Journal: Microelectronics Reliability

Volume 50, Issue 9-11

1191 -- 1192Giovanni Busatto, Francesco Iannuzzo. Editorial
1193 -- 1198Carlos Algora. Reliability of III-V concentrator solar cells
1199 -- 1202James H. Stathis, M. Wang, K. Zhao. Reliability of advanced high-k/metal-gate n-FET devices
1203 -- 1209U. Scheuermann, S. Schuler. Power cycling results for different control strategies
1210 -- 1214R. M. Kho, A. J. Moonen, V. M. Girault, Jaap Bisschop, E. H. T. Olthof, S. Nath, Z. N. Liang. Determination of the stress level for voltage screen of integrated circuits
1215 -- 1218J. Torras Flaquer, Jean-Marc Daveau, Lirida A. B. Naviner, Philippe Roche. Fast reliability analysis of combinatorial logic circuits using conditional probabilities
1219 -- 1222G. G. dos Santos, E. Crespo Marques, Lirida A. B. Naviner, Jean-François Naviner. Using error tolerance of target application for efficient reliability improvement of digital circuits
1223 -- 1229Digeorgia N. da Silva, André Inácio Reis, Renato P. Ribas. Gate delay variability estimation method for parametric yield improvement in nanometer CMOS technology
1230 -- 1235M. Catelani, L. Ciani, V. Luongo. The FMEDA approach to improve the safety assessment according to the IEC61508
1236 -- 1240A. Deyine, Kevin Sanchez, Philippe Perdu, F. Battistella, Dean Lewis. CADless laser assisted methodologies for failure analysis and device reliability
1241 -- 1246Rodrigo Possamai Bastos, Gilles Sicard, Fernanda Lima Kastensmidt, Marc Renaudin, Ricardo Reis. Asynchronous circuits as alternative for mitigation of long-duration transient faults in deep-submicron technologies
1247 -- 1250E. Crespo Marques, Lirida A. B. Naviner, Jean-François Naviner. An efficient tool for reliability improvement based on TMR
1251 -- 1258L. Larcher, A. Padovani. High-kappa related reliability issues in advanced non-volatile memories
1259 -- 1262L. Gerrer, M. Rafik, G. Ribes, G. Ghibaudo, E. Vincent. Unified soft breakdown MOSFETs compact model: From experiments to circuit simulation
1263 -- 1266J. Martín-Martínez, E. Amat, M. B. Gonzalez, P. Verheyen, R. Rodríguez, M. Nafría, X. Aymerich, E. Simoen. SPICE modelling of hot-carrier degradation in Si::1-::::x::Ge::x:: S/D and HfSiON based pMOS transistors
1267 -- 1272Stanislav Tyaginov, Ivan Starkov, Oliver Triebl, J. Cervenka, C. Jungemann, S. Carniello, J. M. Park, Hubert Enichlmair, Markus Karner, Ch. Kernstock, E. Seebacher, Rainer Minixhofer, Hajdin Ceric, Tibor Grasser. Interface traps density-of-states as a vital component for hot-carrier degradation modeling
1273 -- 1277Rosario Rao, Fernanda Irrera. Threshold voltage instability in high-k based flash memories
1278 -- 1282Ninoslav Stojadinovic, D. Dankovic, I. Manic, A. Prijic, V. Davidovic, S. Djoric-Veljkovic, S. Golubovic, Z. Prijic. Threshold voltage instabilities in p-channel power VDMOSFETs under pulsed NBT stress
1283 -- 1289S. F. Wan Muhamad Hatta, N. Soin, D. Abd Hadi, J. F. Zhang. NBTI degradation effect on advanced-process 45 nm high-k PMOSFETs with geometric and process variations
1290 -- 1293Jin Young Kim, Jun-Seok Oh, Won-Ju Cho, Jong-Tae Park. NBTI and hot carrier effect of Schottky-barrier p-MOSFETs
1294 -- 1297E. Miranda, E. O Connor, P. K. Hurley. Exploratory analysis of the breakdown spots spatial distribution in metal gate/high-K/III-V stacks using functional summary statistics
1298 -- 1303Paulo F. Butzen, Vinícius Dal Bem, André Inácio Reis, Renato P. Ribas. Transistor network restructuring against NBTI degradation
1304 -- 1308B. Li, A. Boyer, S. Bendhia, C. Lemoine. Ageing effect on electromagnetic susceptibility of a phase locked loop
1309 -- 1311J. Y. Seo, J. E. Seok, W. S. Kim, N. H. Cha, J. S. Kang, B. S. So. PMOSFET anti-fuse using GIDL-induced-HEIP mechanism
1312 -- 1315M. Lanza, M. Porti, M. Nafría, X. Aymerich, E. Whittaker, B. Hamilton. UHV CAFM characterization of high-k dielectrics: Effect of the technique resolution on the pre- and post-breakdown electrical measurements
1316 -- 1319Dong Wook Kim, Woo Sang Park, Jong-Tae Park. The optimum fin width in p-MuGFETs with the consideration of NBTI and hot carrier degradation
1320 -- 1326M. Bellotti, R. Mariani. How future automotive functional safety requirements will impact microprocessors design
1327 -- 1331Feifei He, Cher Ming Tan. Modeling the effect of barrier thickness and low-k dielectric on circuit reliability using 3D model
1332 -- 1335C. M. Fu, C. M. Tan, S. H. Wu, H. B. Yao. Width dependence of the effectiveness of reservoir length in improving electromigration for Cu/Low-k interconnects
1336 -- 1340Y. C. Tan, Cher Ming Tan, Xiaowu Zhang, Tai-Chong Chai, D. Q. Yu. Electromigration performance of Through Silicon Via (TSV) - A modeling approach
1341 -- 1346Muhammad Bashir, Linda S. Milor, Dae-Hyun Kim, Sung Kyu Lim. Methodology to determine the impact of linewidth variation on chip scale copper/low-k backend dielectric breakdown
1347 -- 1351A. Podgaynaya, R. Rudolf, B. Elattari, Dionyz Pogany, Erich Gornik, M. Stecher, M. Strasser. Single pulse energy capability and failure modes of n- and p-channel LDMOS with thick copper metallization
1352 -- 1354Y. C. Tan, C. M. Tan, T. C. Ng. Addressing the challenges in solder resistance measurement for electromigration test
1355 -- 1358J. R. Lloyd, N. A. Connelly, Xiaoli He, K. J. Ryan, B. H. Wood. Fast diffusers in a thermal gradient (solder ball)
1359 -- 1366Harald Gossner, Werner Simbürger, M. Stecher. System ESD robustness by co-design of on-chip and on-board protection measures
1367 -- 1372T. Cilento, M. Schenkel, C. Yun, R. Mishra, Junjun Li, Kiran V. Chatty, Robert Gauthier. Simulation of ESD protection devices in an advanced CMOS technology using a TCAD workbench based on an ESD calibration methodology
1373 -- 1378Augusto Tazzoli, M. Cordoni, P. Colombo, C. Bergonzoni, Gaudenzio Meneghesso. Time-To-Latch-Up investigation of SCR devices as ESD protection structures on 65 nm technology platform
1379 -- 1382J. Bourgeat, Christophe Entringer, Philippe Galy, M. Bafleur, D. Marin-Cudraz. Evaluation of the ESD performance of local protections based on SCR or bi-SCR with dynamic or static trigger circuit in 32 nm
1383 -- 1387Sandeep Sangameswaran, Jeroen De Coster, Guido Groeseneken, Ingrid De Wolf. Impact of design factors and environment on the ESD sensitivity of MEMS micromirrors
1388 -- 1392Philippe Galy, Sylvain Dudit, Michel Vallet, Ph. Larre, M. Bilinski, E. Petit, J. Beltritti, A. Dray, J. Jimenez, F. Jezequel, R. Chevallier, C. Boutonnat, V. Varo. Inventory of silicon signatures induced by CDM event on deep sub-micronic CMOS-BICMOS technologies
1393 -- 1397Bo Song, Yan Han, Shurong Dong, Fei Ma, Mingliang Li, Meng Miao, Kehan Zhu. Compact MOS-triggered SCR with faster turn-on speed for ESD protection
1398 -- 1406Anna Cavallini, Laura Polenta, Antonio Castaldini. Charge carrier recombination and generation analysis in materials and devices by electron and optical beam microscopy
1407 -- 1412Mauro Ciappa, Alexander Koschik, Maurizio Dapor, Wolfgang Fichtner. Modeling secondary electron images for linewidth measurement by critical dimension scanning electron microscopy
1413 -- 1416C. Cassidy, J. Teva, J. Kraft, F. Schrank. Through Silicon Via (TSV) defect investigations using lateral emission microscopy
1417 -- 1421Frank Zachariasse, Gerben Boon, Gaël Faggion, Keith Sarault. Laser modulation mapping on an unmodified laser scanning microscope
1422 -- 1426Joy Y. Liao, Steven Kasapi, Bruce Cory, Howard L. Marks, Yin S. Ng. Scan chain failure analysis using laser voltage imaging
1427 -- 1430Scrgey Bychikhin, G. Haberfehlner, J. Rhayem, D. Vanderstraeten, R. Gillon, Dionyz Pogany. Investigation of smart power DMOS devices under repetitive stress conditions using transient thermal mapping and numerical simulation
1431 -- 1435Philippe Perdu, Jerome Di-Battista, Sylvain Dudit, Tomonori Nakamura. VLSI functional analysis by dynamic emission microscopy
