEMTs and GaAs terahertz emitters using backside infrared OBIC technique
1679 -- 1684Katsuyoshi Miura, Koji Nakamae, Hiromu Fujioka. CAD navigation system, for backside waveform probing of CMOS devices
1685 -- 1688A.-D. Müller, F. Müller, J. Middeke, J. Mehner, J. Wibbeler, Th. Gessner, M. Hietschold. Double-cantilever device for Atomic Force Microscopy in dynamic noncontact-mode
1689 -- 1694Franco Stellari, Peilin Song, James C. Tsang, Moyra K. McManus, Mark B. Ketchen. Optical diagnosis of excess I::DDQ:: in low power CMOS circuits
1695 -- 1700M. Neinhüs, R. Weber, Ulf Behnke, W. Merlin, E. Kubalek, R. A. Breil, M. Detje, A. Feltz. Contactless current and voltage measurements in integrated circuits by using a needle sensor
1701 -- 1706Maria Stangoni, Mauro Ciappa, Marco Buzzo, M. Leicht, Wolfgang Fichtner. Simulation and Experimental Validation of Scanning Capacitance Microscopy Measurements across Low-doped Epitaxial PN-Junction
1707 -- 1710Jon C. Lee, C.-H. Chen, David Su, J. H. Chuang. Investigation of Sensitivity Improvement on Passive Voltage Contrast for Defect Isolation
1711 -- 1714T. H. Lee, X. Guo, G. D. Shen, Y. Ji, G. H. Wang, J. Y. Du, X. Z. Wang, G. Gao, A. Altes, L. J. Balk. Investigation of Tunnel-Regenerated Multi-Active-Region Light-Emitting Diodes (TRMAR LED) by Scanning Thermal Microscopy (STHM)
1715 -- 1718C. Caprile, I. De Munari, M. Improntac, Simona Podda, A. Scorzoni, Massimo Vanzi. A specimen-current branching approach for FA of long Electromigration test lines
1719 -- 1722R. F. Szeloch, T. P. Gotszalk, P. Janus. Scanning Thermal Microscopy in Microsystem Reliability Analysis
1723 -- 1727C. Giret, D. Bru, D. Faure, C. Ali, M. Razani, D. Gobled. Electrical characteristics measurement of transistors by 4 tips-0.2 micron probing technique in Semiconductor Failure Analysis
1729 -- 1734Felix Beaudoin, G. Haller, Philippe Perdu, Romain Desplats, T. Beauchêne, D. Lewis. Reliability Defect Monitoring with Thermal Laser Stimulation: Biased Versus Unbiased
1735 -- 1740Janet E. Semmens, Lawrence W. Kessler. Application of Acoustic Frequency Domain Imaging for the Evaluation of Advanced Micro Electronic Packages
1741 -- 1746O. Crépel, Felix Beaudoin, L. Dantas de Morais, G. Haller, C. Goupil, Philippe Perdu, Romain Desplats, D. Lewis. Backside Hot Spot Detection Using Liquid Crystal Microscopy
1747 -- 1752N. Bicaïs-Lépinay, F. André, R. Pantel, S. Jullian, A. Margain, L. F. Tz. Kwakman. Lift-out techniques coupled with advanced TEM characterization methods for electrical failure analysis
1753 -- 1757Joachim C. Reiner, Philippe Gasser, Urs Sennhauser. Novel FIB-based sample preparation technique for TEM analysis of ultra-thin gate oxide breakdown
1759 -- 1762C. Hartmann, R. Weber, W. Mertin, E. Kubalek, A.-D. Müller, M. Hietschold. Simultaneous IC-internal voltage and current measurements via a multi lever Scanning Force Microscope
1763 -- 1766O. Crépel, C. Goupil, B. Domengès, Ph. Descamps, Philippe Perdu, A. Doukkali. Magnetic field measurements for Non Destructive Failure Analysis
1767 -- 1770D. Faure, C. A. Waggoner. A New sub-micro probing technique for failure analysis in integrated circuits
1771 -- 1776Roland Müller-Fiedler, Ulrich Wagner, Winfried Bernhard. Reliability of MEMS - a methodical approach
1777 -- 1782M. Dardalhon, Vincent Beroulle, Laurent Latorre, Pascal Nouet, Guy Perez, Jean Marc Nicot, Coumar Oudéa. Reliability analysis of CMOS MEMS structures obtained by Front Side Bulk Micromachining
1783 -- 1788Alexander Polyakov, Marian Bartek, Joachim N. Burghartz. Mechanical Reliability of Silicon Wafers with Through-Wafer Vias for Wafer-Level Packaging
1789 -- 1794Ingrid De Wolf, W. Merlijn van Spengen. Techniques to study the reliability of metal RF MEMS capacitive switches
1795 -- 1800Olivier Millet, Dominique Collard, Lionel Buchaillot. Reliability of polysilicon microstructures: in situ test benches
1801 -- 1806Alexander Frey, Franz Hofmann, R. Peters, Birgit Holzapfl, Meinrad Schienle, Christian Paulus, Petra Schindler-Bauer, Dirk Kuhlmeier, Jürgen Krause, Gerald Eckstein, Roland Thewes. Yield Evaluation of Gold Sensor Electrodes Used for Fully Electronic DNA Detection Arrays on CMOS
1807 -- 1809A. Enzler, N. Herres, A. Dommann. Analysis of etched cantilevers
1811 -- 1814Jakob Janting, Dirch Hjorth Petersen, Christoffer Greisen. Simulated SAM A-scans on multilayer MEMS components
1815 -- 1817Djemel Lellouchi, Felix Beaudoin, Christophe Le Touze, Philippe Perdu, Romain Desplats. IR confocal laser microscopy for MEMS Technological Evaluation
1819 -- 1822Phan L. P. Hoa, Gunnar Suchaneck, Gerald Gerlach. Investigation of dynamic disturbance quantities in piezoresistive silicon sensors

