Journal: Microelectronics Reliability

Volume 43, Issue 9-11

1351 -- 1352Nathalie Labat, André Touboul. Editorial
1353 -- 1360James H. Stathis, Barry P. Linder, R. Rodríguez, Salvatore Lombardo. Reliability of ultra-thin oxides in CMOS circuits
1361 -- 1367D. Dufourt, J. L. Pelloie. SOI design challenges
1369 -- 1375Lawrence C. Wagner. Trends in Failure Analysis
1377 -- 1382A. Andreini, C. Neva, L. Renard, G. Sironi, F. Speroni, L. Sponton, F. Tampellini, R. Tiziani. Pad Over Active (POA) solutions for three metal level BCD5 mixed power process - Design and validation of ESD protections
1383 -- 1387Th. Nirschl, M. Ostermayr, A. Olbrich, D. Vietzke, M. Omer, C. Linnenbank, U. Schaper, Y. Pottgiesser, J. Pottgiesser, M. Johansson. MALTY--A memory test structure for analysis in the early phase of the technology development
1389 -- 1393G. Aichmayr. Correlation of gate oxide reliability and product tests on leading edge DRAM technology
1395 -- 1400A. Aal. A procedure for reliability control and optimization of mixed-signal smart power CMOS pocesses
1401 -- 1404P. Charpenel, F. Davenel, R. Digout, M. Giraudeau, M. Glade, J. P. Guerveno, N. Guillet, A. Lauriac, S. Male, D. Manteigas. The right way to assess electronic system reliability: FIDES
1405 -- 1410Yong-Ha Song, S. G. Kim, S. B. Lee, K. J. Rhee, T.-S. Kim. A study of considering the reliability issues on ASIC/Memory integration by SIP (System-in-Package) technology
1411 -- 1416G. Cassanelli, Fausto Fantini, G. Serra, S. Sgatti. Reliability in automotive electronics: a case study applied to diesel engine control
1417 -- 1426Gerald Lucovsky. Electronic structure of transition metal/rare earth alternative high-K gate dielectrics: interfacial band alignments and intrinsic defects
1427 -- 1432Jong-Tae Park, Nag Jong Choi, Chong-Gun Yu, Seok Hee Jeon, Jean-Pierre Colinge. Increased hot carrier effects in Gate-All-Around SOI nMOSFET s
1433 -- 1438M. Fadlallah, C. Petit, A. Meinertzhagen, G. Ghibaudo, M. Bidaud, O. Simonetti, F. Guyader. Influence of nitradation in ultra-thin oxide on the gate current degradation of N and PMOS devices
1439 -- 1444R. Rodríguez, James H. Stathis, Barry P. Linder, Rajiv V. Joshi, Ching-Te Chuang. Influence and model of gate oxide breakdown on CMOS inverters
1445 -- 1448F. Lime, G. Ghibaudo, B. Guillaumot. Charge trapping in SiO2/HfO2/TiN gate stack
1449 -- 1454Yuan Li, Klaas Jelle Veenstra, Jerôme Dubois, Lei Peters-Wu, Agnes van Zomeren, Fred G. Kuper. Reservoir effect and maximum allowed VIA misalignment for AlCu interconnect with tungsten VIA plug
1455 -- 1460S. Djoric-Veljkovic, I. Manic, V. Davidovic, S. Golubovic, Ninoslav Stojadinovic. Effects of burn-in stressing on post-irradiation annealing response of power VDMOSFETs
1461 -- 1464Young-Pil Kim, U-In Chung, Joo Tae Moon, Sang U. Kim. Electrical analysis of DRAM cell transistors for the root-cause addressing of the tRDL time-delay failure
1465 -- 1470Werner Frammelsberger, Guenther Benstetter, Thomas Schweinboeck, Richard J. Stamp, Janice Kiely. Characterization of thin and ultra-thin SiO::2:: films and SiO::2::/Si interfaces with combined conducting and topographic atomic force microscopy
1471 -- 1476K. L. Pey, C. H. Tung, M. K. Radhakrishnan, L. J. Tang, Y. Sun, X. D. Wang, W. H. Lin. Correlation of failure mechanism of constant-current-stress and constant-voltage-stress breakdowns in ultrathin gate oxides of nMOSFETs by TEM
1477 -- 1482Se Re Na Yun, Won Sub Park, Byung Ha Lee, Jong-Tae Park. Hot electron induced punchthrough voltage of p-channel SOI MOSFET s at room and elevated temperatures
1483 -- 1488S. Aresu, Ward De Ceuninck, G. Knuyt, J. Mertens, J. Manca, Luc De Schepper, Robin Degraeve, Ben Kaczer, Marc D Olieslaeger, Jan D Haen. A new method for the analysis of high-resolution SILC data
1489 -- 1493D. Zander, F. Saigné, A. Meinertzhagen, C. Petit. Contribution of oxide traps on defect creation and LVSILC conduction in ultra thin gate oxide devices
1495 -- 1500Andreas Gehring, F. Jiménez-Molinos, Hans Kosina, A. Palma, F. Gámiz, Siegfried Selberherr. Modeling of retention time degradation due to inelastic trap-assisted tunneling in EEPROM devices
1501 -- 1505M. Porti, M. Nafría, X. Aymerich. Oxide conductivity increase during the progressive-breakdown of SiO2 gate oxides observed with C-AFM
1507 -- 1512Joachim C. Reiner. Pre-breakdown leakage current fluctuations of thin gate oxide
1513 -- 1518B. Mongellaz, F. Marc, Y. Danto. Ageing simulation of MOSFET circuit using a VHDL-AMS behavioural modelling: an experimental case study
1519 -- 1523D. Faure, D. Bru, C. Ali, C. Giret, K. Christensen. Gate oxide breakdown characterization on 0.13mum CMOS technology
1525 -- 1529Jan Ackaert, Klara Bessemans, Eddy De Backer. Charging induced damage by photoconduction through thick inter metal dielectrics
1531 -- 1535Hamid Toutah, Boubekeur Tala-Ighil, Jean-François Llibre, B. Boudart, Taieb Mohammed-Brahim, Olivier Bonnaud. Degradation in polysilicon thin film transistors related to the quality of the polysilicon material
1537 -- 1543S. Trinh, Markus P. J. Mergens, Koen G. Verhaege, Christian C. Russ, John Armer, Phillip Jozwiak, Bart Keppens, Russ Mohn, G. Taylor, Frederic De Ranter. Multi-finger turn-on circuits and design techniques for enhanced ESD performance and width scaling
1545 -- 1550Masashi Hayashi, Shinji Nakano, Tetsuaki Wada. Dependence of copper interconnect electromigration phenomenon on barrier metal materials
1551 -- 1556M. Zecri, P. Besse, P. Givelin, M. Nayrolles, M. Bafleur, N. Nolhier. Determination of the ESD Failure Cause Through its Signature