1436 -- 1440D. Mello, R. Ricciari, M. Aiello, M. Astuto. Case study: Failure analysis for metal corrosion induced by pressure pot test
1441 -- 1445P. Scholz, C. Gallrapp, Uwe Kerst, Ted Lundquist, Christian Boit. Optimizing focused ion beam created solid immersion lenses in bulk silicon using design of experiments
1446 -- 1450J. S. Luo, C. S. Sung, W. S. Hsu, L. Y. Huang, J. D. Russell. Electron beam induced carbon deposition using hydrocarbon contamination for XTEM analysis
1451 -- 1453Yoji Mashiko, Hiroaki Etoh, Akiyoshi Furukawa, Daisuke Nomiyama, Osamu Ichimaru. Study of non-contact nano-probing technique using FIB
1454 -- 1458Rudolf Schlangen, Hervé Deslandes, Ted Lundquist, C. Schmidt, F. Altmann, K. Yu, A. Andreasyan, S. Li. Dynamic lock-in thermography for operation mode-dependent thermally active fault localization
1459 -- 1463M. Fakhri, A.-K. Geinzer, R. Heiderhoff, L. J. Balk. Nanoscale thermally induced stress analysis by complementary Scanning Thermal Microscopy techniques
1464 -- 1468C. Hartmann, M. Wieberneit. Investigation on BIST assisted failure analysis on digital integrated circuits
1469 -- 1473S. Brand, P. Czurratis, P. Hoffrogge, M. Petzold. Automated inspection and classification of flip-chip-contacts using scanning acoustic microscopy
1474 -- 1478J. Postel-Pellerin, R. Laffont, G. Micolau, F. Lalande, A. Regnier, B. Bouteille. Leakage paths identification in NVM using biased data retention
1479 -- 1483Lucio Rossi, M. Riccio, E. Napoli, Andrea Irace, Giovanni Breglio, Paolo Spirito. A novel UIS test system with Crowbar feedback for reduced failure energy in power devices testing
1484 -- 1487R. Kapoor, E. Escobedo-Cousin, S. H. Olsen, S. J. Bull. Characterising gate dielectrics in high mobility devices using novel nanoscale techniques
1488 -- 1493Jae-Seong Jeong, Young Jeon Kim. Failure mechanism of COF based Line Driver IC for Flat Panel Display by contamination
1494 -- 1498Markus Grützner, Christian Burmer, Christof Brillert. Ultra-fast CAD scan chain highlighting for failure analysis assistance
1499 -- 1505Guillaume Celi, Sylvain Dudit, Philippe Perdu, Antoine Reverdy, Thierry Parrassin, Emmanuel Bechet, Dean Lewis, Michel Vallet. Facing the defect characterization and localization challenges of bridge defects on a submicronic technology (45 nm and below)
1506 -- 1510Zoubir Khatir, L. Dupont, A. Ibrahim. Investigations on junction temperature estimation based on junction voltage measurements
1511 -- 1513Roland Biberger, Guenther Benstetter, Holger Goebel, Alexander Hofer. Intermittent-contact capacitance spectroscopy - A new method for determining C(V) curves with sub-micron lateral resolution
1514 -- 1519David J. Smith, David A. Cullen, Lin Zhou, Martha R. McCartney. Applications of TEM imaging, analysis and electron holography to III-nitride HEMT devices
1520 -- 1522M. Faqir, M. Bouya, N. Malbert, Nathalie Labat, D. Carisetti, B. Lambert, G. Verzellesi, Fausto Fantini. Analysis of current collapse effect in AlGaN/GaN HEMT: Experiments and numerical simulations
1523 -- 1527Valerio Di Lecce, Michele Esposto, Matteo Bonaiuti, Gaudenzio Meneghesso, Enrico Zanoni, Fausto Fantini, Alessandro Chini. Experimental and simulated dc degradation of GaN HEMTs by means of gate-drain and gate-source reverse bias stress
1532 -- 1537M. Bouarroudj-Berkani, D. Othman, Stéphane Lefebvre, S. Moumen, Zoubir Khatir, T. Ben Sallah. Ageing of SiC JFET transistors under repetitive current limitation conditions
1538 -- 1542Matteo Meneghini, D. Barbisan, Y. Bilenko, M. Shatalov, J. Yang, R. Gaska, Gaudenzio Meneghesso, Enrico Zanoni. Defect-related degradation of Deep-UV-LEDs
1543 -- 1547B. Lambert, G. Jonsson, J. Bataille, C. Ollivier, P. Mezenge, H. Derewonko, H. Thomas, D. Floriot, H. Blanck, C. Moreau. Reliability of high voltage/high power L/S-band Hbt technology
1548 -- 1553G. A. Koné, B. Grandchamp, C. Hainaut, F. Marc, C. Maneux, Nathalie Labat, T. Zimmer, Virginie Nodjiadjim, Jean Godin. Preliminary results of storage accelerated aging test on InP/InGaAs DHBT
1554 -- 1558S. Ghosh, F. Marc, C. Maneux, B. Grandchamp, G. A. Koné, T. Zimmer. Thermal aging model of InP/InGaAs/InP DHBT
1559 -- 1562Manuel Vázquez, Neftalí Núñez, E. Nogueira, A. Borreguero. Degradation of AlInGaP red LEDs under drive current and temperature accelerated life tests
1563 -- 1567Heinz-Christoph Neitzert. ESD sensitivity of AlGaAs and InGaAsP based Fabry-Perot laser diodes
1568 -- 1573R. Baillot, Y. Deshayes, L. Béchou, T. Buffeteau, I. Pianet, C. Armand, F. Voillot, S. Sorieul, Y. Ousten. Effects of silicone coating degradation on GaN MQW LEDs performances using physical and chemical analyses
1574 -- 1576O. Latry, P. Dherbécourt, K. Mourgues, H. Maanane, J. P. Sipma, F. Cornu, Ph. Eudeline, M. Masmoudi. A 5000 h RF life test on 330 W RF-LDMOS transistors for radars applications
1577 -- 1580G. Sasso, M. Costagliola, N. Rinaldi. Avalanche multiplication and pinch-in models for simulating electrical instability effects in SiGe HBTs
1587 -- 1592C. Moreau, M. Le Pipec, S. Tence, J. Hemery, J. Rigo, C. Guérin, D. Ruelloux, C. Schneider, P. Le Helleye. A complete methodology for assessing GaN behaviour for military applications
1593 -- 1598R. Gaddi, R. Van Kampen, A. Unamuno, V. Joshi, D. Lacey, M. Renault, C. Smith, R. Knipe, D. Yost. MEMS technology integrated in the CMOS back end
1599 -- 1603J. Iannacci, A. Repchankova, A. Faes, Augusto Tazzoli, Gaudenzio Meneghesso, Gian-Franco Dalla Betta. Enhancement of RF-MEMS switch reliability through an active anti-stiction heat-based mechanism
1604 -- 1608Augusto Tazzoli, M. Barbato, F. Mattiuzzo, V. Ritrovato, Gaudenzio Meneghesso. Study of the actuation speed, bounces occurrences, and contact reliability of ohmic RF-MEMS switches
1609 -- 1614A. Koszewski, F. Souchon, Ch. Dieppedale, T. Ouisse. Modeling of dielectric charging in electrostatic MEMS switches
1615 -- 1620U. Zaghloul, M. Koutsoureli, H. Wang, Fabio Coccetti, G. Papaioannou, Patrick Pons, Robert Plana. Assessment of dielectric charging in electrostatically driven MEMS devices: A comparison of available characterization techniques
1621 -- 1625Yuji Sasaki, Mauro Ciappa, Takayuki Masunaga, Wolfgang Fichtner. Accurate extraction of the mechanical properties of thin films by nanoindentation for the design of reliable MEMS
1626 -- 1630K. Wada, Y. Yagi, I. Nakagawa, T. Atsumi, N. Ohno. Analysis of thermal expansion in elastic and elastoplastic layers subjected to cyclic thermal loading
1631 -- 1635L. Sauter, A. Seekamp, Y. Shibata, Y. Kanameda, H. Yamashita. Whisker mitigation measures for Sn-plated Cu for different stress tests
1636 -- 1640Y. Yang, R. Labie, F. Ling, C. Zhao, A. Radisic, Jan Van Olmen, Youssef Travaly, Bert Verlinden, Ingrid De Wolf. Processing assessment and adhesion evaluation of copper through-silicon vias (TSVs) for three-dimensional stacked-integrated circuit (3D-SIC) architectures
1641 -- 1644B. Czerny, G. Khatibi, B. Weiss, T. Licht. A fast test technique for life time estimation of ultrasonically welded Cu-Cu interconnects
1645 -- 1649Changwoon Han, Chulmin Oh, Nochang Park, Wonsik Hong. Creep lifetime prediction of solder joint for heat sink assembly
1650 -- 1653J. Virkki, T. Seppälä, P. Raumonen. Testing the effects of reflow on tantalum capacitors
1654 -- 1660Xiaosong Ma, Kaspar M. B. Jansen, G. Q. Zhang, Willem D. van Driel, Olaf van der Sluis, Leo J. Ernst, C. Regards, Christian Gautier, Hélène Frémont. A fast moisture sensitivity level qualification method
1661 -- 1665B. Dompierre, W. C. Maia Filho, M. Brizoux, V. Aubin, E. Charkaluk. Thermal ageing induces drastic changes on mechanical and damage behavior of Sn3.0Ag0.5Cu alloy
1666 -- 1671Javad Zarbakhsh, Balamurugan Karunamurthy, Carlos O. Trejo-Caballero, Endre Barti, Thomas Detzel. Microscopic stress simulation of non-planar chip technologies
1672 -- 1677Paolo Emilio Bagnoli, Y. Zhang. Electro-thermal simulation of metal interconnections under high current flow