Volume 42, Issue 8

1153 -- 1154Marise Bafleur. In the memory of Georges Charitat
1155 -- 1162B. Foucher, J. Boullié, B. Meslet, D. Das. A review of reliability prediction methods for electronic devices
1163 -- 1170Leon Lantz, Seongdeok Hwang, Michael G. Pecht. Characterization of plastic encapsulant materials as a baseline for quality assessment and reliability testing
1171 -- 1177E. Atanassova, Dejan Spasov. Thermal Ta::2::O::5::--alternative to SiO::2:: for storage capacitor application
1179 -- 1184W. K. Fong, C. F. Zhu, B. H. Leung, C. Surya, B. Sundaravel, E. Z. Luo, J. B. Xu, I. H. Wilson. Characterizations of GaN films grown with indium surfactant by RF-plasma assisted molecular beam epitaxy
1185 -- 1194Y. C. Chan, D. Y. Luk. Effects of bonding parameters on the reliability performance of anisotropic conductive adhesive interconnects for flip-chip-on-flex packages assembly I. Different bonding temperature
1195 -- 1204Y. C. Chan, D. Y. Luk. Effects of bonding parameters on the reliability performance of anisotropic conductive adhesive interconnects for flip-chip-on-flex packages assembly II. Different bonding pressure
1205 -- 1212Hua Lu 0003, K. C. Hung, S. Stoyanov, C. Bailey, Y. C. Chan. No-flow underfill flip chip assembly--an experimental and modeling analysis
1213 -- 1218P. Bojta, P. Németh, G. Harsányi. Searching for appropriate humidity accelerated migration reliability tests methods
1219 -- 1227Huimin Xie, Anand Asundi, Chai Gin Boay, Lu Yunguang, Jin Yu, Zhaowei Zhong, Bryan K. A. Ngoi. High resolution AFM scanning Moiré method and its application to the micro-deformation in the BGA electronic package
1229 -- 1234Wei Huang, James M. Loman, Bülent Sener. Study of the effect of reflow time and temperature on Cu-Sn intermetallic compound layer reliability
1235 -- 1241Jann-Pygn Chen, W. L. Pearn. Testing process performance based on the yield: an application to the liquid-crystal display module
1243 -- 1248M. Dhifi. A novel simulation technique for testing analog ICs