1557 -- 1561V. Dubec, Scrgey Bychikhin, M. Blaho, Dionyz Pogany, E. Gornik, J. Willemen, N. Qu, Wolfgang Wilkening, L. Zullino, A. Andreini. A dual-beam Michelson interferometer for investigation of trigger dynamics in ESD protection devices under very fast TLP stress
1563 -- 1568Abdellatif Firiti, D. Faujour, G. Haller, J. M. Moragues, V. Goubier, Philippe Perdu, Felix Beaudoin, D. Lewis. Short defect characterization based on TCR parameter extraction
1569 -- 1575M. S. B. Sowariraj, Theo Smedes, Cora Salm, Ton J. Mouthaan, Fred G. Kuper. Role of package parasitics and substrate resistance on the Charged Device Model (CDM) failure levels -An explanation and die protection strategy
1577 -- 1582T. Beauchêne, D. Trémouilles, D. Lewis, Philippe Perdu, Pascal Fouillat. Characterization of ESD induced defects using Photovoltaic Laser Stimulation (PLS)
1583 -- 1588Wen-Yu Lo, Ming-Dou Ker. Analysis and Prevention on NC-ball induced ESD Damages in a 683-Pin BGA Packaged Chipset IC
1589 -- 1594Gaudenzio Meneghesso, N. Novembre, Enrico Zanoni, L. Sponton, L. Cerati, G. Croce. Optimization of ESD protection structures suitable for BCD6 smart power technology
1595 -- 1602J. C. H. Phang, D. S. H. Chan, V. K. S. Ong, S. Kolachina, J. M. Chin, M. Palaniappan, G. Gilfeather, Y. X. Seah. Single contact beam induced current phenomenon for microelectronic failure analysis
1603 -- 1608Franco Stellari, Peilin Song, Moyra K. McManus, Alan J. Weger, Robert Gauthier, Kiran V. Chatty, Mujahid Muhammad, Pia Sanda, Philip Wu, Steve Wilson. Latchup Analysis Using Emission Microscopy
1609 -- 1613Stefan Dilhaire, M. Amine Salhi, Stéphane Grauby, Wilfrid Claeys. Laser Seebeck Effect Imaging (SEI) and Peltier Effect Imaging (PEI): complementary investigation methods
1615 -- 1619F. Darracq, Hervé Lapuyade, N. Buard, Pascal Fouillat, R. Dufayel, T. Carriere. Low-cost backside laser test method to pre-characterize the COTS IC s sensitivity to Single Event Effects
1621 -- 1626P. LeCoupanec, William K. Lo, Keneth R. Wilsher. An ultra-low dark-count and jitter, superconducting, single-photon detector for emission timing analysis of integrated circuits
1627 -- 1631Katsuyoshi Miura, Tomoyuki Kobatake, Koji Nakamae, Hiromu Fujioka. A low energy FIB processing, repair, and test system
1633 -- 1638F. Seifert, R. Weber, W. Mertin, E. Kubalek. A new technique for contactless current contrast imaging of high frequency signals
1639 -- 1644M. Remmach, Romain Desplats, Felix Beaudoin, E. Frances, Philippe Perdu, D. Lewis. Time Resolved Photoemission (PICA) - From the Physics to Practical Considerations
1645 -- 1650Hervé Deslandes, T. R. Lundquist. Limitations to photon-emission microscopy when applied to hot devices
1651 -- 1656Maria Stangoni, Mauro Ciappa, Wolfgang Fichtner. A New Procedure to Define the Zero-Field Condition and to Delineate pn-Junctions in Silicon Devices by Scanning Capacitance Microscopy
1657 -- 1662L. A. Knauss, A. Orozco, S. I. Woods, A. B. Cawthorne. Advances in scanning SQUID microscopy for die-level and package-level fault isolation
1663 -- 1668Romain Desplats, A. Eral, Felix Beaudoin, Philippe Perdu, Alan J. Weger, Moyra K. McManus, Peilin Song, Franco Stellari. Faster IC Analysis with PICA Spatial Temporal Photon Correlation and CAD Autochanneling
1669 -- 1674Alberto Tosi, Franco Stellari, F. Zappa, S. Cova. Backside Flip-Chip testing by means of high-bandwidth luminescence detection
1675 -- 1680B. Simmnacher, R. Weiland, J. Höhne, F. v. Feilitzsch, C. Hollerith. Semiconductor material analysis based on microcalorimeter EDS
1681 -- 1686Felix Beaudoin, Romain Desplats, Philippe Perdu, Abdellatif Firiti, G. Haller, V. Pouget, D. Lewis. From Static Thermal and Photoelectric Laser Stimulation (TLS/PLS) to Dynamic Laser Testing
1687 -- 1692Jon C. Lee, J. H. Chuang. A Novel Application of C-AFM: Deep Sub-micron Single Probing for IC Failure Analysis
1693 -- 1698Paul-Henri Albarède, S. Lavagne, C. Grosjean. Strain investigation around shallow trench isolations : a LACBED Study
1705 -- 1712S. L. Delage, C. Dua. Wide band gap semiconductor reliability : Status and trends
1713 -- 1718A. Curutchet, N. Malbert, N. Labat, A. Touboul, C. Gaquière, A. Minko, M. Uren. Low frequency drain noise comparison of AlGaN/GaN HEMT s grown on silicon, SiC and sapphire substrates
1719 -- 1723J. Kuchenbecker, M. Borgarino, M. Zeuner, U. König, R. Plana, Fausto Fantini. High Electric Field Induced Degradation of the DC Characteristics in Si/SiGe HEMT s
1725 -- 1730J. C. Martin, C. Maneux, N. Labat, A. Touboul, Muriel Riet, S. Blayac, M. Kahn, Jean Godin. 1/f noise analysis of InP/InGaAs DHBTs submitted to bias and thermal stresses
1731 -- 1736M. Belhaj, C. Maneux, N. Labat, A. Touboul, P. Bove. High current effects in InP/GaAsSb/InP DHBT: Physical mechanisms and parasitic effects
1737 -- 1742Gaudenzio Meneghesso, S. Levada, Enrico Zanoni, G. Scamarcio, G. Mura, Simona Podda, Massimo Vanzi, S. Du, I. Eliashevich. Reliability of visible GaN LEDs in plastic package
1743 -- 1749L. Mendizabal, Jean-Louis Verneuil, L. Béchou, Christelle Aupetit-Berthelemot, Y. Deshayes, F. Verdier, Jean-Michel Dumas, Y. Danto, D. Laffitte, J. L. Goudard. Impact of 1.55 mum laser diode degradation laws on fibre optic system performances using a system simulator
1751 -- 1754J. Van de Casteele, D. Laffitte, G. Gelly, C. Starck, M. Bettiati. High reliability level demonstrated on 980nm laser diode
1755 -- 1760Kevin Sanchez, Romain Desplats, G. Perez, V. Pichetto, Felix Beaudoin, Philippe Perdu. Solar Cell Analysis with Light Emission and OBIC Techniques
1761 -- 1766C. Gautier, J. Périnet, E. Nissou, D. Laffitte. New method of qualification applied to optical amplifier with electronics