1678 -- 1683R. L. J. M. Ubachs. Electromigration in WLCSP solder bumps
1684 -- 1687Michael Goroll, Reinhard Pufall. New aspects in characterization of adhesion of moulding compounds on different surfaces by using a simple button-shear-test method for lifetime prediction of power devices
1688 -- 1691A. Aubert, J. P. Rebrasse, L. Dantas de Morais, Nathalie Labat, Hélène Frémont. Failure analysis case study on a Cu/low-k technology in package: New front-side approach using laser and plasma de-processing
1692 -- 1696Mohamed Matmat, K. Koukos, Fabio Coccetti, T. Idda, Antoine Marty, Christophe Escriba, Jean-Yves Fourniols, Daniel Estève. Life expectancy and characterization of capacitive RF MEMS switches
1697 -- 1699C. Keller, S. Tus. Investigation of open bond wires in MEMS devices
1700 -- 1705F. Infante, Philippe Perdu, Dean Lewis. Magnetic microscopy for ground plane current detection: a fast and reliable technique for current leakage localization by means of magnetic simulations
1706 -- 1710E. Kamara, H. Lu, C. Bailey, C. Hunt, D. Di Maio, O. Thomas. A multi-disciplinary study of vibration based reliability of lead-free electronic interconnects
1711 -- 1714J. Virkki, A. Koskenkorva, L. Frisk. Development of a matrix test board for capacitor reliability testing
1715 -- 1719Reinhold Bayerer. Advanced packaging yields higher performance and reliability in power electronics
1720 -- 1724F. Bertoluzza, Paolo Cova, Nicola Delmonte, P. Pampili, M. Portesine. Coupled measurement-simulation procedure for very high power fast recovery - Soft behavior diode design and testing
1725 -- 1730M. Riccio, Lucio Rossi, Andrea Irace, E. Napoli, Giovanni Breglio, Paolo Spirito, R. Tagami, Y. Mizuno. Analysis of large area Trench-IGBT current distribution under UIS test with the aid of lock-in thermography
1731 -- 1737Carmine Abbate, Giovanni Busatto, Francesco Iannuzzo. IGBT RBSOA non-destructive testing methods: Analysis and discussion
1738 -- 1743F. Carastro, Alberto Castellazzi, J. C. Clare, P. W. Wheeler. Control technique for power device electro-thermal stress minimisation in non-linear load variable-frequency resonant power converters
1744 -- 1749Pascal Lecuyer, Hélène Frémont, Jean-Pierre Landesman, Manoubi Auguste Bahi. Wearout estimation using the Robustness Validation methodology for components in 150 degreeC ambient automotive applications
1750 -- 1757Vezio Malandruccolo, Mauro Ciappa, Hubert Rothleitner, M. Hommel, Wolfgang Fichtner. A new built-in screening methodology for Successive Approximation Register Analog to Digital Converters
1758 -- 1762R. Charavel, J. Roig, S. Mouhoubi, P. Gassot, F. Bauwens, P. Vanmeerbeek, B. Desoete, P. Moens, Eddy De Backer. Next generation of Deep Trench Isolation for Smart Power technologies with 120 V high-voltage devices
1763 -- 1767M. A. Belaïd, K. Daoud. Evaluation of hot-electron effects on critical parameter drifts in power RF LDMOS transistors
1768 -- 1772D. Martineau, T. Mazeaud, M. Legros, Ph. Dupuy, C. Levade. Characterization of alterations on power MOSFET devices under extreme electro-thermal fatigue
1773 -- 1777C. Ronsisvalle, V. Enea. Improvement of high-voltage junction termination extension (JTE) by an optimized profile of lateral doping (VLD)
1778 -- 1782Mirko Bernardoni, Nicola Delmonte, Paolo Cova, Roberto Menozzi. Thermal modeling of planar transformer for switching power converters
1783 -- 1788H. Gualous, R. Gallay, G. Alcicek, Boubekeur Tala-Ighil, A. Oukaour, B. Boudart, Ph. Makany. Supercapacitor ageing at constant temperature and constant voltage and thermal shock
1789 -- 1795A. Testa, S. De Caro, S. Panarello, S. Patanè, Sebastiano Russo, D. Patti, S. Poma, Romeo Letor. Reliability of planar, Super-Junction and trench low voltage power MOSFETs
1796 -- 1803O. Briat, J.-M. Vinassa, N. Bertrand, H. El Brouji, J.-Y. Delétage, Eric Woirgard. Contribution of calendar ageing modes in the performances degradation of supercapacitors during power cycling
1804 -- 1809L. Dupont, J. L. Blanchard, R. Lallemand, G. Coquery, Jean-Michel Morelle, G. Blondel, B. Rouleau. Experimental and numerical results correlation during extreme use of power MOSFET designed for avalanche functional mode
1810 -- 1814M. Tounsi, A. Oukaour, Boubekeur Tala-Ighil, H. Gualous, B. Boudart, D. Aissani. Characterization of high-voltage IGBT module degradations under PWM power cycling test at high ambient temperature
1815 -- 1821Yassine Belmehdi, Stephane Azzopardi, Jean-Yves Deletage, Eric Woirgard. Experimental electro-mechanical static characterization of IGBT bare die under controlled temperature
1822 -- 1831J. L. Autran, D. Munteanu, Philippe Roche, Gilles Gasiot, S. Martinie, S. Uznanski, S. Sauze, S. Semikh, E. Yakushev, S. Rozov, P. Loaiza, G. Warot, M. Zampaolo. Soft-errors induced by terrestrial neutrons and natural alpha-particle emitters in advanced memory circuits at ground level
1832 -- 1836M. Bagatin, Simone Gerardin, Alessandro Paccagnella, G. Cellere, F. Irom, D. N. Nguyen. Destructive events in NAND Flash memories irradiated with heavy ions
1837 -- 1841Simone Gerardin, M. Bagatin, Alessandro Paccagnella, G. Cellere, A. Visconti, M. Bonanomi. Impact of total dose on heavy-ion upsets in floating gate arrays
1842 -- 1847G. Busatto, G. Currò, Francesco Iannuzzo, A. Porzio, A. Sanseverino, Francesco Velardi. Experimental study and numerical investigation on the formation of single event gate damages induced on medium voltage power MOSFET
1848 -- 1851L. Michalas, G. J. Papaioannou, Apostolos T. Voutsas. Degradation of polycrystalline silicon TFTs due to alpha particles irradiation stress
1852 -- 1856Joaquín Alvarado, E. Boufouss, Valeria Kilchytska, Denis Flandre. Compact model for single event transients and total dose effects at high temperatures for partially depleted SOI MOSFETs
1857 -- 1860S. Libertino, D. Corso, G. Murè, A. Marino, F. Palumbo, F. Principato, G. Cannella, T. Schillaci, S. Giarusso, F. Celi, M. Lisiansky, Y. Roizin, Salvatore Lombardo. Radiation effects in nitride read-only memories
1861 -- 1865Gianluca Generali, Raffaella Capelli, Stefano Toffanin, Antonio Facchetti, Michele Muccini. Ambipolar field-effect transistor based on alpha, omega-dihexylquaterthiophene and alpha, omega-diperfluoroquaterthiophene vertical heterojunction
1866 -- 1870A. Cester, D. Bari, J. Framarin, N. Wrachien, Gaudenzio Meneghesso, S. Xia, V. Adamovich, J. J. Brown. Thermal and electrical stress effects of electrical and optical characteristics of Alq3/NPD OLED
1871 -- 1874Cher Ming Tan, Boon Khai Eric Chen, Kok Peng Toh. Humidity study of a-Si PV cell
1875 -- 1879P. Espinet, Carlos Algora, José Ramón González, Neftalí Núñez, Manuel Vázquez. Degradation mechanism analysis in temperature stress tests on III-V ultra-high concentrator solar cells using a 3D distributed model
1880 -- 1883Neftalí Núñez, Manuel Vázquez, José Ramón González, Carlos Algora, P. Espinet. Novel accelerated testing method for III-V concentrator solar cells
1884 -- 1887X. Boddaert, B. Bensaid, P. Benaben, R. Gwoziecki, R. Coppard. Mechanical and thermal reliability of printed organic thin-film transistor
1888 -- 1893H. Youssef, A. Ferrand, P. Calmon, Patrick Pons, Robert Plana. Methods to improve reliability of bulge test technique to extract mechanical properties of thin films
1894 -- 1898S. Padovani, A. Del Negro, M. Antonipieri, S. Sinesi, R. Campesato, M. C. Casale, G. Gabetta, G. Gori. Triple junction InGaP/InGaAs/Ge solar cells for high concentration photovoltaics application: Degradation tests of solar receivers
1899 -- 1902Mahyar Boostandoost, Uwe Kerst, Christian Boit. Extraction of local thin-film solar cell parameters by bias-dependent IR-LBIC
1903 -- 1906Laura Lancellotti, Raffaele Fucci, Antonio Romano, Angelo Sarno, Santolo Daliento. Induced degradation on c-Si solar cells for concentration terrestrial applications

