Journal: Microelectronics Reliability

Volume 47, Issue 9-11

1311 -- 1312Nathalie Labat, André Touboul. Editorial
1313 -- 1321Michael G. Khazhinsky. ESD protection strategies in advanced CMOS SOI ICs
1322 -- 1329D. Goguenheim, D. Pic, Jean-Luc Ogier. Oxide reliability below 3 nm for advanced CMOS: Issues, characterization, and solutions
1330 -- 1335Jaap Bisschop. Reliability methods and standards
1336 -- 1342Cher Ming Tan, Nagarajan Raghavan. An approach to statistical analysis of gate oxide breakdown mechanisms
1343 -- 1348P. Solomalala, J. Saiz, Michel Mermet-Guyennet, Alberto Castellazzi, Mauro Ciappa, X. Chauffleur, J. P. Fradin. Virtual reliability assessment of integrated power switches based on multi-domain simulation approach
1349 -- 1352J. Martín-Martínez, Simone Gerardin, R. Rodríguez, M. Nafría, X. Aymerich, A. Cester, Alessandro Paccagnella, G. Ghidini. Lifetime estimation of analog circuits from the electrical characteristics of stressed MOSFETs
1353 -- 1357C. Bestory, F. Marc, H. Levi. Statistical analysis during the reliability simulation
1358 -- 1361Z. Wang, P. Zeelen, H. Tigelaar. Importance of multi-temp testing in automotive qualification and zero defects program
1362 -- 1365Stefan Müller, Peter Egger. Investigation of low temperature SRAM and ROM failures to enable the replacement of cold test insertion by room temperature test
1366 -- 1372Arnost Neugroschel, Gennadi Bersuker, Rino Choi. Applications of DCIV method to NBTI characterization
1373 -- 1377D. Pic, D. Goguenheim, Jean-Luc Ogier. A comprehensive study of stress induced leakage current using a floating gate structure for direct applications in EEPROM memories
1378 -- 1383Despina C. Moschou, M. A. Exarchos, Dimitrios N. Kouvatsos, G. J. Papaioannou, Apostolos T. Voutsas. Performance and reliability of SLS ELA polysilicon TFTs fabricated with novel crystallization techniques
1384 -- 1388R. Bottini, S. Costantini, N. Galbiati, A. Ghetti, G. Ghidini, A. Mauri, C. Scozzari, A. Sebastiani. High voltage transistor degradation in NVM pump application
1389 -- 1393R. Moonen, P. Vanmeerbeek, G. Lekens, Ward De Ceuninck, P. Moens, J. Boutsen. Lifetime modeling of intrinsic gate oxide breakdown at high temperature
1394 -- 1399M. Gares, M. A. Belaïd, H. Maanane, M. Masmoudi, J. Marcon, K. Mourgues, Ph. Eudeline. Study of hot-carrier effects on power RF LDMOS device reliability
1400 -- 1405D. Dankovic, I. Manic, V. Davidovic, S. Djoric-Veljkovic, S. Golubovic, Ninoslav Stojadinovic. Negative bias temperature instabilities in sequentially stressed and annealed p-channel power VDMOSFETs
1406 -- 1410M. Alwan, B. Beydoun, K. Ketata, M. Zoaeter. Gate charge behaviors in N-channel power VDMOSFETs during HEF and PBT stresses
1411 -- 1415Sung Jun Jang, Dae Hyun Ka, Chong-Gun Yu, Kwan-Su Kim, Won-Ju Cho, Jong-Tae Park. Comparative study of NBTI as a function of Si film orientation and thickness in SOI pMOSFETs
1416 -- 1418Stefano Aresu, Werner Kanert, Reinhard Pufall, Michael Goroll. Exceptional operative gate voltage induces negative bias temperature instability (NBTI) on n-type trench DMOS transistors
1419 -- 1423A. Boukhenoufa, L. Pichon, C. Cordier. Two-dimensional numerical simulations of 1/f noise by GR mechanisms in thin film transistors: Effects of induced defect technology
1424 -- 1428M. Lanza, M. Porti, M. Nafría, Guenther Benstetter, Werner Frammelsberger, H. Ranzinger, E. Lodermeier, G. Jaschke. Influence of the manufacturing process on the electrical properties of thin (k stacks observed with CAFM
1429 -- 1433Anand Inani, Victor Koldyaev, Spencer Graves. Accelerated testing for time dependent dielectric breakdown (TDDB) evaluation of embedded DRAM capacitors using tantalum pentoxide
1434 -- 1438F. V. Farmakis, Giannis P. Kontogiannopoulos, Dimitrios N. Kouvatsos, Apostolos T. Voutsas. Degradation of double-gate polycrystalline silicon TFTs due to hot carrier stress
1439 -- 1443Hubert Enichlmair, S. Carniello, J. M. Park, Rainer Minixhofer. Analysis of hot carrier effects in a 0.35 µm high voltage n-channel LDMOS transistor
1444 -- 1449Augusto Tazzoli, F. A. Marino, M. Cordoni, A. Benvenuti, P. Colombo, Enrico Zanoni, Gaudenzio Meneghesso. Holding voltage investigation of advanced SCR-based protection structures for CMOS technology
1450 -- 1455Michael Heer, Scrgey Bychikhin, W. Mamanee, Dionyz Pogany, A. Heid, P. Grombach, M. Klaussner, W. Soppa, B. Ramler. Experimental and numerical analysis of current flow homogeneity in low voltage SOI multi-finger gg-NMOS and NPN ESD protection devices
1456 -- 1461Yuan Gao, Nicolas Guitard, Christophe Salamero, Marise Bafleur, Laurent Bary, Laurent Escotte, Patrick Gueulle, Lionel Lescouzères. Identification of the physical signatures of CDM induced latent defects into a DC-DC converter using low frequency noise measurements
1462 -- 1467P. Coppens, G. Jenicot, H. Casier, F. De Pestel, F. Depuydt, N. Martens, P. Moens. TLP Characterization of large gate width devices
1468 -- 1472J. R. Lloyd. Black s law revisited - Nucleation and growth in electromigration failure
1473 -- 1477Linda Milor, Changsoo Hong. Backend dielectric breakdown dependence on linewidth and pattern density
1478 -- 1482Changsoo Hong, Linda Milor. Modeling of the breakdown mechanisms for porous copper/low-k process flows
1483 -- 1491Cadmus A. Yuan, Olaf van der Sluis, G. Q. (Kouchi) Zhang, Leo J. Ernst, Willem D. van Driel, Richard B. R. van Silfhout. Molecular simulation on the material/interfacial strength of the low-dielectric materials
1492 -- 1496Alessandro Marras, M. Impronta, Ilaria De Munari, M. G. Valentini, A. Scorzoni. Reliability assessment of multi-via Cu-damascene structures by wafer-level isothermal electromigration tests
1497 -- 1501Wei Li, Cher Ming Tan. Enhanced finite element modelling of Cu electromigration using ANSYS and matlab
1502 -- 1505Shih-Hung Chen, Ming-Dou Ker. Active ESD protection circuit design against charged-device-model ESD event in CMOS integrated circuits