1767 -- 1769J. L. Goudard, X. Boddaert, J. Périnet, D. Laffitte. Reliability of optoelectronics components: towards new qualification practices
1771 -- 1776G. Mura, Massimo Vanzi, Maria Stangoni, Mauro Ciappa, Wolfgang Fichtner. On the behaviour of the selective iodine-based gold etch for the failure analysis of aged optoelectronic devices
1777 -- 1783G. Q. Zhang. The challenges of virtual prototyping and qualification for future microelectronics
1785 -- 1790P. Soussan, G. Lekens, R. Dreesen, Ward De Ceuninck, E. Beyne. Advantage of In-situ over Ex-situ techniques as reliability tool: Aging kinetics of Imec s MCM-D discrete passives devices
1791 -- 1796P. Tropea, A. Mellal, J. Botsis. Deformation and damage of a solder-copper joint
1797 -- 1801A. B. Horsfall, J. M. M. dos Santos, S. M. Soare, N. G. Wright, A. G. O Neill, S. J. Bull, A. J. Walton, A. M. Gundlach, J. T. M. Stevenson. Direct measurement of residual stress in integrated circuit interconnect features
1803 -- 1807G. Andriamonje, V. Pouget, Y. Ousten, D. Lewis, Y. Danto, J. M. Rampnoux, Y. Ezzahri, Stefan Dilhaire, Stéphane Grauby, Wilfrid Claeys. Application of Picosecond Ultrasonics to Non-Destructive Analysis in VLSI circuits
1809 -- 1814O. Crépel, Romain Desplats, Y. Bouttement, Philippe Perdu, C. Goupil, Ph. Descamps, Felix Beaudoin, L. Marina. Magnetic emission mapping for passive integrated components characterisation
1815 -- 1820P. Rajamand, R. Tilgner, R. Schmidt, J. Baumann, P. Klofac, M. Rothenfusser. Investigation of delaminations during thermal stress: scanning acoustic microscopy covering low and high temperatures
1821 -- 1826David Dalleau, Kirsten Weide-Zaage, Yves Danto. Simulation of time depending void formation in copper, aluminum and tungsten plugged via structures
1827 -- 1831M. Krüger, J. Krinke, K. Ritter, B. Zierle, M. Weber. Laser-assisted decapsulation of plastic-encapsulated devices
1833 -- 1838G. Lefranc, B. Weiss, C. Klos, J. Dick, G. Khatibi, H. Berg. Aluminum bond-wire properties after 1 billion mechanical cycles
1839 -- 1846W. Kanert, H. Dettmer, B. Plikat, N. Seliger. Reliability aspects of semiconductor devices in high temperature applications
1847 -- 1851F. Velardi, F. Iannuzzo, G. Busatto, J. Wyss, A. Sanseverino, A. Candelori, G. Curro, A. Cascio, F. Frisina. Reliability of Medium Blocking Voltage Power VDMOSFET in Radiation Environment
1853 -- 1858Alexandrine Guédon, Eric Woirgard, Christian Zardini, Guillaume Simon. Methodology to evaluate the correspondence between real conditions and accelerated tests of a thyristor system used in a power plant
1859 -- 1864E. Hornung, U. Scheuermann. Reliability of low current electrical spring contacts in power modules
1865 -- 1869Yannick Rey-Tauriac, O. de Sagazan, M. Taurin, Olivier Bonnaud. Robustness improvement of VDMOS transistors in Bipolar/CMOS/DMOS technology
1871 -- 1876G. Coquery, G. Lefranc, T. Licht, R. Lallemand, N. Seliger, H. Berg. High temperature reliability on automotive power modules verified by power cycling tests up to 150degreeC
1877 -- 1882Alberto Castellazzi, V. Kartal, R. Kraus, N. Seliger, Martin Honsberg-Riedl, Doris Schmitt-Landsiedel. Hot-Spot Meaurements and Analysis of Electro-Thermal Effects in Low-Voltage Power-MOSFET s
1883 -- 1888J. Vobecký, P. Hazdra. Advanced Local Lifetime Control for Higher Reliability of Power Devices
1889 -- 1894T. Ayalew, Andreas Gehring, J. M. Park, Tibor Grasser, Siegfried Selberherr. Improving SiC lateral DMOSFET reliability under high field stress
1895 -- 1900A. Icaza Deckelmann, Gerhard K. M. Wachutka, F. Hirler, J. Krumrey, R. Henninger. Avalanche breakdown capability of Power DMOS Transistors and the Wunsch-Bell relation
1901 -- 1906S. Azzopardi, E. Woirgard, J.-M. Vinassa, O. Briat, C. Zardini. IGBT Power modules thermal characterization : what is the optimum between a low current - high voltage or a high current - low voltage test condition for the same electrical power?
1907 -- 1912G. Busatto, F. Iannuzzo, F. Velardi, M. Valentino, G. P. Pepe. Non-Destructive Detection of Current Distribution in Power Modules based on Pulsed Magnetic Measurement
1913 -- 1918K. I. Nuttall, O. Buiu, V. V. N. Obreja. Surface leakage current related failure of power silicon devices operated at high junction temperature
1919 -- 1928L. Buchaillot. Feedback of MEMS reliability study on the design stage: a step toward Reliability Aided Design (RAD)
1929 -- 1933Cezary Sydlo, K. Mutamba, L. Divac Krnic, Bastian Mottet, Hans L. Hartnagel. Reliability studies on integrated GaAs power-sensor structures using pulsed electrical stress
1935 -- 1937I. Boyer Heard, R. Coquillé, D. Rivière, P.-Y. Klimonda. Characterization and reliability of a switch matrix based on MOEMS technology
1939 -- 1944A. Tetelin, C. Pellet, J.-Y. Delétage, B. Carbonne, Y. Danto. Moisture diffusion in BCB resins used for MEMS packaging
1945 -- 1949Sylvaine Muratet, Jean-Yves Fourniols, G. Soto-Romero, Aitor Endemaño Isasi, A. Marty, Marc P. Y. Desmulliez. MEMS reliability modelling methodology: application to wobble micromotor failure analysis
1951 -- 1955Guillaume Marinier, Stefan Dilhaire, Luis David Patiño Lopez, Mohamed Benzohra. Determination of passive SiO::2::-Au microstructure resonant frequencies
1957 -- 1962Petra Schmitt, Francis Pressecq, Xavier Lafontan, Q.-H. Duong, Patrick Pons, Jean Marc Nicot, Coumar Oudéa, Daniel Estève, Jean-Yves Fourniols, Henri Camon. Application of MEMS behavioral simulation to Physics of Failure (PoF) modeling
1963 -- 1968Sebastien Rigo, Phillippe Goudeau, Jean-Michel Desmarres, Talal Masri, Jacques-Alain Petit, Petra Schmitt. Correlation between X-ray micro-diffraction and a developed analytical model to measure the residual stresses in suspended structures in MEMS