Volume 50, Issue 8

1039 -- 1053John Keane, Tae-Hyoung Kim, Xiaofei Wang, Chris H. Kim. On-chip reliability monitors for measuring circuit degradation
1054 -- 1061Wing-Shan Tam, Oi-Ying Wong, Chi-Wah Kok, Hei Wong. Generating sub-1V reference voltages from a resistorless CMOS bandgap reference circuit by using a piecewise curvature temperature compensation technique
1062 -- 1070Lining Zhang, Jian Zhang, Yan Song, Xinnan Lin, Jin He, Mansun Chan. Charge-based model for symmetric double-gate MOSFETs with inclusion of channel doping effect
1071 -- 1076Hong Wu, Qinsong Qian, Siyang Liu, Weifeng Sun, Longxing Shi. Devices optimization against hot-carrier degradation in high voltage pLEDMOS transistor
1077 -- 1080Chenyue Ma, Hao Wang, Chenfei Zhang, Xiufang Zhang, Jin He, Xing Zhang. Temperature dependence of the interface state distribution due to hot carrier effect in FinFET device
1081 -- 1086J. P. Xu, X. Xiao, P. T. Lai. A carrier-mobility model for high-k gate-dielectric Ge MOSFETs with metal gate electrode
1087 -- 1093Hongxia Liu, Baojun Tang, Yue Hao. Characteristics analysis and optimization design of a new ESD power clamp circuit
1094 -- 1097Jian Wang, Wenhua Wang, Ru Huang, Yunpeng Pei, Shoubin Xue, Xin an Wang, Chunhui Fan, Yangyuan Wang. Deteriorated radiation effects impact on the characteristics of MOS transistors with multi-finger configuration
1098 -- 1102Min-Ching Chu, Jagan Singh Meena, Chih-Chia Cheng, Hsin-Chiang You, Feng-Chih Chang, Fu-Hsiang Ko. Plasma-enhanced flexible metal-insulator-metal capacitor using high-k ZrO::2:: film as gate dielectric with improved reliability
1103 -- 1106E. Herth, B. Legrand, L. Buchaillot, N. Rolland, T. Lasri. Optimization of SiN::X::: H films deposited by PECVD for reliability of electronic, microsystems and optical applications
1107 -- 1110Yeu-Jent Hu, Chia-Hui Fang, Jen-Cheng Wang, Hung-Lun Lo, Tzer-En Nee. Exciton wavefunction coupled surface plasmon resonance for In-rich InGaN film with perforated aluminum cylindrical micropillar arrays
1111 -- 1115Yu-Ming Chang, Hua-Chiang Wen, Chu-Shou Yang, Derming Lian, Chien-Huang Tsai, Jyh-Shyang Wang, Wen-Fa Wu, Chang-Pin Chou. Evaluating the abrasive wear of Zn::1-::::x::Mn::x::O heteroepitaxial layers using a nanoscratch technique
1121 -- 1124J. Virkki, S. Tuukkanen. Testing the effects of temperature cycling on tantalum capacitors
1125 -- 1133Jussi Hokka, Toni T. Mattila, Jue Li, Jarmo Teeri, Jorma K. Kivilahti. A novel impact test system for more efficient reliability testing
1134 -- 1141Mansur Ahmed, Tama Fouzder, Ahmed Sharif, Asit Kumar Gain, Y. C. Chan. Influence of Ag micro-particle additions on the microstructure, hardness and tensile properties of Sn-9Zn binary eutectic solder alloy
1142 -- 1145C. Wei, Y.-C. Liu, L. M. Yu, H. Chen, X. Wang. Effects of Al on the failure mechanism of the Sn-Ag-Zn eutectic solder
1146 -- 1151Cheng-Fu Yu, Chi-Ming Chan, Ker-Chang Hsieh. The effect of tin grain structure on whisker growth
1152 -- 1158Kati Kokko, Anniina Parviainen, Laura Frisk. Corrosion protection of anisotropically conductive adhesive joined flip chips
1159 -- 1162H. W. Tseng, C. T. Lu, Y. H. Hsiao, P. L. Liao, Y. C. Chuang, T.-Y. Chung, C. Y. Liu. Electromigration-induced failures at Cu/Sn/Cu flip-chip joint interfaces
1163 -- 1170Li-Na Ji, Yi Gong, Zhen-Guo Yang. Failure investigation on copper-plated blind vias in PCB
1171 -- 1180Alireza Rohani, Hamid R. Zarandi. Two effective methods to mitigate soft error effects in SRAM-based FPGAs
1181 -- 1188Surendra S. Rathod, Ashok K. Saxena, Sudeb Dasgupta. A proposed DG-FinFET based SRAM cell design with RadHard capabilities
1189 -- 0Nebojsa D. Jankovic. Carbon Nanotubes: Science and Applications, M. Meyyappan (Ed.). CRC Press LLC (2005), 289 pp., 103.13, Hardcover, ISBN: 0-8493-2111-5