1506 -- 1511C.-C. Chiu, H. H. Chang, C. C. Lee, C.-C. Hsia, K. N. Chiang. Reliability of interfacial adhesion in a multi-level copper/low-k interconnect structure
1512 -- 1516Michael Goroll, Werner Kanert, Reinhard Pufall, Stefano Aresu. Analysis of ESD protection structure behaviour after ageing as new approach for system level reliability of automotive power devices
1517 -- 1522Felix Beaudoin, Kevin Sanchez, Philippe Perdu. Dynamic laser stimulation techniques for advanced failure analysis and design debug applications
1523 -- 1528Rudolf Schlangen, Uwe Kerst, Christian Boit, T. Malik, R. Jain, Ted Lundquist. Non destructive 3D chip inspection with nano scale potential by use of backside FIB and backscattered electron microscopy
1529 -- 1533A. Pugatschow, R. Heiderhoff, L. J. Balk. Time resolved determination of electrical field distributions within dynamically biased power devices by spectral EBIC investigations
1534 -- 1538Euan Ramsay, K. A. Serrels, M. J. Thomson, A. J. Waddie, R. J. Warburton, M. R. Taghizadeh, D. T. Reid. Three-dimensional nanometric sub-surface imaging of a silicon flip-chip using the two-photon optical beam induced current method
1539 -- 1544V. Dubec, Scrgey Bychikhin, Dionyz Pogany, Erich Gornik, Tilo Brodbeck, Wolfgang Stadler. Backside interferometric methods for localization of ESD-induced leakage current and metal shorts
1545 -- 1549Peter Egger, Markus Grützner, Christian Burmer, Fabien Dudkiewicz. Application of time resolved emission techniques within the failure analysis flow
1550 -- 1554Stephane Bianic, Stéphanie Allemand, Grégory Kerrosa, Pascal Scafidi, Didier Renard. Advanced backside failure analysis in 65 nm CMOS technology
1555 -- 1560Cher Ming Tan, Stanny Yanuar, Tai-Chong Chai. Finite element modeling of capacitive coupling voltage contrast
1565 -- 1568Joy Y. Liao, Howard L. Marks, F. Beaudoin. OBIRCH analysis of electrically stressed advanced graphic ICs
1569 -- 1573S. Debleds, J. P. Rebrasse, L. Dantas de Morais, I. Frapreau, R. Perdreau, B. Morillon. Localization of sensitive areas of power AC switch under thermal laser stimulation
1574 -- 1579Peter Jacob, Giovanni Nicoletti, Florian Hauf. Device decapsulated (and/or depassivated) - Retest ok - What happened?
1580 -- 1584Arijit Roy, Cher Ming Tan, Sean J. O Shea, Kedar Hippalgaonkar, Wulf Hofbauer. Room temperature observation of point defect on gold surface using thermovoltage mapping
1585 -- 1589R. Zelsacher, A. C. G. Wood, E. Bacher, E. Prax, K. Sorschag, J. Krumrey, J. Baumgartl. A novel SIMS based approach to the characterization of the channel doping profile of a trench MOSFET
1590 -- 1594A. Crosson, L. Escotte, M. Bafleur, D. Talbourdet, L. Crétinon, Philippe Perdu, G. Perez. Long-term reliability of silicon bipolar transistors subjected to low constraints
1595 -- 1598C. N. Mc Auley, Andreas Rummel, F. W. Keating, Stephan Kleindiek. 3D failure analysis in depth profiles of sequentially made FIB cuts
1599 -- 1603J. Adrian, N. Rodriguez, F. Essely, G. Haller, C. Grosjean, A. Portavoce, C. Girardeaux. Investigation of a new method for dopant characterization
1604 -- 1608Hung-Sung Lin, Chun-Ming Chen, Kuo-Hsiung Chen, Afung Wang, C. H. Chao. A case study of defects due to process marginalities in deep sub-micron technology
1609 -- 1613C. Le Roux, L. Lopez, Abdellatif Firiti, Jean-Luc Ogier, F. Lalande, R. Laffont, G. Micolau. A new method to quantify retention-failed cells of an EEPROM CAST
1614 -- 1618L. Dantas de Morais, F. Allanic, F. Roqueta, J. P. Rebrasse. Thermal approach of defects generation on copper/organic dielectric interface due to SEM inspections
1619 -- 1624Mitsuo Fukuda. Reliability of semiconductor lasers used in current communication systems and sensing equipment
1625 -- 1629Matteo Meneghini, L. Trevisanello, C. Sanna, G. Mura, Massimo Vanzi, Gaudenzio Meneghesso, Enrico Zanoni. High temperature electro-optical degradation of InGaN/GaN HBLEDs
1630 -- 1633M. Bouya, D. Carisetti, N. Malbert, Nathalie Labat, Philippe Perdu, J. C. Clement, M. Bonnet, G. Pataut. Study of passivation defects by electroluminescence in AlGaN/GaN HEMTS on SiC
1634 -- 1638D. Lachenal, A. Bravaix, F. Monsieur, Yannick Rey-Tauriac. Degradation mechanism understanding of NLDEMOS SOI in RF applications
1639 -- 1642M. Faqir, G. Verzellesi, Fausto Fantini, Francesca Danesin, F. Rampazzo, Gaudenzio Meneghesso, Enrico Zanoni, Anna Cavallini, Antonio Castaldini, Nathalie Labat, A. Touboul, Christian Dua. Characterization and analysis of trap-related effects in AlGaN-GaN HEMTs
1643 -- 1648O. Pajona, Christelle Aupetit-Berthelemot, Jean-Michel Dumas. A study of metamorphic HEMT technological improvements: Impact on parasitic effect electrical models
1649 -- 1652Scrgey Bychikhin, T. Swietlik, T. Suski, S. Porowski, P. Perlin, Dionyz Pogany. Thermal analysis of InGaN/GaN (GaN substrate) laser diodes using transient interferometric mapping
1653 -- 1657P. Burgaud, L. Constancias, G. Martel, C. Savina, D. Mesnager. Preliminary reliability assessment and failure physical analysis on AlGaN/GaN HEMTs COTS
1658 -- 1662Ming-Chih Yew, Chan-Yen Chou, Kuo-Ning Chiang. Reliability assessment for solders with a stress buffer layer using ball shear strength test and board-level finite element analysis
1663 -- 1667W. C. Maia Filho, M. Brizoux, Hélène Frémont, Yves Danto. Torsion test applied for reballing and solder paste volume evaluation
1668 -- 1672Geneviève Duchamp, D. Castagnet, Alain Meresse. Near-field EMC study to improve electronic component reliability
1680 -- 1684Manoubi Auguste Bahi, Pascal Lecuyer, Hélène Frémont, Jean-Pierre Landesman. Sequential environmental stresses tests qualification for automotive components
1685 -- 1689Xiaosong Ma, Kaspar M. B. Jansen, Leo J. Ernst, W. D. van Driel, Olaf van der Sluis, G. Q. Zhang. Characterization of moisture properties of polymers for IC packaging
1690 -- 1695Michel Mermet-Guyennet, X. Perpiñà, M. Piton. Revisiting power cycling test for better life-time prediction in traction