Volume 43, Issue 8

1173 -- 0G. Ghibaudo, E. Vincent. Guest Editorial
1175 -- 1184Ernest Y. Wu, Jordi Suñé, Wing L. Lai, Alex Vayshenker, Edward J. Nowak, David L. Harmon. Critical reliability challenges in scaling SiO::2::-based dielectric to its limit
1185 -- 1192Jordi Suñé, Ernest Y. Wu, D. Jiménez, Wing L. Lai. Statistics of soft and hard breakdown in thin SiO::2:: gate oxides
1193 -- 1197James H. Stathis, R. Rodríguez, Barry P. Linder. Circuit implications of gate oxide breakdown
1199 -- 1202F. Monsieur, E. Vincent, V. Huard, S. Bruyère, D. Roy, Thomas Skotnicki, G. Pananakakis, G. Ghibaudo. On the role of holes in oxide breakdown mechanism in inverted nMOSFETs
1203 -- 1209M. Porti, S. Meli, M. Nafría, X. Aymerich. Pre-breakdown noise in electrically stressed thin SiO::2:: layers of MOS devices observed with C-AFM
1211 -- 1214G. Ribes, S. Bruyère, F. Monsieur, D. Roy, V. Huard. New insights into the change of voltage acceleration and temperature activation of oxide breakdown
1215 -- 1220Andreas Martin, Jochen von Hagen, Glenn B. Alers. Ramped current stress for fast and reliable wafer level reliability monitoring of thin gate oxide reliability
1221 -- 1227G. Ghidini, A. Garavaglia, G. Giusto, A. Ghetti, R. Bottini, D. Peschiaroli, M. Scaravaggi, F. Cazzaniga, D. Ielmini. Impact of gate stack process on conduction and reliability of 0.18 mum PMOSFET
1229 -- 1235A. Ghetti, D. Brazzelli, A. Benvenuti, G. Ghidini, A. Pavan. Anomalous gate oxide conduction on isolation edges: analysis and process optimization
1237 -- 1240C. Besset, S. Bruyère, S. Blonkowski, S. Crémer, E. Vincent. MIM capacitance variation under electrical stress
1241 -- 1246A. Bravaix, C. Trapes, D. Goguenheim, N. Revil, E. Vincent. Carrier injection efficiency for the reliability study of 3.5-1.2 nm thick gate-oxide CMOS technologies
1247 -- 1251S. Cimino, A. Cester, Alessandro Paccagnella, G. Ghidini. Ionising radiation effects on MOSFET drain current
1253 -- 1257Albena Paskaleva, Martin Lemberger, Stefan Zürcher, Anton J. Bauer, Lothar Frey, Heiner Ryssel. Electrical characterization of zirconium silicate films obtained from novel MOCVD precursors
1259 -- 1266F. Mondon, S. Blonkowski. Electrical characterisation and reliability of HfO::2:: and Al::2::O::3::-HfO::2:: MIM capacitors
1267 -- 1279Kenji Takahashi, Mitsuo Umemoto, Naotaka Tanaka, Kazumasa Tanida, Yoshihiko Nemoto, Yoshihiro Tomita, Masamoto Tago, Manabu Bonkohara. Ultra-high-density interconnection technology of three-dimensional packaging
1281 -- 1287R. García, Magali Estrada, Antonio Cerdeira. Effects of impurity concentration, hydrogen plasma process and crystallization temperature on poly-crystalline films obtained from PECVD a-Si: H layers
1289 -- 1293K. L. Ng, Nian Zhan, C. W. Kok, M.-C. Poon, Hei Wong. Electrical characterization of the hafnium oxide prepared by direct sputtering of Hf in oxygen with rapid thermal annealing
1295 -- 1301I-Cheng Lin, Chih-Yao Huang, Chuan-Jane Chao, Ming-Dou Ker. Anomalous latchup failure induced by on-chip ESD protection circuit in a high-voltage CMOS IC product
1303 -- 1310J. H. Zhang, Y. C. Chan, M. O. Alam, S. Fu. Contact resistance and adhesion performance of ACF interconnections to aluminum metallization
1311 -- 1316Y. S. Zheng, Y. J. Su, B. Yu, P. D. Foo. Investigation of defect on copper bond pad surface in copper/low k process integration
1317 -- 1327N. Duan, J. Scheer, J. Bielen, M. van Kleef. The influence of Sn-Cu-Ni(Au) and Sn-Au intermetallic compounds on the solder joint reliability of flip chips on low temperature co-fired ceramic substrates
1329 -- 1338Tong Yan Tee, Hun Shen Ng, Daniel Yap, Zhaowei Zhong. Comprehensive board-level solder joint reliability modeling and testing of QFN and PowerQFN packages
1339 -- 1348Li-Rong Zheng, Johan Liu. System-on-package: a broad perspective from system design to technology development
1349 -- 0W. L. Pearn, Ming-Hung Shu. Erratum to An algorithm for calculating the lower confidence bounds of C::PU:: and C::PL:: with application to low-drop-out linear regulators [Microelectronics Reliability 2003;43: 495-502]