Volume 50, Issue 7

891 -- 892Artur Wymyslowski. Guest Editorial: 2009 EuroSimE international conference on thermal, mechanical and multi-physics simulation and experiments in micro-electronics and micro-systems
893 -- 899Hai Bo Fan, Matthew M. F. Yuen. A multi-scale approach for investigation of interfacial delamination in electronic packages
900 -- 909Bernhard Wunderle, E. Dermitzaki, O. Hölck, Jörg Bauer, H. Walter, Q. Shaik, K. Rätzke, F. Faupel, Bernd Michel, Herbert Reichl. Molecular dynamics approach to structure-property correlation in epoxy resins for thermo-mechanical lifetime modeling
910 -- 916J. de Vreugd, Kaspar M. B. Jansen, Leo J. Ernst, C. Bohm. Prediction of cure induced warpage of micro-electronic products
917 -- 922Sander Noijen, Roy Engelen, Joerg Martens, Alexandru Opran, Olaf van der Sluis, Richard B. R. van Silfhout. Prediction of the epoxy moulding compound aging effect on package reliability
923 -- 927Daoguo Yang, Martien Kengen, W. G. M. Peels, David Heyes, W. D. van Driel. Reliability modeling on a MOSFET power package based on embedded die technology
928 -- 936Ahmer Syed, Tong Yan Tee, Hun Shen Ng, Rex Anderson, Choong Peng Khoo, Boyd Rogers. Advanced analysis on board trace reliability of WLCSP under drop impact
937 -- 947D. Farley, Y. Zhou, F. Askari, M. Al-Bassyiouni, A. Dasgupta, J. F. J. Caers, J. W. C. DeVries. Copper trace fatigue models for mechanical cycling, vibration and shock/drop of high-density PWAs
949 -- 953Yang-Hua Chang, Shih-Wei Lin, Chia-Hao Chang. Optimization of high voltage LDMOSFETs with complex multiple-resistivity drift region and field plate
954 -- 958Xiao Zou, Guojia Fang, Longyan Yuan, Xingsheng Tong, Xingzhong Zhao. Improved electrical characteristics and reliability of amorphous InGaZnO metal-insulator-semiconductor capacitor with high kappa HfO::x::N::y:: gate dielectric
959 -- 964Shih-Chun Yang, Pang Lin, Chien-Ping Wang, Sheng Bang Huang, Chiu-Ling Chen, Pei-Fang Chiang, An-Tse Lee, Mu-Tao Chu. Failure and degradation mechanisms of high-power white light emitting diodes
965 -- 970A. Chakraborty, C. K. Sarkar. Electron transport in two dimensional electron gas formed at the heterojunction of Al::x::Ga::(1-::::x::::)::N/GaN at microwave frequencies
971 -- 977M. Reza Javaheri, Reza Sedaghat. Strength violation effect on soft-error detection in sub-micron technology
978 -- 985Satyanarayan Iyer, Krishnaswami Srihari. Assembly reliability assessment and life estimation for a stacked area array device
986 -- 994Yue Ying Ong, Soon Wee Ho, Kripesh Vaidyanathan, Vasarla Nagendra Sekhar, Ming Chinq Jong, Samuel Lim Yak Long, Vincent Lee Wen Sheng, Leong Ching Wai, Vempati Srinivasa Rao, Jimmy Ong, Xuefen Ong, Xiaowu Zhang, Yoon Uk Seung, John H. Lau, Yeow Kheng Lim, David Yeo, Kai Chong Chan, Zhang Yanfeng, Juan Boon Tan, Dong Kyun Sohn. Design, assembly and reliability of large die and fine-pitch Cu/low-k flip chip package
995 -- 999Wen-Bin Young. Modeling of a non-Newtonian flow between parallel plates in a flip chip encapsulation
1000 -- 1006Tung T. Nguyen, Donggun Lee, Jae B. Kwak, SeungBae Park. Effect of glue on reliability of flip chip BGA packages under thermal cycling
1014 -- 1020Hu Guojun, Roberto Rossi, Jing-en Luan, Xavier Baraton. Interface delamination analysis of TQFP package during solder reflow
1021 -- 1027Bo Zhang, Pinkuan Liu, Han Ding, Wenwu Cao. Modeling of board-level package by Finite Element Analysis and laser interferometer measurements
1028 -- 1038Da Yu, Jae B. Kwak, SeungBae Park, John Lee. Dynamic responses of PCB under product-level free drop impact

Volume 50, Issue 6

757 -- 0Peter Ersland, Roberto Menozzi. Editorial
758 -- 762Sefa Demirtas, Jungwoo Joh, Jesús A. del Alamo. High voltage degradation of GaN High Electron Mobility Transistors on silicon substrate
763 -- 766Reza Pazirandeh, Joachim Würfl, Günther Tränkle. Determination of GaN HEMT reliability by monitoring I::DSS::
767 -- 773Jungwoo Joh, Feng Gao, Tomás Palacios, Jesús A. del Alamo. A model for the critical voltage for electrical degradation of GaN high electron mobility transistors
775 -- 789R. L. de Orio, Hajdin Ceric, Siegfried Selberherr. Physically based models of electromigration: From Black s equation to modern TCAD models
790 -- 793Kuniyuki Kakushima, K. Tachi, Parhat Ahmet, Kazuo Tsutsui, Nobuyuki Sugii, Takeo Hattori, Hiroshi Iwai. Advantage of further scaling in gate dielectrics below 0.5 nm of equivalent oxide thickness with La::2::O::3:: gate dielectrics
794 -- 800E. Atanassova, N. Novkovski, Albena Paskaleva, D. Spassov. Constant current stress-induced leakage current in mixed HfO::2::-Ta::2::O::5:: stacks
801 -- 806J. S. Yuan, J. Ma. Voltage stress effect on class AB power amplifier and mixed-signal sample-hold circuit
807 -- 812J. S. Yuan, J. Ma, W. K. Yeh, C. W. Hsu. Impact of strain on hot electron reliability of dual-band power amplifier and integrated LNA-mixer RF performances
821 -- 830Shih-Hung Chen, Ming-Dou Ker. Investigation on NMOS-based power-rail ESD clamp circuits with gate-driven mechanism in a 0.13-µm CMOS technology
831 -- 838Chun-Yu Lin, Ming-Dou Ker, Yuan-Wen Hsiao. Design of differential low-noise amplifier with cross-coupled-SCR ESD protection scheme
839 -- 846Mu-Chun Wang, Chuan-Hsi Liu, Kuo-Shu Huang, Zhen-Ying Hsieh, Shuang-Yuan Chen, Hsin-Chia Yang, Chii-Ruey Lin. Promoting of charged-device model/electrostatic discharge immunity in the dicing saw process
847 -- 850Hsien-Chin Chiu, Chih-Wei Yang, Chao-Hung Chen, Che-Kai Lin, Jeffrey S. Fu, Hsing-Yuan Tu, Shiang-Feng Tang. High thermal stability AlGaAs/InGaAs enhancement-mode pHEMT using palladium-gate technology
851 -- 856Bo-Ching He, Hua-Chiang Wen, Meng-Hung Lin, Yi-Shao Lai, Wen-Fa Wu, Chang-Pin Chou. Effect of annealing treatment and nanomechanical properties for multilayer Si::0.8::Ge::0.2::-Si films
857 -- 863Anindya Ghoshal, William H. Prosser, Heung-Soo Kim, Aditi Chattopadhyay, Ben Copeland. Development of embedded piezoelectric acoustic sensor array architecture
864 -- 871Ville Pekkanen, Kimmo Kaija, Matti Mäntysalo, Esa Kunnari, Juha Niittynen, Pauliina Mansikkamäki. Functional fluid jetting performance optimization
872 -- 880De-Shin Liu, Chi-Min. Chang, John Liu, Shu-Ching Ho, Hao-Yin Tsai. Novel analysis model for investigation of contact force and scrub length for design of probe card
881 -- 886K.-H. Allers. Intrinsic and extrinsic reliability of a serial connection of capacitors
887 -- 890H.-Y. Wang, X. M. Xiong, J. X. Zhang. 3-based devices