1696 -- 1700Andrea Irace, Giovanni Breglio, Paolo Spirito. New developments of THERMOS:::3:::, a tool for 3D electro-thermal simulation of smart power MOSFETs
1701 -- 1706X. Perpiñà, M. Piton, Michel Mermet-Guyennet, Xavier Jordà, José Millán. Local thermal cycles determination in thermosyphon-cooled traction IGBT modules reproducing mission profiles
1707 -- 1712D. Barlini, Mauro Ciappa, Michel Mermet-Guyennet, Wolfgang Fichtner. Measurement of the transient junction temperature in MOSFET devices under operating conditions
1713 -- 1718Alberto Castellazzi, Mauro Ciappa, Wolfgang Fichtner, M. Piton, Michel Mermet-Guyennet. A study of the threshold-voltage suitability as an application-related reliability indicator for planar-gate non-punch-through IGBTs
1719 -- 1724M. Bouarroudj, Zoubir Khatir, J. P. Ousten, F. Badel, L. Dupont, Stéphane Lefebvre. Degradation behavior of 600 V-200 A IGBT modules under power cycling and high temperature environment conditions
1725 -- 1729J. Urresti-Ibañez, Alberto Castellazzi, M. Piton, J. Rebollo, Michel Mermet-Guyennet, Mauro Ciappa. Robustness test and failure analysis of IGBT modules during turn-off
1730 -- 1734A. Benmansour, Stephane Azzopardi, J. C. Martin, E. Woirgard. Trench IGBT failure mechanisms evolution with temperature and gate resistance under various short-circuit conditions
1735 -- 1740B. Khong, M. Legros, P. Tounsi, Ph. Dupuy, X. Chauffleur, C. Levade, G. Vanderschaeve, E. Scheid. Characterization and modelling of ageing failures on power MOSFET devices
1741 -- 1745M. Holz, G. Hultsch, T. Scherg, R. Rupp. Reliability considerations for recent Infineon SiC diode releases
1746 -- 1750Carmine Abbate, G. Busatto, L. Fratelli, Francesco Iannuzzo, B. Cascone, R. Manzo. The robustness of series-connected high power IGBT modules
1751 -- 1755W. Lajnef, J.-M. Vinassa, O. Briat, H. El Brouji, E. Woirgard. Monitoring fading rate of ultracapacitors using online characterization during power cycling
1756 -- 1760Giovanni Breglio, Andrea Irace, E. Napoli, Paolo Spirito, K. Hamada, T. Nishijima, T. Ueta. Study of a failure mechanism during UIS switching of planar PT-IGBT with current sense cell
1761 -- 1766F. Lang, U. Scheuermann. Reliability of spring pressure contacts under environmental stress
1767 -- 1772L. Dupont, Stéphane Lefebvre, M. Bouaroudj, Zoubir Khatir, Jean-Claude Faugières. Failure modes on low voltage power MOSFETs under high temperature application
1773 -- 1778Ly. Benbahouche, A. Merabet, A. Zegadi. Numerical analysis and comparative study of short circuit stress in IGBTs devices (IR, IXYS)
1779 -- 1783T. Lhommeau, X. Perpiñà, C. Martin, R. Meuret, Michel Mermet-Guyennet, M. Karama. Thermal fatigue effects on the temperature distribution inside IGBT modules for zone engine aeronautical applications
1784 -- 1789X. Perpiñà, Alberto Castellazzi, M. Piton, Michel Mermet-Guyennet, José Millán. Failure-relevant abnormal events in power inverters considering measured IGBT module temperature inhomogeneities
1790 -- 1794Michael Glavanovics, Helmut Köck, Vladimir Kosel, Tobias Smorodin. Flexible active cycle stress testing of smart power switches
1795 -- 1799Jae-Seong Jeong, Soon-Ha Hong, Sang-Deuk Park. Field failure mechanism and improvement of EOS failure of integrated IGBT inverter modules
1800 -- 1805A. Benmansour, Stephane Azzopardi, J. C. Martin, E. Woirgard. A step by step methodology to analyze the IGBT failure mechanisms under short circuit and turn-off inductive conditions using 2D physically based device simulation
1806 -- 1811D. M. Tanner, T. B. Parson, A. D. Corwin, Jeremy A. Walraven, J. W. Wittwer, B. L. Boyce, S. R. Winzer. Science-based MEMS reliability methodology
1812 -- 1817E. Papandreou, M. Lamhamdi, C. M. Skoulikidou, Patrick Pons, G. Papaioannou, Robert Plana. Structure dependent charging process in RF MEMS capacitive switches
1818 -- 1822J. Ruan, N. Nolhier, M. Bafleur, L. Bary, Fabio Coccetti, T. Lisec, Robert Plana. Electrostatic discharge failure analysis of capacitive RF MEMS switches
1823 -- 1826Willem D. van Driel, D. G. Yang, Cadmus A. Yuan, M. van Kleef, G. Q. (Kouchi) Zhang. Mechanical reliability challenges for MEMS packages: Capping
1836 -- 1840V. Maingot, Jean Baptiste Ferron, Régis Leveugle, Vincent Pouget, Alexandre Douin. Configuration errors analysis in SRAM-based FPGAs: Software tool and practical results
1841 -- 1845V. Davidovic, Dimitrios N. Kouvatsos, Ninoslav Stojadinovic, Apostolos T. Voutsas. Influence of polysilicon film thickness on radiation response of advanced excimer laser annealed polycrystalline silicon thin film transistors

Volume 47, Issue 8

1155 -- 0Peter Ersland, Roberto Menozzi. Editorial
1156 -- 1165William J. Roesch, Steve Brockett. Field returns, a source of natural failure mechanisms
1166 -- 1174Charles S. Whitman. Defining the safe operating area for HBTs with an InGaP emitter across temperature and current density
1175 -- 1179K. W. Alt, R. E. Yeats, C. P. Hutchinson, D. K. Kuhn, T. S. Low, M. Iwamoto, M. E. Adamski, R. L. Shimon, T. E. Shirley, M. Bonse, F. G. Kellert, D. C. D'Avanzo. Determination of transistor infant failure probability in InGaP/GaAs heterojunction bipolar technology
1180 -- 1187Craig Gaw, Thomas Arnold, Elizabeth Glass, Robert Martin. Reliability and performance of a true enhancement mode HIGFET for wireless applications
1188 -- 1193P. J. van der Wel, J. R. de Beer, R. J. M. van Boxtel, Y. Y. Hsieh, Y. C. Wang. Effect of oval defects in GaAs on the reliability of SiN::x:: metal-insulator-metal capacitors
1195 -- 1201P. K. Hurley, K. Cherkaoui, S. McDonnell, G. Hughes, A. W. Groenland. Characterisation and passivation of interface defects in (1 0 0)-Si/SiO::2::/HfO::2::/TiN gate stacks
1202 -- 1207Ronen A. Berechman, Boris Revzin, Yoram Shapira. Correlating gate sinking and electrical performance of pseudomorphic high electron mobility transistors
1208 -- 1212Shiou-Ying Cheng. Very wide current-regime operation of an InP/InGaAs tunneling emitter bipolar transistor (TEBT)