Volume 43, Issue 7

985 -- 986Horst A. Gieser. On-chip electrostatic discharge ESD
987 -- 991Steven S. Poon, Timothy J. Maloney. New considerations for MOSFET power clamps
993 -- 1000Markus P. J. Mergens, Christian C. Russ, Koen G. Verhaege, John Armer, Phillip Jozwiak, Russ Mohn. High holding current SCRs (HHI-SCR) for ESD protection and latch-up immune IC operation
1001 -- 1010M. Streibl, K. Esmark, A. Sieck, Wolfgang Stadler, M. Wendel, J. Szatkowski, Harald Gossner. Harnessing the base-pushout effect for ESD protection in bipolar and BiCMOS technologies
1011 -- 1020Vesselin K. Vassilev, S. Jenei, Guido Groeseneken, R. Venegas, S. Thijs, V. De Heyn, M. Natarajan Iyer, Michiel Steyaert, H. E. Maes. High frequency characterization and modelling of the parasitic RC performance of two terminal ESD CMOS protection devices
1021 -- 1027Sopan Joshi, Elyse Rosenbaum. Simulator-independent compact modeling of vertical npn transistors for ESD and RF circuit simulation
1039 -- 1045Sherry Suat Cheng Khoo, Pee Ya Tan, Steven H. Voldman. Microanalysis and electromigration reliability performance of high current transmission line pulse (TLP) stressed copper interconnects
1047 -- 1048Ingrid De Wolf. MEMS reliability
1049 -- 1060W. Merlijn van Spengen. MEMS reliability from a failure mechanisms perspective
1061 -- 1083X. Lafontan, F. Pressecq, Felix Beaudoin, S. Rigo, M. Dardalhon, J. L. Roux, P. Schmitt, J. Kuchenbecker, B. Baradat, D. Lellouchi. The advent of MEMS in space
1085 -- 1097Roland Müller-Fiedler, Volker Knoblauch. Reliability aspects of microsensors and micromechatronic actuators for automotive applications
1099 -- 1103A. Dommann, A. Enzler, N. Onda. Advanced X-ray analysis techniques to investigate aging of micromachined silicon actuators for space application
1105 -- 1115X. Q. Shi, Z. P. Wang, J. P. Pickering. A new methodology for the characterization of fracture toughness of filled epoxy films involved in microelectronics packages
1117 -- 1123Tong Yan Tee, Hun Shen Ng, Daniel Yap, Xavier Baraton, Zhaowei Zhong. Board level solder joint reliability modeling and testing of TFBGA packages for telecommunication applications
1125 -- 1136Y. Deshayes, L. Béchou, J.-Y. Delétage, F. Verdier, Y. Danto, D. Laffitte, J. L. Goudard. Three-dimensional FEM simulations of thermomechanical stresses in 1.55 mum Laser modules
1137 -- 1144J.-Y. Delétage, F. J.-M. Verdier, B. Plano, Y. Deshayes, L. Béchou, Y. Danto. Reliability estimation of BGA and CSP assemblies using degradation law model and technological parameters deviations
1145 -- 1149M. Jagadesh Kumar, C. Linga Reddy. 2D-simulation and analysis of lateral SiC N-emitter SiGe P-base Schottky metal-collector (NPM) HBT on SOI
1151 -- 1155Xiang-Ti Meng, Ai-Guo Kang, Ji-Hong Li, Hai-Yun Zhang, Shi-jie Yu, Zheng You. Effects of electron and gamma-ray irradiation on CMOS analog image sensors
1157 -- 1161Timo Liukkonen, Aulis Tuominen. Decreasing variation in paste printing using statistical process control
1163 -- 1167Haifeng Zhou, Zhenghui Lin, Wei Cao. ILP method for memory mapping in high-level synthesis
1169 -- 0Thomas D. Moore, John L. Jarvis. Erratum to A simple and fundamental design rule for resisting delamination in bimaterial structures [Microelectronics Reliability 2003;43: 487-494]
1171 -- 1172Mile K. Stojcev. Rohit Kapur, CTL for Test Information of Digital ICs Hardcover. Kluwer Academic Publisher, Boston, 2003. pp 173, plus XI, ISBN 1-4020-7293-7

Volume 43, Issue 6

821 -- 0Wallace T. Anderson, Roberto Menozzi. Editorial
823 -- 827Hyungtak Kim, Alexei Vertiatchikh, Richard M. Thompson, Vinayak Tilak, Thomas R. Prunty, James R. Shealy, Lester F. Eastman. Hot electron induced degradation of undoped AlGaN/GaN HFETs
829 -- 837Frank Gao. High reliability in PHEMT MMICs with dual-etch-stop AlAs layers for high-speed RF switch applications
839 -- 844F. Brunner, A. Braun, P. Kurpas, J. Schneider, J. Würfl, M. Weyers. Investigation of short-term current gain stability of GaInP/GaAs-HBTs grown by MOVPE
845 -- 851William J. Rowe, Bruce M. Paine, Adele E. Schmitz, Robert H. Walden, Michael J. Delaney. Reliability of 100 nm silicon nitride capacitors in an InP HEMT MMIC process
853 -- 858Bruce M. Paine, Ami P. Shah, Thomas Rust. The effects of ternary alloys on thermal resistances of HBTs, HEMTs, and laser diodes
859 -- 864Charles S. Whitman. Accelerated life test calculations using the method of maximum likelihood: an improvement over least squares
865 -- 878R.-P. Vollertsen. Thin dielectric reliability assessment for DRAM technology with deep trench storage node
879 -- 894John J. H. Reche, Deok-Hoon Kim. Wafer level packaging having bump-on-polymer structure
895 -- 903J. C. Tinoco, Magali Estrada, G. Romero. Room temperature plasma oxidation mechanism to obtain ultrathin silicon oxide and titanium oxide layers
905 -- 911I. Stanimirovic, Milan Jevtic, Z. Stanimirovic. High-voltage pulse stressing of thick-film resistors and noise
913 -- 923Hong Meng Ho, Wai Lam, Serguei Stoukatch, Petar Ratchev, Charles J. Vath, Eric Beyne. Direct gold and copper wires bonding on copper
925 -- 934Po-Jen Zheng, J. Z. Lee, K. H. Liu, J. D. Wu, S. C. Hung. Solder joint reliability of TFBGA assemblies with fresh and reworked solder balls
935 -- 943D. S. Liu, Y. C. Chao, C. H. Lin, G. S. Shen, H. S. Liu. Numerical study on the bonding tool position, tip profile and planarity angle influences on TAB/ILB interconnection reliability
945 -- 953Dominik Kasprowicz, Witold A. Pleskacz. Improvement of integrated circuit testing reliability by using the defect based approach
955 -- 961Belén Calvo, Santiago Celma, Pedro A. Martínez, Maria Teresa Sanz. Novel high performance CMOS current conveyor
963 -- 975W. L. Pearn, Ming-Hung Shu. Manufacturing capability control for multiple power-distribution switch processes based on modified C::pk:: MPPAC
977 -- 980Takeshi Yanagisawa, Takeshi Kojima. Degradation of InGaN blue light-emitting diodes under continuous and low-speed pulse operations
981 -- 984B. Alpat, R. Battiston, M. Bizzarri, D. Caraffini, E. Fiori, A. Papi, M. Petasecca, A. Pontetti. The radiation sensitivity mapping of ICs using an IR pulsed laser system