Volume 50, Issue 5

583 -- 0Juin J. Liou, Chao Sung Lai. Editorial
584 -- 588Tzu-I Tsai, Horng-Chih Lin, Min-Feng Jian, Tiao-Yuan Huang, Tien-Sheng Chao. A simple method for sub-100 nm pattern generation with I-line double-patterning technique
589 -- 593Sheng-Lyang Jang, Chia-Wei Chang, Yi-Jhe Song, Cheng-Chen Liu, Chun-Wei Hsu. On the injection methods in a top-series-injection-locked frequency divider
594 -- 598Sheng-Lyang Jang, Cheng-Chen Liu, Ren-Kai Yang, Chih-Chieh Shih, Chia-Wei Chang, Hsiu-An Yeh. A 0.35 µm CMOS divide-by-2 quadrature injection-locked frequency divider based on voltage-current feedback topology
599 -- 602C.-H. Liu, H. W. Chen. Electrical characteristics and reliability properties of metal-oxide-semiconductor capacitors with HfZrLaO gate dielectrics
603 -- 606Bing-Yue Tsui, Pei-Yu Wang, Ting-Yeh Chen, Jung-Chien Cheng. Multi-gate non-volatile memories with nanowires as charge storage material
607 -- 609H. J. Hung, J. B. Kuo, D. Chen, C.-S. Yeh. Gate tunneling leakage current behavior of 40 nm PD SOI NMOS device considering the floating body effect
610 -- 613Bo-Chin Wang, Ting-Kuo Kang, San Lein Wu, Shoou-Jinn Chang. Tensile CESL-induced strain dependence on impact ionization efficiency in nMOSFETs
614 -- 617H. W. Chen, C.-H. Liu. Impact of Hf content on positive bias temperature instability reliability of HfSiON gate dielectrics
618 -- 621Chia-Wei Hsu, Yean-Kuen Fang, Wen-Kuan Yeh, Chun-Yu Chen, Yen-Ting Chiang, Feng-Renn Juang, Chien Ting Lin, Chieh-Ming Lai. Improvement of TDDB reliability, characteristics of HfO::2:: high-k/metal gate MOSFET device with oxygen post deposition annealing
622 -- 626Wing-Shan Tam, Oi-Ying Wong, Tsz-Ching Ng, Chi-Wah Kok, Hei Wong. Analysis of ESD discharge current distribution and area optimization of VDMOS gate protection structure
627 -- 630Oi-Ying Wong, Wing-Shan Tam, Jun Liu, Oi-Kan Shea, Shiu Hung Cheung, Chi-Wah Kok, Hei Wong. Modeling of high-frequency characteristics for epoxy-sealed micro vacuum capacitors
631 -- 634Hsien-Chin Chiu, Chao-Hung Chen, Chih-Wei Yang, Jeffrey S. Fu, Cheng-Shun Wang. Electrical and reliability characteristics of GaAs MOSHEMTs utilizing high-k IIIB and IVB oxide layers
635 -- 638Chih-Hong Hwang, Yiming Li, Ming-Hung Han. Statistical variability in FinFET devices with intrinsic parameter fluctuations
639 -- 642Jer-Chyi Wang, Pai-Chi Chou, Chao Sung Lai, Wen-Hui Lee, Chi-Fong Ai. Characteristics optimization of N::2::O annealing on tungsten nanocrystal with W/Si dual-sputtered method for nonvolatile memory application
643 -- 646S. Z. Rahaman, S. Maikap. Low power resistive switching memory using Cu metallic filament in Ge::0.2::Se::0.8:: solid-electrolyte
647 -- 651Kuo-Fu Lee, Yiming Li, Tien-Yeh Li, Zhong-Cheng Su, Chin-Hong Hwang. Device and circuit level suppression techniques for random-dopant-induced static noise margin fluctuation in 16-nm-gate SRAM cell
652 -- 656Jagan Singh Meena, Min-Ching Chu, Jitendra N. Tiwari, Hsin-Chiang You, Chung-Hsin Wu, Fu-Hsiang Ko. Flexible metal-insulator-metal capacitor using plasma enhanced binary hafnium-zirconium-oxide as gate dielectric layer
657 -- 661Ming-Hung Han, Yiming Li, Chih-Hong Hwang. The impact of high-frequency characteristics induced by intrinsic parameter fluctuations in nano-MOSFET device and circuit
662 -- 665Po-Chin Huang, San Lein Wu, Shoou-Jinn Chang, Yao Tsung Huang, Chien Ting Lin, Mike Ma, Osbert Cheng. Electrical characteristics of nMOSFETs fabricated on hybrid orientation substrate with amorphization/templated recrystallization method
666 -- 669Tseng-Chin Lee, Bing-Yue Tsui, Pei-Jer Tzeng, Ching-Chiun Wang, Ming-Jinn Tsai. A process for high yield and high performance carbon nanotube field effect transistors
670 -- 673Kou-Chen Liu, Wen-Hsien Tzeng, Kow-Ming Chang, Yi-Chun Chan, Chun-Chih Kuo, Chun-Wen Cheng. The resistive switching characteristics of a Ti/Gd::2::O::3::/Pt RRAM device
674 -- 678S. K. Ray, R. K. Singha, S. Das, S. Manna, A. Dhar. Ge based nanostructures for electronic and photonic devices
679 -- 682Ray-Ming Lin, Yung-Hsiang Lin, Chung-Hao Chiang, Mu-Jen Lai, Yi-Lun Chou, Yuan-Chieh Lu, Shou-Yi Kuo, Bor-Ren Fang, Meng-Chyi Wu. Inserting a low-temperature n-GaN underlying layer to separate nonradiative recombination centers improves the luminescence efficiency of blue InGaN/GaN LEDs
683 -- 687Cheng-Chen Lin, Liann-Be Chang, Ming-Jer Jeng, Chia-Yi Yen, Atanu Das, Chung Yi Tang, Ming-Yi Tsai, Mu-Jen Lai. Fabrication and thermal analysis of flip-chip light-emitting diodes with different numbers of Au stub bumps
688 -- 691Hung-Pin D. Yang, Zao-En Yeh, Gray Lin, Hao-Chung Kuo, Jim Y. Chi. InGaAs submonolayer quantum-dot photonic-crystal LEDs for fiber-optic communications
692 -- 695Pin-Hsiang Chiu, Chien-Jung Huang, Cheng-Fu Yang, Teen-Hang Meen, Yeong-Her Wang. Red polymer light-emitting devices based on dye-dispersed poly (9, 9-dioctylfluorene-alt-benzothiadiazole)
696 -- 698Peng-Yu Chen, Herng Yih Ueng, Meiso Yokoyama. High efficiency p-i-n organic light-emitting diodes with a novel n-doping layer
699 -- 703Hui-Wen Cheng, Yiming Li. Optimization on configuration of surface conduction electron-emitters
704 -- 708Chun-Yu Wu, Ta-Chuan Liao, Ming-H Yu, Sheng-Kai Chen, Chung-Min Tsai, Huang-Chung Cheng. Field enhancement of omega-shaped-gated poly-Si TFT SONOS memory fabricated by a simple sidewall spacer formation
709 -- 712Chyuan Haur Kao, T. C. Chan, Kung Shao Chen, Yu-Teng Chung, Wen-Shih Luo. 3 polyoxide deposited on polycrystalline silicon
713 -- 716Meng Zhang, Mingxiang Wang. An investigation of drain pulse induced hot carrier degradation in n-type low temperature polycrystalline silicon thin film transistors
717 -- 721Henry J. H. Chen, Ming-Tien Huang, Y. B. Liu. Fabrication of Au/PEDOT stacked electrodes for organic thin film transistors by imprinting technology
722 -- 725Hung-Pin D. Yang, Chih-Tsung Shih, Su-Mei Yang, Tsin-Dong Lee. High-power broad-area InGaNAs/GaAs quantum-well lasers in the 1200 nm range
726 -- 729Cheng-Ling Lee, Kuo-Hsiang Lin, Nan-Kuang Chen. Analysis of optical properties of fundamental-mode in waveguide tapered fibers
730 -- 733Shou-Yi Kuo, Kou-Chen Liu, Fang-I Lai, Jui-Fu Yang, Wei-Chun Chen, Ming-Yang Hsieh, Hsin-I Lin, Woei-Tyng Lin. Effects of RF power on the structural, optical and electrical properties of Al-doped zinc oxide films
734 -- 737Tsung-Han Tsai, Huey-Ing Chen, Kun-Wei Lin, Tai-You Chen, Chien-Chang Huang, Kai-Siang Hsu, Wen-Chau Liu. A hydrogen sensor based on a metamorphic high electron mobility transistor (MHEMT)
738 -- 741Cheng-En Lue, Jer-Chyi Wang, Dorota G. Pijanowska, Chia-Ming Yang, I-Shun Wang, Huang-Chia Lee, Chao Sung Lai. Hysteresis effect on traps of Si::3::N::4:: sensing membranes for pH difference sensitivity
742 -- 746Tseng-Fu Lu, Jer-Chyi Wang, Chia-Ming Yang, Chung-Po Chang, Kuan-I Ho, Chi-Fong Ai, Chao Sung Lai. Non-ideal effects improvement of SF::6:: plasma treated hafnium oxide film based on electrolyte-insulator-semiconductor structure for pH-sensor application
747 -- 752S. Maikap, A. Prakash, W. Banerjee, Anirban Das, C.-S. Lai. Characteristics of pH sensors fabricated by using protein-mediated CdSe/ZnS quantum dots
753 -- 756Jung-Chuan Chou, Hung-Yu Yang, Cheng-Wei Chen. Glucose biosensor of ruthenium-doped TiO::2:: sensing electrode by co-sputtering system

Volume 50, Issue 4

455 -- 0Massimo Vanzi. Editorial
456 -- 461David Veyrié, Olivier Gilard, Kevin Sanchez, Sébastien Lhuillier, Frédéric Bourcier. New methodology for the assessment of the thermal resistance of laser diodes and light emitting diodes
462 -- 466Daniel T. Cassidy, Chadwick K. Hall, Othman Rehioui, Laurent Bechou. Strain estimation in III-V materials by analysis of the degree of polarization of luminescence
467 -- 470Matteo Meneghini, Nicola Trivellin, Kenji Orita, Masaaki Yuri, Tsuyoshi Tanaka, Daisuke Ueda, Enrico Zanoni, Gaudenzio Meneghesso. Reliability evaluation for Blu-Ray laser diodes
471 -- 478G. Mura, Massimo Vanzi. The interpretation of the DC characteristics of LED and laser diodes to address their failure analysis
479 -- 480Tong Yan Tee, Xuejun Fan, Yi-Shao Lai. Advances in Wafer Level Packaging (WLP)
481 -- 488Cheng-Ta Ko, Kuan-Neng Chen. Wafer-level bonding/stacking technology for 3D integration
489 -- 497Li-Cheng Shen, Chien-Wei Chien, Hsien-Chie Cheng, Chia-Te Lin. Development of three-dimensional chip stacking technology using a clamped through-silicon via interconnection
498 -- 506Theresa Sze, Darko Popovic, Jing Shi, Yi-Shao Lai, James G. Mitchell, Bruce Guenin, Tsung-Yueh Tsai, Chin-Li Kao, Matthew Giere. Early experience with in situ chip-to-chip alignment characterization of Proximity Communication flip-chip package
507 -- 513Changsoo Jang, Byeng Dong Youn, Ping F. Wang, Bongtae Han, Suk-Jin Ham. Forward-stepwise regression analysis for fine leak batch testing of wafer-level hermetic MEMS packages
514 -- 521Yong Liu. Trends of power semiconductor wafer level packaging
522 -- 527Jiunn Chen, Yi-Shao Lai, Chueh-An Hsieh, Chia Yi Hu. Redistribution in wafer level chip size packaging technology for high power device applications: Process and design considerations
528 -- 535Hendrik Pieter Hochstenbach, Willem D. van Driel, D. G. Yang, J. J. M. Zaal, E. Bagerman. Designing for reliability using a new Wafer Level Package structure
536 -- 546X. J. Fan, B. Varia, Q. Han. Design and optimization of thermo-mechanical reliability in wafer level packaging
547 -- 555P. Dandu, X. J. Fan, Y. Liu, C. Diao. Finite element modeling on electromigration of solder joints in wafer level packages
556 -- 563Hao-Yuan Chang, Wen-Fung Pan, Meng-Kai Shih, Yi-Shao Lai. Geometric design for ultra-long needle probe card for digital light processing wafer testing
564 -- 576Y. A. Su, L. B. Tan, T. Y. Tee, V. B. C. Tan. Rate-dependent properties of Sn-Ag-Cu based lead-free solder joints for WLCSP