Volume 42, Issue 7

995 -- 0Wallace T. Anderson, Roberto Menozzi. Editorial
997 -- 1002Phil F. Marsh, Colin S. Whelan, William E. Hoke, Robert E. Leoni III, Thomas E. Kazior. Reliability of metamorphic HEMTs on GaAs substrates
1003 -- 1010Frank Gao, Ravi Chanana, Tom Nicholls. The effects of buffer thickness on GaAs MESFET characteristics: channel-substrate current, drain breakdown, and reliability
1011 -- 1020Tim Henderson. Modeling gallium arsenide heterojunction bipolar transistor ledge variations for insight into device reliability
1021 -- 1028K. Ikossi, W. S. Rabinovich, D. S. Katzer, S. C. Binari, J. Mittereder, P. G. Goetz. Multiple quantum well PIN optoelectronic devices and a method of restoring failed device characteristics
1029 -- 1036William J. Roesch. Methods of reducing defects in GaAs ICs
1037 -- 1044Hongxia Liu, Yue Hao, Jiangang Zhu. A thorough investigation of hot-carrier-induced gate oxide breakdown in partially depleted N- and P-channel SIMOX MOSFETs
1045 -- 1052P. M. Igic, P. A. Mawby, M. S. Towers, W. Jamal, S. G. J. Batcup. Investigation of the power dissipation during IGBT turn-off using a new physics-based IGBT compact model
1053 -- 1058O. Perat, J. M. Dorkel, E. Scheid, Pierre Temple-Boyer, Y. S. Chung, A. Peyre-Lavigne, M. Zecri, P. Tounsi. Characterization method of thermomechanical parameters for microelectronic materials
1059 -- 1064Marcin Janicki, Gilbert De Mey, Andrzej Napieralski. Transient thermal analysis of multilayered structures using Green s functions
1065 -- 1073M. O. Alam, Y. C. Chan, K. C. Hung. Reliability study of the electroless Ni-P layer against solder alloy
1075 -- 1079Paavo Jalonen, Aulis Tuominen. The effect of sputtered interface metallic layers on reinforced core laminate making build-up structures
1081 -- 1090S. H. Fan, Y. C. Chan. Effect of misalignment on electrical characteristics of ACF joints for flip chip on flex applications
1091 -- 1099F. Barlow, A. Lostetter, A. Elshabini. Low cost flex substrates for miniaturized electronic assemblies
1101 -- 1111Octavio A. Leon, Gilbert De Mey, Erik Dick. Study of the optimal layout of cooling fins in forced convection cooling
1113 -- 1120B. Trégon, Y. Ousten, Y. Danto, L. Béchou, B. Parmentier. Behavioral study of passive components and coating materials under isostatic pressure and temperature stress conditions
1121 -- 1125W. L. Pearn, C. H. Ko, K. H. Wang. A multiprocess performance analysis chart based on the incapability index C::pp::: an application to the chip resistors
1127 -- 1132K. I. Arshak, D. P. Egan, K. Phelan. Using statistical design of experiment to investigate the effect of firing parameters on the electrical and magnetic properties of Mn-Zn ferrite
1133 -- 1140A. T. Kollias, John N. Avaritsiotis. Analysis and design of thin film resonator ladder filters
1141 -- 1149T. Cibáková, María Fischerová, Elena Gramatová, Wieslaw Kuzmicz, Witold A. Pleskacz, Jaan Raik, Raimund Ubar. Hierarchical test generation for combinational circuits with real defects coverage
1151 -- 0Mile K. Stojcev. The Computer Engineering Handbook; Vojin Oklobdzija. CRC Press, Boca Raton, 2002. Hardcover, pp 1338, ISBN 0-8493-0885-2