Volume 43, Issue 5

685 -- 693Mark Zwolinski, M. S. Gaur. Integrating testability with design space exploration
695 -- 706Reza Ghaffarian. Qualification approaches and thermal cycle test results for CSP/BGA/FCBGA
707 -- 711Ru Huang, Jinyan Wang, Jin He, Min Yu, Xing Zhang, Yangyuan Wang. Hot carrier degradation behavior in SOI dynamic-threshold-voltage nMOSFET s (n-DTMOSFET) measured by gated-diode configuration
713 -- 724Summer F. C. Tseng, Wei-Ting Kary Chien, Bing-Chu Cai. Improvement of poly-silicon hole induced gate oxide failure by silicon rich oxidation
725 -- 733Xiaofang Gao, Juin J. Liou, Joe Bernier, Gregg Croft, Waisum Wong, Satya Vishwanathan. Optimization of on-chip ESD protection structures for minimal parasitic capacitance
735 -- 739Chihoon Lee, Donggun Park, Hyeong Joon Kim, Wonshik Lee. Electrical reliability of highly reliable 256M-bit mobile DRAM with top-edge round STI and dual gate oxide
741 -- 749Tong Yan Tee, Chek Lim Kho, Daniel Yap, Carol Toh, Xavier Baraton, Zhaowei Zhong. Reliability assessment and hygroswelling modeling of FCBGA with no-flow underfill
751 -- 756Qian Wang, Naoe Hosoda, Toshihiro Itoh, Tadatomo Suga. Reliability of Au bump-Cu direct interconnections fabricated by means of surface activated bonding method
757 -- 763K. S. Kim, C. H. Yu, N. H. Kim, N. K. Kim, H.-J. Chang, E. G. Chang. Isothermal aging characteristics of Sn-Pb micro solder bumps
765 -- 774W. D. van Driel, G. Q. Zhang, J. H. J. Janssen, L. J. Ernst, F. Su, Kerm Sin Chian, Sung Yi. Prediction and verification of process induced warpage of electronic packages
775 -- 783Ping Zhao, Michael G. Pecht. Field failure due to creep corrosion on components with palladium pre-plated leadframes
785 -- 793Z. Zhao. Thermal design of a broadband communication system with detailed modeling of TBGA packages
795 -- 802Vencislav Valchev, Alex Van den Bossche. Accurate natural convection modelling for magnetic components
803 -- 809T. Y. Lin, K. L. Davison, W. S. Leong, Simon Chua, Y. F. Yao, J. S. Pan, J. W. Chai, K. C. Toh, W. C. Tjiu. Surface topographical characterization of silver-plated film on the wedge bondability of leaded IC packages
811 -- 817T. Y. Lin, C. M. Fang, Y. F. Yao, K. H. Chua. Development of the green plastic encapsulation for high density wirebonded leaded packages
819 -- 0Mile K. Stojcev. High Performance Memory Testing: Design Principles, Fault Modeling and Self-Test; R. Dean Adams, Kluwer Academic Publishers, Boston, 2003, Hardcover, pp 247, plus XIII, ISBN 1-4020-7255-4

Volume 43, Issue 4

517 -- 0Vitezslav Benda. The quest for optimum technology of power semiconductor devices
519 -- 527N. Y. A. Shammas. Present problems of power module packaging technology
529 -- 536Josef Lutz, Martin Domeij. Dynamic avalanche and reliability of high voltage diodes
537 -- 544J. Vobecký, P. Hazdra, V. Záhlava. Impact of the electron, proton and helium irradiation on the forward I-V characteristics of high-power P-i-N diode
545 -- 548M. Blaho, Dionyz Pogany, E. Gornik, M. Denison, G. Groos, M. Stecher. Study of internal behavior in a vertical DMOS transistor under short high current stress by an interferometric mapping method
549 -- 555F. Velardi, F. Iannuzzo, G. Busatto, J. Wyss, A. Candelori. Experimental study of charge generation mechanisms in power MOSFETs due to energetic particle impact:::, :::
557 -- 564V. Papez, B. Kojecký, J. Kozísek, J. Hejhal. Transient effects on high voltage diode stack under reverse bias
565 -- 569B. Morillon, Jean-Marie Dilhac, Christian Ganibal, C. Anceau. Study of aluminum thermomigration as a low thermal budget technique for innovative power devices
571 -- 576Adeline Feybesse, Ivana Deram, Jean-Michel Reynes, Eric Moreau. Copper metallization influence on power MOS reliability
577 -- 583Giovanni Busatto, Roberto La Capruccia, Francesco Iannuzzo, Francesco Velardi, Roberto Roncella. MAGFET based current sensing for power integrated circuit
585 -- 599Hei Wong. Low-frequency noise study in electron devices: review and update
601 -- 609Minkyu Je, Jeonghu Han, Hyungcheol Shin, Kwyro Lee. A simple four-terminal small-signal model of RF MOSFETs and its parameter extraction
611 -- 616Jackie Chan, Hei Wong, M.-C. Poon, C. W. Kok. Oxynitride gate dielectric prepared by thermal oxidation of low-pressure chemical vapor deposition silicon-rich silicon nitride
617 -- 624S. K. Manhas, D. Chandra Sekhar, A. S. Oates, M. M. De Souza. Characterisation of series resistance degradation through charge pumping technique
625 -- 633C. Y. Yin, M. O. Alam, Y. C. Chan, C. Bailey, Hua Lu 0003. The effect of reflow process on the contact resistance and reliability of anisotropic conductive film interconnection for flip chip on flex applications
635 -- 643C. Hillman, B. Castillo, Michael G. Pecht. Diffusion and absorption of corrosive gases in electronic encapsulants
645 -- 650P. Heino, Eero Ristolainen. Strength of Ta-Si interfaces by molecular dynamics
651 -- 664W. L. Pearn, G. H. Lin. A reliable procedure for testing linear regulators with one-sided specification limits based on multiple samples
665 -- 669V. A. Gritsenko, A. V. Shaposhnikov, Yu. N. Novikov, A. P. Baraban, Hei Wong, G. M. Zhidomirov, M. Roger. Onefold coordinated oxygen atom: an electron trap in the silicon oxide
671 -- 674N. A. Hastas, C. A. Dimitriadis, F. V. Farmakis, G. Kamarinos. Effects of hydrogenation on the performance and stability of p-channel polycrystalline silicon thin-film transistors
675 -- 679Z. Synowiec, B. Paszkiewicz. Electron transport in implant isolation GaAs layers
681 -- 683Johan Liu. Foldable Flex and Thinned Silicon Chips for Multichip Packaging; John Balde (Ed.), Kluwer Academic Publishers, Boston, USA, December 2002. Hardbound, 340 pp, Number of figures and tables 200, ISBN 0-7923-7676-5
683 -- 684Mile K. Stojcev. System Design with System C; Thorsten Grotker, Stan Liao, Grant Martin, Stuart Swan. Kluwer Academic Publishers, Boston, 2002. Hardcover, pp 217, plus X, ISBN 1-4020-7027-1