Volume 50, Issue 3

317 -- 323Michael Pecht, Rubyca Jaai. A prognostics and health management roadmap for information and electronics-rich systems
324 -- 331Tongdan Jin, Haitao Liao, Madhu Kilari. Reliability growth modeling for in-service electronic systems considering latent failure modes
332 -- 337Yusuke Kobayashi, Kuniyuki Kakushima, Parhat Ahmet, V. Ramgopal Rao, Kazuo Tsutsui, Hiroshi Iwai. Analysis of dependence of short-channel effects in double-gate MOSFETs on channel thickness
338 -- 345Saeed Mohammadi, Ali Afzali-Kusha. Modeling of drain current, capacitance and transconductance in thin film undoped symmetric DG MOSFETs including quantum effects
346 -- 350W. S. Lau, Peizhen Yang, Eng Hua Lim, Yee Ling Tang, Seow Wei Lai, V. L. Lo, S. Y. Siah, L. Chan. Observation of halo implant from the drain side reaching the source side and vice versa in extremely short p-channel transistors
351 -- 355S. Karatas, A. Türüt. The frequency-dependent electrical characteristics of interfaces in the Sn/p-Si metal semiconductor structures
356 -- 359Kuniyuki Kakushima, K. Okamoto, T. Koyanagi, M. Kouda, K. Tachi, T. Kawanago, J. Song, Parhat Ahmet, Hiroshi Nohira, Kazuo Tsutsui, Nobuyuki Sugii, Takeo Hattori, Hiroshi Iwai. SrO capping effect for La::2::O::3::/Ce-silicate gate dielectrics
360 -- 364B. Benbakhti, J. S. Ayubi-Moak, Karol Kalna, D. Lin, G. Hellings, G. Brammertz, K. De Meyer, I. Thayne, Asen Asenov. Impact of interface state trap density on the performance characteristics of different III-V MOSFET architectures
365 -- 369Xiang Liu, Jiann-shiun Yuan, Juin J. Liou. Electro-thermal stress effect on InGaP/GaAs heterojunction bipolar low-noise amplifier performance
370 -- 375Yang-Hua Chang, Jian-Wen Chen. Extraction of VBIC model parameters for InGaAsSb DHBTs
376 -- 390Feifei He, Cher Ming Tan. Circuit level interconnect reliability study using 3D circuit model
391 -- 397X. Dong, P. Zhu, Z. Li, J. Sun, J. D. Boyd. Electromigration-induced stress in a confined bamboo interconnect with randomly distributed grain sizes
398 -- 406Yeong K. Kim, In-Soo Park, Jooho Choi. Warpage mechanism analyses of strip panel type PBGA chip packaging
407 -- 414Taho Yang, Yuan-Ting Cheng. The use of Mahalanobis-Taguchi System to improve flip-chip bumping height inspection efficiency
415 -- 423Seyyed Javad Seyyed Mahdavi, Karim Mohammadi. Reliability enhancement of digital combinational circuits based on evolutionary approach
424 -- 437Anirban Sengupta, Reza Sedaghat, Zhipeng Zeng. A high level synthesis design flow with a novel approach for efficient design space exploration in case of multi-parametric optimization objective
438 -- 446Injoong Kim. Reliability Object Model Tree (ROM-Tree): A system design-for-reliability method

Volume 50, Issue 2

161 -- 168Sachin Kumar, Eli Dolev, Michael Pecht. Parameter selection for health monitoring of electronic products
169 -- 173G. Langfelder. Design of a fully CMOS compatible 3-µm size color pixel
174 -- 178Yang-Hua Chang, Kun-Ying Yang. Extraction of bias-dependent parasitic source/drain resistance in MOSFETs with an advanced mobility model
179 -- 182Zhongfa Ma, Peng Zhang, Yong Wu, Weihua Li, Yiqi Zhuang, Lei Du. A percolation study of RTS noise amplitudes in nano-MOSFETs by Monte Carlo simulation
183 -- 189Martin Sauter, Joost Willemen. Simulation and modelling of VDMOSFET self protection under TLP-stress
190 -- 194Despina C. Moschou, Giannis P. Kontogiannopoulos, Dimitrios N. Kouvatsos, Apostolos T. Voutsas. On the importance of the V::g, max::-V::th:: parameter on LTPS TFT stressing behavior
199 -- 206Samrat L. Sabat, Siba K. Udgata, K. P. N. Murthy. Small signal parameter extraction of MESFET using quantum particle swarm optimization
207 -- 210Yu. N. Novikov, A. V. Vishnyakov, V. A. Gritsenko, K. A. Nasyrov, Hei Wong. Modeling the charge transport mechanism in amorphous Al::2::O::3:: with multiphonon trap ionization effect
211 -- 216A. A. Dakhel. 3 thin films
217 -- 219J. Virkki, T. Seppälä, L. Frisk, P. Heino. Accelerated testing for failures of tantalum capacitors
220 -- 227Toshihide Takahashi, Shuichi Komatsu, Hiroshi Nishikawa, Tadashi Takemoto. Thin film joining for high-temperature performance of power semi-conductor devices
228 -- 234J. de Vries, W. Balemans, W. D. van Driel. Predictive modeling of board level shock-impact reliability of the HVQFN-family
235 -- 241Oliver Krammer, Bálint Sinkovics. Improved method for determining the shear strength of chip component solder joints
242 -- 250Seunghyun Cho, Tae-Eun Chang, Joseph Y. Lee, Hyung-Pil Park, Youngbae Ko, GyunMyoung Park. New dummy design and stiffener on warpage reduction in Ball Grid Array Printed Circuit Board
251 -- 257Lijuan Liu, Wei Zhou, Hongbo Zhang, Baoling Li, Ping Wu. Electromigration behavior in Cu/Sn-8Zn-3Bi/Cu solder joint
258 -- 265Hyomi Kim, Jongmin Kim, Jooheon Kim. Effects of novel carboxylic acid-based reductants on the wetting characteristics of anisotropic conductive adhesive with low melting point alloy filler
266 -- 272Chiao-Tzu Huang, K. S. Chen, Tsang-Chuan Chang. An application of DMADV methodology for increasing the yield rate of surveillance cameras
273 -- 281Hongge Li, Wei Zhao, Youguang Zhang. Micropower fully integrated CMOS readout interface for neural recording application
282 -- 291N. P. Futane, Shubhajit Roy Chowdhury, C. Roy Chowdhury, Hiranmay Saha. ANN based CMOS ASIC design for improved temperature-drift compensation of piezoresistive micro-machined high resolution pressure sensor
292 -- 303Mile K. Stojcev, Igor Z. Milovanovic, Emina I. Milovanovic, T. R. Nikolic. Address generators for linear systolic array
304 -- 311Oana Boncalo, Alexandru Amaricai, Mihai Udrescu, Mircea Vladutiu. Quantum circuit s reliability assessment with VHDL-based simulated fault injection
312 -- 315Adelmo Ortiz-Conde, Francisco J. García-Sánchez, Juin J. Liou, Ching-Sung Ho. Integration-based approach to evaluate the sub-threshold slope of MOSFETs