1213 -- 1217Lingfeng Mao. First-principles study of the effects of oxygen vacancy on hole tunneling current
1218 -- 1221Paolo Fantini, Giorgio Ferrari. Low frequency noise and technology induced mechanical stress in MOSFETs
1222 -- 1227T. Noulis, S. Siskos, G. Sarrabayrouse. Comparison between BSIM4.X and HSPICE flicker noise models in NMOS and PMOS transistors in all operating regions
1228 -- 1232Siva Prasad Devireddy, Bigang Min, Zeynep Çelik-Butler, Hsing-Huang Tseng, Philip J. Tobin, Ania Zlotnicka. Improved low frequency noise characteristics of sub-micron MOSFETs with TaSiN/TiN gate on ALD HfO::2:: dielectric
1233 -- 1238Bjorn Vermeersch, Gilbert De Mey. Influence of thermal contact resistance on thermal impedance of microelectronic structures
1239 -- 1245Tsung-Yueh Tsai, Chang-Lin Yeh, Yi-Shao Lai, Rong-Sheng Chen. Response spectra analysis for undamped structural systems subjected to half-sine impact acceleration pulses
1246 -- 1250K. K. Jinka, S. Ganesan, A. Dasgupta, S. Ling, A. Shapiro, D. Schatzel. Chip-on-Board (CoB) technology for low temperature environments. Part I: Wire profile modeling in unencapsulated chips
1251 -- 1261B. A. E. van Hal, R. H. J. Peerlings, M. G. D. Geers, Olaf van der Sluis. Cohesive zone modeling for structural integrity analysis of IC interconnects
1262 -- 1272M. A. Matin, J. G. A. Theeven, W. P. Vellinga, M. G. D. Geers. Correlation between localized strain and damage in shear-loaded Pb-free solders
1273 -- 1279Yi-Shao Lai, Kuo-Ming Chen, Chin-Li Kao, Chiu-Wen Lee, Ying-Ta Chiu. Electromigration of Sn-37Pb and Sn-3Ag-1.5Cu/Sn-3Ag-0.5Cu composite flip-chip solder bumps with Ti/Ni(V)/Cu under bump metallurgy
1280 -- 1287Kimihiro Yamanaka, Yutaka Tsukada, Katsuaki Suganuma. Studies on solder bump electromigration in Cu/Sn-3Ag-0.5Cu/Cu system
1288 -- 1295Francesco Grasso, Stefano Manetti, Maria Cristina Piccirilli. A symbolic approach to design centering of analog circuits
1296 -- 1299R. Habchi, C. Salame, P. Mialhe, A. Khoury. Switching times variation of power MOSFET devices after electrical stress
1300 -- 1305W. H. Moy, Y.-L. Shen. On the failure path in shear-tested solder joints
1306 -- 1307Mile K. Stojcev. S. Sitharama Iyengar, Richards R. Brooks, Eds., Distributed Sensor Networks, Hardcover, pp 1123, Chapman & Hall/CRC Press, 2005, ISBN 1-58488-383-9
1308 -- 1309Mile K. Stojcev. Richard Zurawski, editor. Embedded Systems Handbook, Hardcover, pp 1112, CRC Press, Taylor & Francis Group, 2006, ISBN 0-8493-2824-1

Volume 47, Issue 7

999 -- 0Wolfgang Stadler. Guest editorial
1000 -- 1007T. Smedes, J. de Boet, T. Rödle. Selecting an appropriate ESD protection for discrete RF power LDMOSTs
1008 -- 1015Wolfgang Soldner, Martin Streibl, U. Hodel, Marc Tiebout, Harald Gossner, Doris Schmitt-Landsiedel, J. H. Chun, Choshu Ito, Robert W. Dutton. RF ESD protection strategies: Codesign vs. low-C protection
1016 -- 1024D. Trémouilles, S. Thijs, Philippe Roussel, M. I. Natarajan, Vesselin K. Vassilev, Guido Groeseneken. Transient voltage overshoot in TLP testing - Real or artifact?
1025 -- 1029Tilo Brodbeck, Reinhold Gaertner. Experience in HBM ESD testing of high pin count devices
1030 -- 1035Ciaran J. Brennan, Shunhua Chang, Min Woo, Kiran V. Chatty, Robert Gauthier. Implementation of diode and bipolar triggered SCRs for CDM robust ESD protection in 90 nm CMOS ASICs
1036 -- 1043M. Etherton, J. Willemen, Wolfgang Wilkening, N. Qu, S. Mettler, Wolfgang Fichtner. Verification of CDM circuit simulation using an ESD evaluation circuit
1044 -- 1053Ulrich Glaser, Kai Esmark, Martin Streibl, Christian Russ, Krzysztof Domanski, Mauro Ciappa, Wolfgang Fichtner. SCR operation mode of diode strings for ESD protection
1054 -- 1059K. Reynders, P. Moens. Integration of an SCR in an active clamp
1060 -- 1068Olivier Marichal, Geert Wybo, Benjamin Van Camp, Pieter Vanysacker, Bart Keppens. SCR-based ESD protection in nanometer SOI technologies
1069 -- 1073Ciaran J. Brennan, Kiran V. Chatty, Jeff Sloan, Paul Dunn, Mujahid Muhammad, Robert Gauthier. Design automation to suppress cable discharge event (CDE) induced latchup in 90 nm CMOS ASICs
1075 -- 1085Daniel M. Fleetwood, M. P. Rodgers, L. Tsetseris, X. J. Zhou, I. Batyrev, S. Wang, Ronald D. Schrimpf, Sokrates T. Pantelides. Effects of device aging on microelectronics radiation response and reliability
1086 -- 1094D. S. Liu, M. K. Shih, W. H. Huang. Measurement and analysis of contact resistance in wafer probe testing
1095 -- 1102J. Varghese, A. Dasgupta. An experimental approach to characterize rate-dependent failure envelopes and failure site transitions in surface mount assemblies
1103 -- 1112Huang-Kuang Kung. Evaluation of sweep resistance of Q Auto-Loop and Square-Loop bonds for semiconductor packaging technology
1113 -- 1119Keun-Soo Kim, Takayuki Imanishi, Katsuaki Suganuma, Mimoru Ueshima, Rikiya Kato. Properties of low temperature Sn-Ag-Bi-In solder systems
1120 -- 1126Mohd Khairuddin Md Arshad, Azman Jalar, Ibrahim Ahmad. Characterization of parasitic residual deposition on passivation layer in electroless nickel immersion gold process
1127 -- 1134Chang-Lin Yeh, Yi-Shao Lai, Hsiao-Chuan Chang, Tsan-Hsien Chen. Empirical correlation between package-level ball impact test and board-level drop reliability
1135 -- 1144Tomi Laurila, Toni T. Mattila, V. Vuorinen, J. Karppinen, Jue Li, M. Sippola, Jorma K. Kivilahti. Evolution of microstructure and failure mechanism of lead-free solder interconnections in power cycling and thermal shock tests
1145 -- 1152Janusz Zarebski, Krzysztof Górecki. Spice-aided modelling of the UC3842 current mode PWM controller with selfheating taken into account
1153 -- 1154Mile K. Stojcev. Richard Zurawski, ed., The Industrial Information Technology Handbook, Hardcover, CRC Press, 2005, pp 1936, ISBN 0-8493-1985-4

Volume 47, Issue 6

839 -- 840Tibor Grasser, Siegfried Selberherr. Editorial
841 -- 852Dieter K. Schroder. Negative bias temperature instability: What do we understand?