Volume 43, Issue 3

343 -- 0Andrzej Dziedzic. Special Section on IMAPS-Europe 2002
345 -- 349Jürgen Wilde, Yuqing Lai. Design optimization of an eddy current sensor using the finite-elements method
351 -- 357Arun Chandrasekhar, Steven Brebels, Serguei Stoukatch, Eric Beyne, Walter De Raedt, Bart Nauwelaers. The influence of packaging materials on RF performance
371 -- 375J. Müller, J. Klein, J. Rayho. In-process verification of MLC substrates
377 -- 383Andrzej Dziedzic, Lars Rebenklau, Leszek J. Golonka, Klaus-Jürgen Wolter. Fodel microresistors-processing and basic electrical properties
385 -- 398Kinam Kim, Yoon J. Song. Integration technology for ferroelectric memory devices
399 -- 404Mansun Chan, Xuemei Xi, Jin He, Kanyu M. Cao, Mohan V. Dunga, Ali M. Niknejad, Ping K. Ko, Chenming Hu. Practical compact modeling approaches and options for sub-0.1 mum CMOS technologies
405 -- 411Handoko Linewih, Sima Dimitrijev, Kuan Yew Cheong. Channel-carrier mobility parameters for 4H SiC MOSFETs
413 -- 420S. Hidalgo, D. Flores, I. Obieta, I. Mazarredo. Passivation and packaging of positive bevelled edge termination and related electrical stability
421 -- 426Yang-Hua Chang, Chen-Chun Chang-Chiang, Yueh-Cheng Lee, Chi-Chung Liu. Design of multi-finger HBTs with a thermal-electrical model
427 -- 437V. A. Vashchenko, A. Concannon, M. ter Beek, P. Hopper. Quasi-3D simulation approach for comparative evaluation of triggering ESD protection structures
439 -- 444T. Beauchêne, D. Lewis, Felix Beaudoin, V. Pouget, Romain Desplats, Pascal Fouillat, Philippe Perdu, M. Bafleur, D. Trémouilles. Thermal laser stimulation and NB-OBIC techniques applied to ESD defect localization
445 -- 451Petteri Palm, Jarmo Määttänen, Yannick De Maquillé, Alain Picault, Jan Vanfleteren, Björn Vandecasteele. Comparison of different flex materials in high density flip chip on flex applications
453 -- 463R. K. Shiue, L. W. Tsay, C. L. Lin, J. L. Ou. The reliability study of selected Sn-Zn based lead-free solders on Au/Ni-P/Cu substrate
465 -- 471Yuko Sawada, Kozo Harada, Hirofumi Fujioka. Study of package warp behavior for high-performance flip-chip BGA
473 -- 479Hirokazu Ezawa, Masaharu Seto, Masahiro Miyata, Hiroshi Tazawa. Polymer film deposition with fine pitch openings by stencil printing
481 -- 486C. W. Tan, Y. C. Chan, N. H. Yeung. Behaviour of anisotropic conductive joints under mechanical loading
487 -- 494Thomas D. Moore, John L. Jarvis. A simple and fundamental design rule for resisting delamination in bimaterial structures
495 -- 502W. L. Pearn, Ming-Hung Shu. An algorithm for calculating the lower confidence bounds of C::PU:: and C::PL:: with application to low-drop-out linear regulators
503 -- 507Takeshi Yanagisawa, Takeshi Kojima. The stability of the CuInSe::2:: solar mini-module I-V characteristics under continuous and light/dark irradiation cycle tests
509 -- 512G. Golan, A. Axelevitch, B. Sigalov, B. Gorenstein. Integrated thin film heater-thermocouple systems
513 -- 0Mile K. Stojcev. Memory Design Techniques for Low Energy Embedded Systems; Alberto Macii, Luca Benini, Massimo Poncino. Kluwer Academic Publishers, Boston, USA, 2002. Hard cover, pp 144 plus XI, ISBN 0-7923-7690-0
514 -- 515Mile K. Stojcev. A designer s guide to built-in self-test; Charles E. Stround. Kluwer Academic Publishers, Boston, 2002. Hardcover, pp 319, plus XVI, ISBN 1-4020-7050-0
515 -- 0Mile K. Stojcev. Semiconductor Memories: Technologies, Testing and Reliability; Ashok K. Sharma. IEEE Press and Wiley Interscience, New York, 1997. Hardcover, pp 462, plus XII, ISBN 0-7803-1000-4

Volume 43, Issue 2

181 -- 188H. E. Aldrete-Vidrio, J. L. del Valle, J. Santana-Corte. A TCAD comparative study of power rectifiers: modified P-i-N vs. modified mosaic contact P-i-N diode
189 -- 193Magali Estrada, A. Afzalian, Denis Flandre, Antonio Cerdeira, H. Baez, A. de Lucca. FD MOS SOI circuit to enhance the ratio of illuminated to dark current of a co-integrated a-Si: H photodiode
195 -- 201R. Murphy-Arteaga, J. Huerta-Chua, Alejandro Díaz-Sánchez, A. Torres-Jécome, W. Calleja-Arriaga, M. Landa-Vázquez. Fabrication, characterisation and modelling of integrated on-silicon inductors
203 -- 207Javier Lemus-López, Alejandro Díaz-Sánchez, Jaime Ramírez-Angulo. An analog median filter with fuzzy adaptation
209 -- 215D. Lopes de Oliveira, M. Strum, W. J. Chau, W. C. Cunha. Miriã: a CAD tool to synthesize multi-burst controllers for heterogeneous systems
217 -- 223D. Torres, A. Redondo, M. E. Guzmán. MSOH processor for STM-0/STS-1 to STM-4/STS-12: component of a SDH/SONET library
225 -- 233Sima Dimitrijev, Philippe Jamet. Advances in SiC power MOSFET technology
235 -- 241M. Pecovska-Gjorgjevich, N. Novkovski, E. Atanassova. Electrical properties of thin RF sputtered Ta::2::O::5:: films after constant current stress
243 -- 248François Dieudonné, Sébastien Haendler, Jalal Jomaah, Francis Balestra. Low frequency noise in 0.12 mum partially and fully depleted SOI technology
259 -- 267K. S. Kim, S. H. Huh, K. Suganuma. Effects of fourth alloying additive on microstructures and tensile properties of Sn-Ag-Cu alloy and joints with Cu
269 -- 277J. D. Wu, C.-Y. Huang, C. C. Liao. Fracture strength characterization and failure analysis of silicon dies
279 -- 285C. W. Tan, Y. C. Chan, N. H. Yeung. Effect of autoclave test on anisotropic conductive joints
287 -- 295Ajit R. Dhamdhere, Ajay P. Malshe, William F. Schmidt, William D. Brown. Investigation of reliability issues in high power laser diode bar packages
297 -- 305Paiboon Tangyunyong. Thermal modeling of localized laser heating in multi-level interconnects
307 -- 318Bart Vandevelde, Dominiek Degryse, Eric Beyne, Eric Roose, Dorina Corlatan, Guido Swaelen, Geert Willems, Filip Christiaens, Alcatel Bell, Dirk Vandepitte. Modified micro-macro thermo-mechanical modelling of ceramic ball grid array packages
319 -- 326Sasa A. Jankovic, Dejan M. Maksimovic. Power saving modes in modern microcontroller design, diagnostics and reliability
327 -- 332M. M. Shahidul Hassan. Base transit time of an epitaxial n:::+:::pn:::-:::n:::+::: bipolar transistor considering Kirk effect
333 -- 338Sadegh Abbasian, Ebrahim Farjah. A new drain current model for short-channel MOSFETs
339 -- 342Keiji Takagi. A study on 1/f noise spectrum generation in nonlinear transmission media and biomedical systems