Volume 42, Issue 6

805 -- 0Wolfgang Wondrak. Special Section on Reliability of Passive Components
807 -- 813Reiner W. Kuehl. Reliability of thin-film resistors: impact of third harmonic screenings
815 -- 820Jonathan L. Paulsen, Erik K. Reed. Highly accelerated lifetesting of base-metal-electrode ceramic chip capacitors
821 -- 827Erik K. Reed, Jonathan L. Paulsen. Impact of circuit resistance on the breakdown voltage of tantalum chip capacitors
829 -- 834Jocelyn Siplon, Gary J. Ewell, Thomas Gibson. ESR concerns in tantalum chip capacitors exposed to non-oxygen-containing environments
835 -- 840A. Dehbi, W. Wondrak, Y. Ousten, Y. Danto. High temperature reliability testing of aluminum and tantalum electrolytic capacitors
841 -- 847Jan Pavelka, Josef Sikula, Petr Vasina, Vlasta Sedlakova, Munecazu Tacano, Sumihisa Hashiguchi. Noise and transport characterisation of tantalum capacitors
849 -- 854Petr Vasina, T. Zednicek, Josef Sikula, Jan Pavelka. Failure modes of tantalum capacitors made by different technologies
855 -- 860Gregory L. Amorese. Minimizing equivalent series resistance measurement errors
861 -- 0Markus P. J. Mergens. On-Chip ESD
863 -- 872Ming-Dou Ker, Chyh-Yih Chang. ESD protection design for CMOS RF integrated circuits using polysilicon diodes
873 -- 885Cynthia A. Torres, James W. Miller, Michael Stockinger, Matthew D. Akers, Michael G. Khazhinsky, James C. Weldon. Modular, portable, and easily simulated ESD protection networks for advanced CMOS technologies
887 -- 899Craig Salling, Jerry Hu, Jeff Wu, Charvaka Duvvury, Roger Cline, Rith Pok. Development of substrate-pumped nMOS protection for a 0.13 mum technology
901 -- 907Bart Keppens, V. De Heyn, M. Natarajan Iyer, Vesselin K. Vassilev, Guido Groeseneken. Significance of the failure criterion on transmission line pulse testing
909 -- 917Jon Barth, John Richner. Correlation considerations: Real HBM to TLP and HBM testers
919 -- 927Leo G. Henry, Jon Barth, Hugh Hyatt, Tom Diep, Michael Stevens. Charged device model metrology: limitations and problems
929 -- 933P. G. Han, Hei Wong, Andy H. P. Chan, M.-C. Poon. A novel approach for fabricating light-emitting porous polysilicon films
935 -- 941E. Miranda, G. Redin, A. Faigón. Modeling of the I-V characteristics of high-field stressed MOS structures using a Fowler-Nordheim-type tunneling expression
943 -- 949Thomas D. Moore, John L. Jarvis. The effects of in-plane orthotropic properties in a multi-chip ball grid array assembly
951 -- 966Masazumi Amagai, Masako Watanabe, Masaki Omiya, Kikuo Kishimoto, Toshikazu Shibuya. Mechanical characterization of Sn-Ag-based lead-free solders
967 -- 974Afaq Ahmad. Investigation of a constant behavior of aliasing errors in signature analysis due to the use of different ordered test-patterns in LFSR based testing techniques
975 -- 983Tomasz Garbolino, Andrzej Hlawiczka. Efficient test pattern generators based on specific cellular automata structures
985 -- 989Fuchen Mu, Mingzhen Xu, Changhua Tan, Xiaorong Duan. Weibull characteristics of n-MOSFET s with ultrathin gate oxides under FN stress and lifetime prediction
991 -- 0Lingfeng Mao, Changhua Tan, Mingzhen Xu. Erratum to The effect of image potential on electron transmission and electric current in the direct tunneling regime of ultra-thin MOS structures [Microelectronics Reliability 2001;41: 927-931]
993 -- 0Ninoslav Stojadinovic. Dependability of Engineering Systems: J.M. Nahman, Springer-Verlag, Berlin, Heidelberg, New York, 2002, 192 pages