853 -- 862Muhammad Ashraful Alam, Haldun Kufluoglu, D. Varghese, S. Mahapatra. A comprehensive model for PMOS NBTI degradation: Recent progress
863 -- 872S. Chakravarthi, A. T. Krishnan, V. Reddy, S. Krishnan. Probing negative bias temperature instability using a continuum numerical framework: Physics to real world operation
873 -- 879Helmut Puchner. NBTI product level reliability for a low-power SRAM technology
880 -- 889M. Houssa, M. Aoulaiche, Stefan De Gendt, Guido Groeseneken, Marc M. Heyns. Negative bias temperature instabilities in HfSiO(N)-based MOSFETs: Electrical characterization and modeling
890 -- 898P. M. Lenahan. Deep level defects involved in MOS device instabilities
903 -- 911Sokrates T. Pantelides, L. Tsetseris, S. N. Rashkeev, X. J. Zhou, Daniel M. Fleetwood, Ronald D. Schrimpf. Hydrogen in MOSFETs - A primary agent of reliability issues
913 -- 923E. Atanassova, Albena Paskaleva. Challenges of Ta::2::O::5:: as high-k dielectric for nanoscale DRAMs
924 -- 929C. Y. Lu, H. C. Lin, Y.-J. Lee. Dynamic NBTI characteristics of PMOSFETs with PE-SiN capping
930 -- 936Rihito Kuroda, Akinobu Teramoto, Kazufumi Watanabe, Michihiko Mifuji, Takahisa Yamaha, Shigetoshi Sugawa, Tadahiro Ohmi. Circuit level prediction of device performance degradation due to negative bias temperature stress
937 -- 943W. B. Chen, J. P. Xu, P. T. Lai, Y. P. Li, S. G. Xu. Gate leakage properties of MOS devices with tri-layer high-k gate dielectric
944 -- 952Chieh-Ming Lai, Yean-Kuen Fang, Chien Ting Lin, Chia-Wei Hsu, Wen-Kuan Yeh. The impacts of high tensile stress CESL and geometry design on device performance and reliability for 90 nm SOI nMOSFETs
953 -- 958Partha Sarkar, Abhijit Mallik, Chandan Kumar Sarkar. Performance comparison of channel engineered deep sub-micrometer pseudo SOI n-MOSFETs
959 -- 966Han-Chang Tsai. An investigation on the influence of electromagnetic interference induced in conducting wire of universal LEDs
967 -- 971Chia-Huai Ho, Kuei-Shu Chang-Liao, Ya-Nan Huang, Tien-Ko Wang, T. C. Lu. Performance and reliability improvement of flash device by a novel programming method
972 -- 985Hyong Tae Kim, Hae Jeong Yang, Seung Yub Baek. Iterative algorithm for automatic alignment by object transformation
986 -- 995Dubravka Rocak, S. Macek, J. Sitek, Marko Hrovat, K. Bukat, Z. Drozd. A reliability study of the lead-free solder connections of miniature chip components on hybrid circuits
996 -- 997Mile K. Stojcev. Mohamed Ilyas, Imad Mahgoud, Handbook of Sensor Networks: Compact Wireless and Wired Sensing Systems, Hardcover, pp 864, CRC Press, 2005, ISBN 0-8493-1968-4

Volume 47, Issue 4-5

477 -- 478Salvatore Lombardo. Guest Editorial
479 -- 488Chadwin D. Young, Dawei Heh, Arnost Neugroschel, Rino Choi, Byoung Hun Lee, Gennadi Bersuker. Electrical characterization and analysis techniques for the high-kappa era
489 -- 496Gilles Reimbold, J. Mitard, X. Garros, Charles Leroux, G. Ghibaudo, F. Martin. Initial and PBTI-induced traps and charges in Hf-based oxides/TiN stacks
497 -- 500Rainer Duschl, M. Kerber, A. Avellan, S. Jakschik, U. Schroeder, S. Kudelka. Reliability aspects of Hf-based capacitors: Breakdown and trapping effects
501 -- 504P. Srinivasan, F. Crupi, Eddy Simoen, P. Magnone, C. Pace, D. Misra, Cor Claeys. Interfacial layer quality effects on low-frequency noise (1/f) in p-MOSFETs with advanced gate stacks
505 -- 507A. Shickova, Ben Kaczer, A. Veloso, M. Aoulaiche, M. Houssa, H. E. Maes, Guido Groeseneken, J. A. Kittl. NBTI reliability of Ni FUSI/HfSiON gates: Effect of silicide phase
508 -- 512Giuseppina Puzzilli, Bogdan Govoreanu, Fernanda Irrera, Maarten Rosmeulen, Jan Van Houdt. Characterization of charge trapping in SiO::2::/Al::2::O::3:: dielectric stacks by pulsed C-V technique
513 -- 517A. Kerber, L. Pantisano, A. Veloso, Guido Groeseneken, M. Kerber. Reliability screening of high-k dielectrics based on voltage ramp stress
518 -- 520Z. Li, T. Schram, L. Pantisano, A. Stesmans, Thierry Conard, S. Shamuilia, V. V. Afanasiev, A. Akheyar, Sven Van Elshocht, D. P. Brunco, W. Deweerd, Y. Naoki, P. Lehnen, Stefan De Gendt, K. De Meyer. Mechanism of O::2::-anneal induced V::fb:: shifts of Ru gated stacks
521 -- 524A. Rothschild, R. Mitsuhashi, C. Kerner, X. Shi, J. L. Everaert, L. Date, Thierry Conard, Olivier Richard, C. Vrancken, R. Verbeeck, A. Veloso, A. Lauwers, M. de Potter de ten Broeck, I. Debusschere, M. Jurczak, M. Niwa, P. Absil, S. Biesemans. Optimization of HfSiON using a design of experiment (DOE) approach on 0.45 V V::t:: Ni-FUSI CMOS transistors
525 -- 527Isodiana Crupi, Robin Degraeve, Bogdan Govoreanu, David P. Brunco, Philippe Roussel, Jan Van Houdt. Distribution and generation of traps in SiO::2::/Al::2::O::3:: gate stacks
528 -- 531Ralf Endres, Yordan Stefanov, Udo Schwalke. Electrical characterization of crystalline Gd::2::O::3:: gate dielectric MOSFETs fabricated by damascene metal gate technology
532 -- 535S. F. Galata, E. K. Evangelou, Y. Panayiotatos, A. Sotiropoulos, A. Dimoulas. Post deposition annealing studies of lanthanum aluminate and ceria high-k dielectrics on germanium
536 -- 539S. Abermann, J. K. Efavi, G. Sjöblom, M. C. Lemme, J. Olsson, E. Bertagnolli. Impact of Al-, Ni-, TiN-, and Mo-metal gates on MOCVD-grown HfO::2:: and ZrO::2:: high-kappa dielectrics