Volume 50, Issue 12

1907 -- 1914Piyas Samanta, Chunxiang Zhu, Mansun Chan. 2 gate dielectric stacks
1915 -- 1919Mingzhi Dai, Kinleong Yap. Observation and mechanism explanation of the parasitic charge pumping current
1920 -- 1923Masamichi Suzuki, Masato Koyama, Atsuhiro Kinoshita. Detailed investigation of the effects of La and Al content on the electrical characteristics and reliability properties of La-Al-O gate dielectrics
1924 -- 1930P. S. Das, Abhijit Biswas. x films on n-GaAs substrates
1931 -- 1934Kow-Ming Chang, Wen-Hsien Tzeng, Kou-Chen Liu, Yi-Chun Chan, Chun-Chih Kuo. Investigation on the abnormal resistive switching induced by ultraviolet light exposure based on HfOx film
1935 -- 1941Qinsong Qian, Weifeng Sun, Jing Zhu, Longxing Shi. Investigation of the shift of hot spot in lateral diffused LDMOS under ESD conditions
1942 -- 1950Hongxia Liu, Bin Li, Jin Li, Bo Yuan. A comparative study of self-heating effect of nMOSFETs fabricated on SGOI and SGSOAN substrates
1951 -- 1960Chun-Jen Weng. Feasible approach for processes integration of CMOS transistor gate/side-wall spacer patterning fabrication
1961 -- 1966A. Alaeddine, M. Kadi, K. Daoud, B. Beydoun. Characteristics degradation of the SiGe HBT under electromagnetic field stress
1967 -- 1972Brian P. Downey, Suzanne E. Mohney, Trevor E. Clark, Joseph R. Flemish. Reliability of aluminum-bearing ohmic contacts to SiC under high current density
1973 -- 1976Srikanth Ravipati, Chang-Jung Kuo, Jiann Shieh, Cheng-Tung Chou, Fu-Hsiang Ko. Fabrication and enhanced field emission properties of novel silicon nanostructures
1977 -- 1983G. S. Wood, I. Gual, P. Parmiter, R. Cheung. Temperature stability of electro-thermally and piezoelectrically actuated silicon carbide MEMS resonators
1984 -- 1987Maw-Shung Lee, Sean Wu, Shih-Bin Jhong, Kuan-Ting Liu, Ruyen Ro, Chia-Chi Shih, Zhi-Xun Lin, Kang-I Chen, Shou-Chang Cheng. Influence of substrate temperature to prepare (1 0 3) oriented AlN films
1988 -- 1993Youngrae Kim, Sung-Keun Kang, Sarah Eunkyung Kim. Study of thinned Si wafer warpage in 3D stacked wafers
1994 -- 2000J. S. Karppinen, J. Li, Toni T. Mattila, Mervi Paulasto-Kröckel. Thermomechanical reliability characterization of a handheld product in accelerated tests and use environment
2001 -- 2011Sari Merilampi, Toni Björninen, Veikko Haukka, Pekka Ruuskanen, Leena Ukkonen, Lauri Sydänheimo. Analysis of electrically conductive silver ink on stretchable substrates under tensile load
2012 -- 2019Kuen-Suan Chen, C.-C. Wang, C. H. Wang, C. F. Huang. Application of RPN analysis to parameter optimization of passive components
2020 -- 2025Yaowu Shi, Yanfu Yan, Jianping Liu, Zhidong Xia, Yongping Lei, Fu Guo, Xiaoyan Li. Constitutive modeling on creep deformation for a SnPb-based composite solder reinforced with microsized Cu particles
2026 -- 2036Krishna Tunga, Suresh K. Sitaraman. Laser moiré interferometry for fatigue life prediction of lead-free solders
2037 -- 2050Tz-Cheng Chiu, Jyun-Ji Lin, Hung-Chun Yang, Vikas Gupta. Reliability model for bridging failure of Pb-free ball grid array solder joints under compressive load
2051 -- 2058Tama Fouzder, Asit Kumar Gain, Y. C. Chan, Ahmed Sharif, Winco K. C. Yung. 3 additions on the microstructure, hardness and shear strength of eutectic Sn-9Zn solder on Au/Ni metallized Cu pads
2059 -- 2070Y.-L. Shen, K. Aluru. Numerical study of ductile failure morphology in solder joints under fast loading conditions
2071 -- 2077Liang Zhang, Song-bai Xue, Li-li Gao, Zhong Sheng, Sheng-lin Yu, Yan Chen, Wei Dai, Feng Ji, Zeng Guang. Reliability study of Sn-Ag-Cu-Ce soldered joints in quad flat packages
2078 -- 2083Seok Hwan Lee, Jaeyong Sung, Sarah Eunkyung Kim. Dynamic flow measurements of capillary underfill through a bump array in flip chip package
2084 -- 2089Jose Maria Garcia del Pozo, Santiago Celma, Aránzazu Otín, I. Lope, J. Urdangarín. 1.8 V-3 GHz CMOS limiting amplifier with efficient frequency compensation
2090 -- 2092Ya. I. Alivov, Qian Fan, Xianfeng Ni, Sergey A. Chevtchenko, I. B. Bhat, Hadis Morkoç. n-Al0.15Ga0.85 N/p-6H-SiC heterostructure and based bipolar transistor
2093 -- 2097Jeffrey S. Fu, Dong-Hua Yang, Chin-I Yeh, Nemai C. Karmakar, Jui-Ching Cheng, Kuo-Sheng Chin, Hsien-Chin Chiu, Jian Kang Xiao. Electromechanical controlled phased array dumbbell EBG beam steerer

Volume 50, Issue 1

1 -- 20C. D. Breach, F. Wulff. A brief review of selected aspects of the materials science of ball bonding
21 -- 25Hee-Dong Kim, Ho-Myoung An, Yujeong Seo, Yongjie Zhang, Jong-Sun Park, Tae-Geun Kim. Hydrogen passivation effects under negative bias temperature instability stress in metal/silicon-oxide/silicon-nitride/silicon-oxide/silicon capacitors for flash memories
26 -- 31Guido Notermans, Theo Smedes, Zeljko Mrcarica, Peter C. de Jong, Ralph Stephan, Hans van Zwol, Dejan M. Maksimovic. ESD protection for thin gate oxides in 65 nm
32 -- 38J. Vobecký, V. Záhlava, V. Komarnitskyy. Doping compensation for increased robustness of fast recovery silicon diodes
39 -- 44Ilbilge Dökme, S. Altindal, T. Tunç, I. Uslu. Temperature dependent electrical and dielectric properties of Au/polyvinyl alcohol (Ni, Zn-doped)/n-Si Schottky diodes
45 -- 47Jie Liu, Jicheng Zhou, Hongwei Luo, Xuedong Kong, Yunfei En, Qian Shi, Yujuan He. Total-dose-induced edge effect in SOI NMOS transistors with different layouts
48 -- 56Hui-Wen Tsai, Ming-Dou Ker. Design of 2xVDD-tolerant mixed-voltage I/O buffer against gate-oxide reliability and hot-carrier degradation
57 -- 62F. Alagi. DMOS FET parameter drift kinetics from microscopic modeling
63 -- 69Bo-Ching He, Chun-Hu Cheng, Hua-Chiang Wen, Yi-Shao Lai, Ping-Feng Yang, Meng-Hung Lin, Wen-Fa Wu, Chang-Pin Chou. Evaluation of the nanoindentation behaviors of SiGe epitaxial layer on Si substrate
70 -- 74Yang-Hua Chang, Rong-Hao Syu. Simulation of electrical characteristics of InP double-heterojunction bipolar transistors with InGaAsSb base
75 -- 85Sébastien Gallois-Garreignot, Vincent Fiori, D. Nelias. Fracture phenomena induced by Front-End/Back-End interactions: Dedicated failure analysis and numerical developments
86 -- 97Robin Alastair Amy, Guglielmo S. Aglietti, Guy Richardson. Accuracy of simplified printed circuit board finite element models
98 -- 105C. Y. Khor, M. Abdul Mujeebu, M. Z. Abdullah, F. Che Ani. Finite volume based CFD simulation of pressurized flip-chip underfill encapsulation process
106 -- 115De-Shin Liu, Zhen-Wei Zhuang, Ching-Yang Chen, Cho-Liang Chung. Modeling of multi-layered structure containing heterogeneous material layer with randomly distributed particles using infinite element method
116 -- 126Dominik Herkommer, Jeff M. Punch, Michael Reid. A reliability model for SAC solder covering isothermal mechanical cycling and thermal cycling conditions
127 -- 139Mei-Ling Wu. Design of experiments to investigate reliability for solder joints PBGA package under high cycle fatigue
140 -- 148Mei-Ling Wu, Donald Barker. Rapid assessment of BGA life under vibration and bending, and influence of input parameter uncertainties
149 -- 159Syed Zafar Shazli, Mehdi Baradaran Tahoori. Using Boolean satisfiability for computing soft error rates in early design stages