Volume 42, Issue 4-5

463 -- 0Ninoslav Stojadinovic, Michael G. Pecht. Editorial
465 -- 491Hiroshi Iwai, Shun ichiro Ohmi. Silicon integrated circuit technology from past to future
493 -- 506Eiji Takeda, Eiichi Murakami, Kazuyoshi Torii, Yutaka Okuyama, Eishi Ebe, Kenji Hinode, Shin ichiro Kimura. Reliability issues of silicon LSIs facing 100-nm technology node
507 -- 510Gilbert De Mey. A thermodynamic limit for digital electronics
511 -- 521S. Nakajima, S. Nakamura, K. Kuji, T. Ueki, T. Ajioka, T. Sakai. Construction of a cost-effective failure analysis service network--microelectronic failure analysis service in Japan
523 -- 541D. M. Fleetwood. Effects of hydrogen transport and reactions on microelectronics radiation response and reliability
543 -- 553Kinam Kim, Gi-Tae Jeong, Chan-Woong Chun, Sam-Jin Hwang. DRAM reliability
555 -- 564Ben Kaczer, Robin Degraeve, M. Rasras, A. De Keersgieter, K. Van de Mieroop, Guido Groeseneken. Analysis and modeling of a digital CMOS circuit operation and reliability after gate oxide breakdown: a case study
565 -- 571M. K. Radhakrishnan, K. L. Pey, C. H. Tung, W. H. Lin. Physical analysis of hard and soft breakdown failures in ultrathin gate oxides
573 -- 582G. Ghibaudo, T. Boutchacha. Electrical noise and RTS fluctuations in advanced CMOS devices
583 -- 596Adelmo Ortiz-Conde, F. J. García Sánchez, Juin J. Liou, Antonio Cerdeira, Magali Estrada, Y. Yue. A review of recent MOSFET threshold voltage extraction methods
597 -- 605Hei Wong, V. A. Gritsenko. Defects in silicon oxynitride gate dielectric films
607 -- 627Masazumi Amagai. Mechanical reliability in electronic packaging
629 -- 640Vladimir Székely. Enhancing reliability with thermal transient testing
641 -- 651Dawn A. Thomas, Ken Ayers, Michael G. Pecht. The trouble not identified phenomenon in automotive electronics
653 -- 667Mauro Ciappa. Selected failure mechanisms of modern power modules
669 -- 677Ninoslav Stojadinovic, I. Manic, S. Djoric-Veljkovic, V. Davidovic, S. Golubovic, S. Dimitrijev. Effects of high electric field and elevated-temperature bias stressing on radiation response in power VDMOSFETs
679 -- 683Mitsuo Fukuda. Optical semiconductor device reliability
685 -- 708Gaudenzio Meneghesso, Enrico Zanoni. Failure modes and mechanisms of InP-based and metamorphic high electron mobility transistors
709 -- 719Andrzej Dziedzic. Electrical and structural investigations in reliability characterisation of modern passives and passive integrated components
721 -- 733Chun-Yen Chang, Jiong-Guang Su, Shyh-Chyi Wong, Tiao-Yuan Huang, Yuan-Chen Sun. RF CMOS technology for MMIC
735 -- 746Arokia Nathan, Byung-kyu Park, Qinghua Ma, Andrei Sazonov, John A. Rowlands. Amorphous silicon technology for large area digital X-ray and optical imaging
747 -- 765N. Tosic Golo, Fred G. Kuper, Ton J. Mouthaan. Zapping thin film transistors
767 -- 777C. F. Luk, Y. C. Chan, K. C. Hung. Application of adhesive bonding techniques in hard disk drive head assembly
779 -- 786B. K. Jones. Logarithmic distributions in reliability analysis
787 -- 795Juin J. Liou, Qiang Zhang, John McMacken, J. Ross Thomson, Kevin Stiles, Paul Layman. Statistical modeling of MOS devices for parametric yield prediction
797 -- 804V. S. Pershenkov, S. V. Avdeev, A. S. Tsimbalov, M. N. Levin, V. V. Belyakov, D. V. Ivashin, A. Y. Slesarev, A. Y. Bashin, G. I. Zebrev, V. N. Ulimov. Use of preliminary ultraviolet and infrared illumination for diagnostics of MOS and bipolar devices radiation response