540 -- 543C. Merckling, G. Delhaye, M. El-Kazzi, S. Gaillard, Y. Rozier, L. Rapenne, B. Chenevier, O. Marty, G. Saint-Girons, M. Gendry, Y. Robach, G. Hollinger. Epitaxial growth of LaAlO::3:: on Si(0 0 1) using interface engineering
544 -- 547E. Amat, R. Rodríguez, M. Nafría, X. Aymerich, James H. Stathis. Influence of the SiO::2:: layer thickness on the degradation of HfO::2::/SiO::2:: stacks subjected to static and dynamic stress conditions
548 -- 551Fu-Chien Chiu, Wen-Chieh Shih, Joseph Ya-min Lee, Huey-Liang Hwang. An investigation of surface state capture cross-sections for metal-oxide-semiconductor field-effect transistors using HfO::2:: gate dielectrics
552 -- 558Giuseppe La Rosa, Stewart E. Rauch III. Channel hot carrier effects in n-MOSFET devices of advanced submicron CMOS technologies
559 -- 566Ben Kaczer, Robin Degraeve, Philippe Roussel, Guido Groeseneken. Gate oxide breakdown in FET devices and circuits: From nanoscale physics to system-level reliability
567 -- 572G. Néau, F. Martinez, M. Valenza, J. C. Vildeuil, E. Vincent, Frédéric Boeuf, F. Payet, K. Rochereau. Impact of strained-channel n-MOSFETs with a SiGe virtual substrate on dielectric interface quality evaluated by low frequency noise measurements
573 -- 576C. Leyris, F. Martinez, M. Valenza, A. Hoffmann, J. C. Vildeuil. Random telegraph signal: A sensitive and nondestructive tool for gate oxide single trap characterization
577 -- 580Cora Salm, Eric Hoekstra, Jay S. Kolhatkar, André J. Hof, Hans Wallinga, Jurriaan Schmitz. Low-frequency noise in hot-carrier degraded nMOSFETs
581 -- 584R. Fernández, R. Rodríguez, M. Nafría, X. Aymerich. Effect of oxide breakdown on RS latches
585 -- 592R. F. Steimle, R. Muralidhar, R. Rao, M. Sadd, C. T. Swift, J. Yater, B. Hradsky, S. Straub, H. Gasquet, L. Vishnubhotla, E. J. Prinz, T. Merchant, B. Acred, K. Chang, B. E. White Jr.. Silicon nanocrystal non-volatile memory for embedded memory scaling
593 -- 597Cosimo Gerardi, Salvatore Lombardo, Giuseppe Ammendola, Giovanni Costa, Valentina Ancarani, Domenico Mello, Stella Giuffrida, Maria Cristina Plantamura. Study of nanocrystal memory integration in a Flash-like NOR device
598 -- 601A. Sebastiani, R. Piagge, A. Modelli, G. Ghidini. High-K dielectrics for inter-poly application in non volatile memories
602 -- 605A. Cester, A. Gasperin, N. Wrachien, Alessandro Paccagnella, V. Ancarani, Cosimo Gerardi. Ionising radiation and electrical stress on nanocrystal memory cell array
606 -- 609Hsin-hao Hsu, Joseph Ya-min Lee. Electrical characterization of metal-oxide-high-k dielectric-oxide-semiconductor (MOHOS) structures for memory applications
610 -- 614Guoqiao Tao, Cedric Ouvrard, Helene Chauveau, Som Nath. Experimental study of carrier transport in multi-layered structures
615 -- 618Yosef Raskin, Asaad Salameh, David Betel, Yakov Roizin. Reliability of HTO based high-voltage gate stacks for flash memories
619 -- 622Yu-Di Su, Wen-Chieh Shih, Joseph Ya-min Lee. The characterization of retention properties of metal-ferroelectric (PbZr::0.53::Ti::0.47::O::3::)-insulator (Dy::2::O::3::, Y::2::O::3::)-semiconductor devices
623 -- 625Stefan Holzer, Alireza Sheikholeslami, Markus Karner, Tibor Grasser, Siegfried Selberherr. Comparison of deposition models for a TEOS LPCVD process
626 -- 630V. I. Turchanikov, A. N. Nazarov, V. S. Lysenko, V. Ostahov, O. Winkler, B. Spangenberg, H. Kurz. Charge accumulation in the dielectric of the nanocluster NVM MOS structures under anti- and unipolar W/E window formation
631 -- 634N. Baboux, C. Busseret, C. Plossu, P. Boivin. Peculiarities of electron tunnel injection to the drain of EEPROMs
635 -- 639Martin Lemberger, A. Baunemann, Anton J. Bauer. Chemical vapor deposition of tantalum nitride films for metal gate application using TBTDET and novel single-source MOCVD precursors
640 -- 644P. Fiorenza, R. Lo Nigro, V. Raineri, S. Lombardo, R. G. Toro, G. Malandrino, I. L. Fragalà. Defects induced anomalous breakdown kinetics in Pr::2::O::3:: by micro- and nano-characterization
645 -- 648I. Z. Mitrovic, Octavian Buiu, Steve Hall, C. Bungey, T. Wagner, W. Davey, Y. Lu. Electrical and structural properties of hafnium silicate thin films
649 -- 652Yu. Yu. Lebedinskii, A. V. Zenkevich. 2 gate stacks measured with X-ray photoelectron spectroscopy
653 -- 656S. Dueñas, H. Castán, H. García, L. Bailón, K. Kukli, T. Hatanpää, Mikko Ritala, Markku Leskelä. Experimental observations of temperature-dependent flat band voltage transients on high-k dielectrics
657 -- 659A. Zenkevich, Yu. Lebedinskii, G. Scarel, M. Fanciulli, A. Baturin, N. Lubovin. 2 layers on Si(1 0 0) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM
660 -- 664Charles Leroux, Gérard Ghibaudo, Gilles Reimbold. Accurate determination of flat band voltage in advanced MOS structure
665 -- 668J. Martín-Martínez, R. Rodríguez, M. Nafría, X. Aymerich, James H. Stathis. Worn-out oxide MOSFET characteristics: Role of gate current and device parameters on a current mirror
669 -- 672I. V. Grekhov, G. G. Kareva, S. E. Tyaginov, M. I. Vexler. Application of an MOS tunnel transistor for measurements of the tunneling parameters and of the parameters of electron energy relaxation in silicon
673 -- 677M. Rommel, Anton J. Bauer, Heiner Ryssel. Quantitative oxide charge determination by photocurrent analysis
678 -- 681Octavian Buiu, Steve Hall, O. Engstrom, B. Raeissi, M. Lemme, P. K. Hurley, K. Cherkaoui. Extracting the relative dielectric constant for high-kappa layers from CV measurements - Errors and error propagation