Volume 43, Issue 12

1969 -- 1974Clemens J. M. Lasance. Thermally driven reliability issues in microelectronic systems: status-quo and challenges
1975 -- 1980Glenn A. Rinne. Issues in accelerated electromigration of solder bumps
1981 -- 1985Hongguo Zhang, Pant Gurang, Nihdi Sigh, Quvdo Manuel, Robert Wallace, Bruce Gnade, Kevin Stokes. The effect of small-signal AC voltages on C-V characterization and parameter extraction of SiO::2:: thin films
1987 -- 1991X. A. Cao, P. M. Sandvik, S. F. LeBoeuf, S. D. Arthur. Defect generation in InGaN/GaN light-emitting diodes under forward and reverse electrical stresses
1993 -- 2000Y. S. Roh, A. Asiz, W. P. Zhang, Y. Xi. Experimental study and theoretical prediction of aging induced frequency shift of crystal resonators and oscillators
2001 -- 2009Han-Chang Tsai. Reliable study of digital IC circuits with margin voltage among variable DC power supply, electromagnetic interference and conducting wire antenna
2011 -- 2020W. Dauksher, W. S. Burton. An examination of the applicability of the DNP metric on first level reliability assessments in underfilled electronic packages
2021 -- 2029Hua Ye, Douglas C. Hopkins, Cemal Basaran. Measurement of high electrical current density effects in solder joints
2031 -- 2037M. N. Islam, Y. C. Chan, A. Sharif, M. O. Alam. Comparative study of the dissolution kinetics of electrolytic Ni and electroless Ni-P by the molten Sn3.5Ag0.5Cu solder alloy
2039 -- 2045Y. F. Yao, T. Y. Lin, K. H. Chua. Improving the deflection of wire bonds in stacked chip scale package (CSP)
2047 -- 2054Insu Jeon, Qwanho Chung. The study on failure mechanisms of bond pad metal peeling: Part A--Experimental investigation
2055 -- 2064Insu Jeon. The study on failure mechanisms of bond pad metal peeling: Part B--Numerical analysis
2065 -- 2075Kazuto Nishida, Kazumichi Shimizu, Michiro Yoshino, Hideo Koguchi, Nipon Taweejun. Reliability evaluation of ultra-thin CSP using new flip-chip bonding technology--double-sided CSP and single-sided CSP
2077 -- 2086Mohammad Yunus, K. Srihari, J. M. Pitarresi, Anthony Primavera. Effect of voids on the reliability of BGA/CSP solder joints
2087 -- 2096E. H. Wong, Ranjan Rajoo. Moisture absorption and diffusion characterisation of packaging materials--advanced treatment

Volume 43, Issue 1

1 -- 16Harry A. Schafft, Linda M. Head, Jason Gill, Timothy D. Sullivan. Early reliability assessment by using deep censoring
17 -- 41Michael W. Ruprecht, Guenther Benstetter, Douglas B. Hunt. A review of ULSI failure analysis techniques for DRAMs. Part II: Defect isolation and visualization
43 -- 47C.-T. Wu, A. Mieckowski, R. S. Ridley, G. Dolny, T. Grebs, J. Linn, J. Ruzyllo. Effect of nitridation on the reliability of thick gate oxides
49 -- 55Emil V. Jelenkovic, K. Y. Tong, W. Y. Cheung, S. P. Wong. Degradation of RuO::2:: thin films in hydrogen atmosphere at temperatures between 150 and 250 degreeC
57 -- 60N. A. Hastas, C. A. Dimitriadis, J. Brini, G. Kamarinos, V. K. Gueorguiev, S. Kaschieva. Effects of gamma-ray irradiation on polycrystalline silicon thin-film transistors
61 -- 69V. A. Vashchenko, A. Concannon, M. ter Beek, P. Hopper. LVTSCR structures for latch-up free ESD protection of BiCMOS RF circuits
71 -- 79D. Trémouilles, G. Bertrand, M. Bafleur, Felix Beaudoin, Philippe Perdu, N. Guitard, L. Lescouzères. TCAD and SPICE modeling help solve ESD protection issues in analog CMOS technology
81 -- 87P. Cova, Roberto Menozzi, M. Portesine. Power p-i-n diodes for snubberless application: H:::+::: irradiation for soft and reliable reverse recovery
89 -- 98S. Forster, T. Lequeu, R. Jérisian. Degradation mechanism of power devices under di/dt thermal shocks: turn-on of a TRIAC in Q3
99 -- 110G. Romo, T. Smy, D. Walkey, B. Reid. Modeling facet heating in ridge lasers
111 -- 115A. Cazarré, F. Lépinois, A. Marty, S. Pinel, J. Tasselli, J. P. Bailbé, J. R. Morante, F. Murray. Electrical qualification of new ultrathin integration techniques
117 -- 121M. Karilahti. Neural net analysis of integrated circuit yield dependence on CMOS process control parameters
123 -- 130Kuo-Ming Chen, Kuo-Ning Chiang. Impact of probing procedure on flip chip reliability
131 -- 139Chi-Hui Chien, Yung-Chang Chen, Yii-Tay Chiou, Thaiping Chen, Chi-Chang Hsieh, Jia-Jin Yan, Wei-Zhi Chen, Yii-Der Wu. Influences of the moisture absorption on PBGA package s warpage during IR reflow process
141 -- 153Harry K. Charles Jr., K. J. Mach, S. J. Lehtonen, Arthur S. Francomacaro, J. S. DeBoy, R. L. Edwards. Wirebonding at higher ultrasonic frequencies: reliability and process implications
155 -- 162Thomas D. Moore, John L. Jarvis. Thermomechanical deformation of a bimaterial plate--as applied to laminate IC assemblies
163 -- 166David C. T. Or, P. T. Lai, J. K. O. Sin, Paul C. K. Kwok, J. P. Xu. Enhanced reliability for low-temperature gate dielectric of MOS devices by N::2::O or NO plasma nitridation
167 -- 171Roland Sorge. Implant dose monitoring by MOS C-V measurement
173 -- 177T. Beauchêne, D. Lewis, Felix Beaudoin, V. Pouget, Philippe Perdu, Pascal Fouillat, Y. Danto. A physical approach on SCOBIC investigation in VLSI