Volume 42, Issue 3

307 -- 316Guenther Benstetter, Michael W. Ruprecht, Douglas B. Hunt. A review of ULSI failure analysis techniques for DRAMs 1. Defect localization and verification
317 -- 326Hei Wong. Recent developments in silicon optoelectronic devices
327 -- 333Domenico Caputo, Fernanda Irrera. Investigation and modeling of stressed thermal oxides
335 -- 341Fen Chen, Rolf-Peter Vollertsen, Baozhen Li, Dave Harmon, Wing L. Lai. A new empirical extrapolation method for time-dependent dielectric breakdown reliability projections of thin SiO::2:: and nitride-oxide dielectrics
343 -- 347Juin J. Liou, R. Shireen, Adelmo Ortiz-Conde, F. J. García Sánchez, Antonio Cerdeira, Xiaofang Gao, Xuecheng Zou, C. S. Ho. Influence of polysilicon-gate depletion on the subthreshold behavior of submicron MOSFETs
349 -- 354Yongseok Ahn, Sanghyun Lee, Gwanhyeob Koh, Taeyoung Chung, Kinam Kim. The abnormality in gate oxide failure induced by stress-enhanced diffusion of polycrystalline silicon
355 -- 360Yiqi Zhuang, Lei Du. 1/f noise as a reliability indicator for subsurface Zener diodes
361 -- 366A. Caddemi, N. Donato. Temperature-dependent noise characterization and modeling of on-wafer microwave transistors
367 -- 374De-Shin Liu, Chin-Yu Ni. A thermo-mechanical study on the electrical resistance of aluminum wire conductors
375 -- 380T. Y. Lin, W. S. Leong, K. H. Chua, R. Oh, Y. Miao, J. S. Pan, J. W. Chai. The impact of copper contamination on the quality of the second wire bonding process using X-ray photoelectron spectroscopy method
381 -- 389C. F. Luk, Y. C. Chan, K. C. Hung. Development of gold to gold interconnection flip chip bonding for chip on suspension assemblies
391 -- 398Joachim Kloeser, Paradiso Coskina, Rolf Aschenbrenner, Herbert Reichl. Bump formation for flip chip and CSP by solder paste printing
399 -- 406T. Alander, S. Nurmi, P. Heino, Eero Ristolainen. Impact of component placement in solder joint reliability
407 -- 416J. D. Wu, S. H. Ho, C.-Y. Huang, C. C. Liao, P. J. Zheng, S. C. Hung. Board level reliability of a stacked CSP subjected to cyclic bending
417 -- 426Didier Cottet, Michael Scheffler, Gerhard Tröster. A novel, zone based process monitoring method for low cost MCM-D substrates manufactured on large area panels
427 -- 436P. Grybos, W. Dabrowski, P. Hottowy, R. Szczygiel, K. Swientek, P. Wiacek. Multichannel mixed-mode IC for digital readout of silicon strip detectors
437 -- 453Asad A. Ismaeel, R. Bhatnagar, Rajan Mathew. On-line testable data path synthesis for minimizing testing time
455 -- 458S. Chakraborty, P. T. Lai, Paul C. K. Kwok. MOS characteristics of NO-grown oxynitrides on n-type 6H-SiC
459 -- 461F. Saigné, Olivier Quittard, Laurent Dusseau, F. Joffre, C. Oudéa, J. Fesquet, Jean Gasiot. Prediction of long-term thermal behavior of an irradiated SRAM based on isochronal annealing measurements

Volume 42, Issue 2

157 -- 173E. Atanassova, A. Paskaleva. Breakdown fields and conduction mechanisms in thin Ta::2::O::5:: layers on Si for high density DRAMs
175 -- 181Lingfeng Mao, Heqiu Zhang, Changhua Tan, Mingzhen Xu. The effect of transition region on the direct tunneling current and Fowler-Nordheim tunneling current oscillations in ultrathin MOS structures
183 -- 188Lei Du, Yiqi Zhuang, Yong Wu. 1/f:::gamma::: Noise separated from white noise with wavelet denoising
189 -- 199Nobuyuki Sano, Kazuya Matsuzawa, Mikio Mukai, Noriaki Nakayama. On discrete random dopant modeling in drift-diffusion simulations: physical meaning of atomistic dopants
201 -- 209Shinya Ito, Hiroaki Namba, Tsuyoshi Hirata, Koichi Ando, Shin Koyama, Nobuyuki Ikezawa, Tatsuya Suzuki, Takehiro Saitoh, Tadahiko Horiuchi. Effect of mechanical stress induced by etch-stop nitride: impact on deep-submicron transistor performance
211 -- 218Young S. Chung, Bob Baird. Power capability limits of power MOSFET devices
219 -- 223Takeshi Yanagisawa, Takeshi Kojima, Tadamasa Koyanagi, Kiyoshi Takahisa, Kuniomi Nakamura. Changes in the characteristics of CuInGaSe::2:: solar cells under light irradiation and during recovery: degradation analysis by the feeble light measuring method
225 -- 231O. Jeandupeux, V. Marsico, A. Acovic, P. Fazan, H. Brune, K. Kern. Use of scanning capacitance microscopy for controlling wafer processing
233 -- 252Philip M. Fabis. The processing technology and electronic packaging of CVD diamond: a case study for GaAs/CVD diamond plastic packages
253 -- 258K. Jonnalagadda. Reliability of via-in-pad structures in mechanical cycling fatigue
259 -- 264M. S. Kilijanski, Y.-L. Shen. Analysis of thermal stresses in metal interconnects with multilevel structures
265 -- 283Andrew J. G. Strandjord, Scott Popelar, Christine Jauernig. Interconnecting to aluminum- and copper-based semiconductors (electroless-nickel/gold for solder bumping and wire bonding)
285 -- 291Yu-lung Lo, Chih-Chiang Tsao. Wirebond profiles characterized by a modified linkage-spring model which includes a looping speed factor
293 -- 299Jinlin Wang. Underfill of flip chip on organic substrate: viscosity, surface tension, and contact angle
301 -- 305Rajendra D. Pendse, Peng Zhou. Methodology for predicting solder joint reliability in semiconductor packages