682 -- 685Nicola Delmonte, B. E. Watts, G. Chiorboli, P. Cova, Roberto Menozzi. Test structures for dielectric spectroscopy of thin films at microwave frequencies
686 -- 693Alexander A. Demkov, Onise Sharia, Xuhui Luo, Jaekwang Lee. Density functional theory of high-k dielectric gate stacks
694 -- 696F. Sacconi, J. M. Jancu, M. Povolotskyi, A. Di Carlo. Full-band tunneling in high-kappa dielectric MOS structures
697 -- 699Robert Entner, Tibor Grasser, Oliver Triebl, Hubert Enichlmair, Rainer Minixhofer. Negative bias temperature instability modeling for high-voltage oxides at different stress temperatures
700 -- 703L. Pinzelli, M. Gros-Jean, Y. Bréchet, F. Volpi, A. Bajolet, J.-C. Giraudin. High-K dielectric deposition in 3D architectures: The case of Ta::2::O::5:: deposited with metal-organic precursor TBTDET
704 -- 708Markus Karner, Andreas Gehring, M. Wagner, R. Entner, Stefan Holzer, Wolfgang Gös, M. Vasicek, Tibor Grasser, Hans Kosina, Siegfried Selberherr. VSP - A gate stack analyzer
714 -- 717Y. V. Gomeniuk, A. N. Nazarov, Ya. N. Vovk, V. S. Lysenko, Yi Lu, Octavian Buiu, Steve Hall, R. J. Potter, P. Chalker. Charge trapping and interface states in hydrogen annealed HfO::2::-Si structures
722 -- 725Y. Lu, Octavian Buiu, Steve Hall, I. Z. Mitrovic, W. Davey, R. J. Potter, P. R. Chalker. Tuneable electrical properties of hafnium aluminate gate dielectrics deposited by metal organic chemical vapour deposition
726 -- 728I. P. Tyagulskyy, I. N. Osiyuk, V. S. Lysenko, A. N. Nazarov, Steve Hall, Octavian Buiu, Y. Lu, R. Potter, P. Chalker. Charge trapping characterization of MOCVD HfO::2::/p-Si interfaces at cryogenic temperatures
729 -- 732T. Nguyen, C. Busseret, L. Militaru, A. Poncet, D. Aimé, N. Baboux, C. Plossu. Parameters extraction of hafnium based gate oxide capacitors
733 -- 738M. Martyniuk, J. Antoszewski, C. A. Musca, J. M. Dell, L. Faraone. Dielectric thin films for MEMS-based optical sensors
739 -- 742J. L. Regolini, D. Benoit, P. Morin. Passivation issues in active pixel CMOS image sensors
743 -- 747G. Beylier, S. Bruyère, D. Benoit, G. Ghibaudo. Refined electrical analysis of two charge states transition characteristic of borderless silicon nitride
752 -- 754Nguyen Duy Cuong, Dong Jin Kim, Byoung-Don Kang, Chang Soo Kim, Soon-Gil Yoon. Characterizations of high resistivity TiN::x::O::y:: thin films for applications in thin film resistors
755 -- 758Jong Hyun Park, Cheng-Ji Xian, Nak-Jin Seong, Soon-Gil Yoon, Seung-Hyun Son, Hyung-Mi Chung, Jin-Suck Moon, Hyun-Joo Jin, Seung Eun Lee, Jeong-Won Lee, Hyung-Dong Kang, Yeoul-Kyo Chung, Yong-Soo Oh. Development of embedded capacitor with bismuth-based pyrochlore thin films at low temperatures for printed circuit board applications
759 -- 763R. A. Farrell, K. Cherkaoui, N. Petkov, H. Amenitsch, J. D. Holmes, P. K. Hurley, M. A. Morris. Physical and electrical properties of low dielectric constant self-assembled mesoporous silica thin films
764 -- 768C. Guedj, G. Imbert, E. Martinez, C. Licitra, N. Rochat, V. Arnal. Modification of porous ultra-low K dielectric by electron-beam curing
769 -- 772O. Cueto, Myriam Assous, François de Crecy, A. Toffoli, David Bouchu, M. Fayolle, Frédéric Boulanger. Development of a permittivity extraction method for ultra low k dielectrics integrated in advanced interconnects
773 -- 776Maurice Kahn, Christophe Vallée, Emmanuel Defay, Catherine Dubourdieu, Marceline Bonvalot, Serge Blonkowski, Jean-Raoul Plaussu, Pierre Garrec, Thierry Baron. 3 bilayer dielectrics for MIM capacitor applications
777 -- 780Liliana Caristia, Giuseppe Nicotra, Corrado Bongiorno, Nicola Costa, Sebastiano Ravesi, Salvo Coffa, Riccardo De Bastiani, Maria Grazia Grimaldi, Corrado Spinella. The influence of hydrogen and nitrogen on the formation of Si nanoclusters embedded in sub-stoichiometric silicon oxide layers
786 -- 789Koutarou Tanaka, Hiroaki Tanaka, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi. High quality gate insulator film formation on SiC using by microwave-excited high-density plasma
790 -- 793K. Cico, J. Kuzmik, D. Gregusová, R. Stoklas, Tibor Lalinsky, Alexandros G. Georgakilas, Dionyz Pogany, K. Fröhlich. Optimization and performance of Al::2::O::3::/GaN metal-oxide-semiconductor structures
794 -- 797V. Em. Vamvakas, N. Vourdas, S. Gardelis. Optical characterization of Si-rich silicon nitride films prepared by low pressure chemical vapor deposition
798 -- 801Giuseppe Currò, Marco Camalleri, Denise Calì, Francesca Monforte, Fortunato Neri. Carrier trapping in thin N::2::O-grown oxynitride/oxide di-layer for PowerMOSFET devices
802 -- 805S. Privitera, R. Modica, V. Cerantonio, G. Fallica, G. Pappalardo. LOCOS induced stress effects on SOI bipolar devices
806 -- 809D. Corso, S. Aurite, E. Sciacca, D. Naso, Salvatore Lombardo, A. Santangelo, M. C. Nicotra, S. Cascino. Measurement of the hot carrier damage profile in LDMOS devices stressed at high drain voltage
810 -- 814Giacomo Barletta, Giuseppe Currò. Evaluation of the generation mechanisms at surface and in the bulk of the silicon by current transient technique
815 -- 818A. Cascio, G. Currò, A. Cavagnoli. Total ionizing dose reliability of thin SiO::2:: in PowerMOSFET devices
819 -- 821Giuseppe Currò, Marco Camalleri, Denise Calì, Francesca Monforte, Fortunato Neri. Interface states and traps in thin N::2::O-grown oxynitride/oxide di-layer for PowerMOSFET devices