Volume 42, Issue 12

1823 -- 1835Anri Nakajima, Quazi D. M. Khosru, Takashi Yoshimoto, Shin Yokoyama. Atomic-layer-deposited silicon-nitride/SiO::2:: stack--a highly potential gate dielectrics for advanced CMOS technology
1837 -- 1848Deok-Hoon Kim, Peter Elenius, Michael Johnson, Scott Barrett. Solder joint reliability of a polymer reinforced wafer level package
1857 -- 1864K. Y. Lim, X. Zhou. An analytical effective channel-length modulation model for velocity overshoot in submicron MOSFETs based on energy-balance formulation
1865 -- 1874Boualem Djezzar. On the correlation between radiation-induced oxide- and border-trap effects in the gate-oxide nMOSFET s
1875 -- 1882Dimitrios N. Kouvatsos. On-state and off-state stress-induced degradation in unhydrogenated solid phase crystallized polysilicon thin film transistors
1883 -- 1891Xingsheng Liu, Shuangyan Xu, Guo-Quan Lu, David A. Dillard. Effect of substrate flexibility on solder joint reliability
1893 -- 1901De-Shin Liu, Chin-Yu Ni. The optimization design of bump interconnections in flip chip packages from the electrical standpoint
1903 -- 1911Chin-Yu Ni, De-Shin Liu, Ching-Yang Chen. Procedure for design optimization of a T-cap flip chip package
1913 -- 1920Erja Jokinen, Eero Ristolainen. Anisotropic conductive film flip chip joining using thin chips
1921 -- 1930Frank Stepniak. Failure criteria of flip chip joints during accelerated testing
1931 -- 1937Dongji Xie, Sammy Yi. Reliability studies and design improvement of mirror image CSP assembly
1939 -- 1944Silke Liebert. Encapsulation of naked dies for bulk silicon etching with TMAH
1945 -- 1951Y. W. Chiu, Y. C. Chan, S. M. Lui. Study of short-circuiting between adjacent joints under electric field effects in fine pitch anisotropic conductive adhesive interconnects
1953 -- 1958Sunit Rane, Vijaya Puri. Thin film, thick film microstrip band pass filter: a comparison and effect of bulk overlay
1959 -- 1966Predrag Osmokrovic, Boris Loncar, Srboljub Stankovic, Aleksandra Vasic. Aging of the over-voltage protection elements caused by over-voltages
1967 -- 1974E. M. Baskin. Analysis of burn-in time using the general law of reliability
1975 -- 1983P. C. Lin, W. L. Pearn. Testing process capability for one-sided specification limit with application to the voltage level translator
1985 -- 1989B. L. Yang, N. W. Cheung, S. Denholm, J. Shao, H. Wong, P. T. Lai, Y. C. Cheng. Ultra-shallow n:::+:::p junction formed by PH::3:: and AsH::3:: plasma immersion ion implantation
1991 -- 1996Shoucai Yuan, Changchun Zhu. An IGBT DC subcircuit model with non-destructive parameters extraction and comparison with measurements
1997 -- 2001Zhigang Song, Jiyan Dai, Shailesh Redkar. Open contact analysis of single bit failure in 0.18 mum technology
2003 -- 2007V. O. Balitska, B. Butkievich, O. I. Shpotyuk, M. M. Vakiv. On the analytical description of ageing kinetics in ceramic manganite-based NTC thermistors
2009 -- 2014M. L. Huang, K. S. Chen, Y. H. Hung. Integrated process capability analysis with an application in backlight module

Volume 42, Issue 1

3 -- 13Koen G. Verhaege, Markus P. J. Mergens, Christian C. Russ, John Armer, Phillip Jozwiak. Novel design of driver and ESD transistors with significantly reduced silicon area
15 -- 25Yoshihiro Takao, Hiroshi Kudo, Junichi Mitani, Yoshiyuki Kotani, Satoshi Yamaguchi, Keizaburo Yoshie, Kazuo Sukegawa, Nobuhisa Naori, Satoru Asai, Michiari Kawano. A 0.11 mum CMOS technology featuring copper and very low k interconnects with high performance and reliability
27 -- 34Jie-Hua Zhao, Wen-Jie Qi, Paul S. Ho. Thermomechanical property of diffusion barrier layer and its effect on the stress characteristics of copper submicron interconnect structures
35 -- 39Douglas Brisbin, Prasad Chaparala. Influence of test techniques on soft breakdown detection in ultra-thin oxides
41 -- 46M. Fadlallah, G. Ghibaudo, J. Jomaah, M. Zoaeter, G. Guégan. Static and low frequency noise characterization of surface- and buried-mode 0.1 mum P and N MOSFETs
47 -- 52Tetsuya Suemitsu, Yoshino K. Fukai, Hiroki Sugiyama, Kazuo Watanabe, Haruki Yokoyama. Bias-stress-induced increase in parasitic resistance of InP-based InAlAs/InGaAs HEMTs
53 -- 59Giovanna Sozzi, Roberto Menozzi. High-electric-field effects and degradation of AlGaAs/GaAs power HFETs: a numerical study
61 -- 66J. Roig, D. Flores, M. Vellvehí, J. Rebollo, J. Millán. Reduction of self-heating effect on SOIM devices
67 -- 76Rodolfo Quintero, Antonio Cerdeira, Adelmo Ortiz-Conde. Quasi-three-dimensional spice-based simulation of the transient behavior, including plasma spread, of thyristors and over-voltage protectors
77 -- 82Kinuko Mishiro, Shigeo Ishikawa, Mitsunori Abe, Toshio Kumai, Yutaka Higashiguchi, Ken-ichiro Tsubone. Effect of the drop impact on BGA/CSP package reliability
83 -- 91Yu-Jung Huang, Mei-hui Guo, Shen-Li Fu. Reliability and routability consideration for MCM placement
93 -- 100Chia-Pin Chiu, James Maveety, Quan A. Tran. Characterization of solder interfaces using laser flash metrology
101 -- 108Tsorng-Dih Yuan, Bor Zen Hong, Howard H. Chen, Li-Kong Wang. Integrated electro-thermomechanical analysis of nonuniformly chip-powered microelectronic system
109 -- 117N. Y. A. Shammas, M. P. Rodriguez, F. Masana. A simple method for evaluating the transient thermal response of semiconductor devices
119 -- 125Christine Naito, Michael Todd. The effects of curing parameters on the properties development of an epoxy encapsulant material
127 -- 134C.-H. Chiao, W. Y. Wang. Reliability improvement of fluorescent lamp using grey forecasting model
135 -- 140Seok Hwan Moon, Gunn Hwang, Ho Gyeong Yun, Tae Goo Choy, Young I. I. Kang. Improving thermal performance of miniature heat pipe for notebook PC cooling
141 -- 143S. Paul, F. J. Clough. A reliability of different metal contacts with amorphous carbon
145 -- 148Jin He, Xing Zhang, Ru Huang, Yangyuan Wang. Application of forward gated-diode R-G current method in extracting F-N stress-induced interface traps in SOI NMOSFETs
149 -- 152F. S. Lomeli, Antonio Cerdeira. Precise SPICE macromodel applied to high-voltage power MOSFET