822 -- 824F. Monforte, M. Camalleri, D. Calì, G. Currò, E. Fazio, F. Neri. Nitrogen bonding configurations near the oxynitride/silicon interface after oxynitridation in N::2::O ambient of a thin SiO::2:: gate
825 -- 829P. Taechakumput, S. Taylor, Octavian Buiu, R. J. Potter, P. R. Chalker, A. C. Jones. Optical and electrical characterization of hafnium oxide deposited by liquid injection atomic layer deposition
830 -- 833Susumu Tamura, Yasuhisa Omura. 9 thin films
834 -- 837V. Em. Vamvakas, M. Theodoropoulou, S. N. Georga, C. A. Krontiras, M. N. Pisanias. Correlation between infrared transmission spectra and the interface trap density of SiO::2:: films

Volume 47, Issue 2-3

159 -- 160Artur Wymyslowski, Bart Vandevelde, Dag Andersson. Thermal, mechanical and multi-physics simulation and experiments in micro-electronics and micro-systems
161 -- 167F. Cacho, S. Orain, G. Cailletaud, H. Jaouen. A constitutive single crystal model for the silicon mechanical behavior: Applications to the stress induced by silicided lines and STI in MOS technologies
168 -- 178Stephan Schoenfelder, Matthias Ebert, Christof Landesberger, Karlheinz Bock, Jörg Bagdahn. Investigations of the influence of dicing techniques on the strength properties of thin silicon
179 -- 186M. A. J. van Gils, O. van der Sluis, G. Q. Zhang, J. H. J. Janssen, R. M. J. Voncken. Analysis of Cu/low-k bond pad delamination by using a novel failure index
187 -- 195Mike Roellig, Rainer Dudek, Steffen Wiese, Bjoern Boehme, Berhard Wunderle, Klaus-Jürgen Wolter, Bernd Michel. Fatigue analysis of miniaturized lead-free solder contacts based on a novel test concept
196 -- 204Chang-Chun Lee, Chien-Chen Lee, Hsiao-Tung Ku, Shu-Ming Chang, Kuo-Ning Chiang. Solder joints layout design and reliability enhancements of wafer level packaging using response surface methodology
205 -- 214W. D. van Driel, A. Mavinkurve, M. A. J. van Gils, G. Q. Zhang. Advanced structural similarity rules for the BGA package family
215 -- 222Nele Van Steenberge, Paresh Limaye, Geert Willems, Bart Vandevelde, Inge Schildermans. Analytical and finite element models of the thermal behavior for lead-free soldering processes in electronic assembly
223 -- 232Steffen Wiese, Klaus-Jürgen Wolter. Creep of thermally aged SnAgCu-solder joints
233 -- 239D. G. Yang, K. M. B. Jansen, L. J. Ernst, G. Q. Zhang, H. J. L. Bressers, J. H. J. Janssen. Effect of filler concentration of rubbery shear and bulk modulus of molding compounds
240 -- 247C. van t Hof, K. M. B. Jansen, G. Wisse, L. J. Ernst, D. G. Yang, G. Q. Zhang, H. J. L. Bressers. Novel shear tools for viscoelastic characterization of packaging polymers
248 -- 251V. Gonda, K. M. B. Jansen, L. J. Ernst, J. den Toonder, G. Q. Zhang. Micro-mechanical testing of SiLK by nanoindentation and substrate curvature techniques
252 -- 258M. Spraul, W. Nüchter, A. Möller, B. Wunderle, B. Michel. Reliability of SnPb and Pb-free flip-chips under different test conditions
259 -- 265Bart Vandevelde, Mario Gonzalez, Paresh Limaye, Petar Ratchev, Eric Beyne. Thermal cycling reliability of SnAgCu and SnPb solder joints: A comparison for several IC-packages
266 -- 272C. Andersson, D. R. Andersson, P. E. Tegehall, Johan Liu. Effect of different temperature cycling profiles on the crack initiation and propagation of Sn-3.5Ag wave soldered solder joints
273 -- 279M. A. J. van Gils, W. D. van Driel, G. Q. Zhang, H. J. L. Bressers, R. B. R. van Silfhout, X. J. Fan, J. H. J. Janssen. Virtual qualification of moisture induced failures of advanced packages
280 -- 289A. Wymyslowski, W. D. van Driel, J. van de Peer, N. Tzannetakis, G. Q. Zhang. Advanced numerical prototyping methods in modern engineering applications - Optimisation for micro-electronic package reliability
290 -- 294H. J. L. Bressers, W. D. van Driel, K. M. B. Jansen, L. J. Ernst, G. Q. Zhang. Correlation between chemistry of polymer building blocks and microelectronics reliability
295 -- 301S. Orain, J.-C. Barbé, X. Federspiel, P. Legallo, H. Jaouen. FEM-based method to determine mechanical stress evolution during process flow in microelectronics, application to stress-voiding
302 -- 309Mats Lindgren, Ilja Belov, Magnus Törnvall, Peter Leisner. Application of simulation-based decision making in product development of an RF module
310 -- 318D. G. Yang, K. M. B. Jansen, L. J. Ernst, G. Q. Zhang, W. D. van Driel, H. J. L. Bressers, J. H. J. Janssen. Numerical modeling of warpage induced in QFN array molding process
319 -- 325Kirsten Weide-Zaage, David Dalleau, Yves Danto, Hélène Frémont. Dynamic void formation in a DD-copper-structure with different metallization geometry
327 -- 0Andrzej Dziedzic, Jan Felba. Polytronic 2005
328 -- 330James E. Morris. Isotropic conductive adhesives: Future trends, possibilities and risks
331 -- 334Jana Kolbe, Andreas Arp, Francesco Calderone, Edouard Marc Meyer, Wilhelm Meyer, Helmut Schaefer, Manuela Stuve. Inkjettable conductive adhesive for use in microelectronics and microsystems technology
335 -- 341Ryszard Kisiel, Jan Felba, Janusz Borecki, Andrzej Moscicki. Problems of PCB microvias filling by conductive paste
342 -- 346Tomasz Falat, Artur Wymyslowski, Jana Kolbe. Numerical approach to characterization of thermally conductive adhesives
347 -- 353Péter Gordon, Bálint Balogh, Bálint Sinkovics. Thermal simulation of UV laser ablation of polyimide
354 -- 362Andrzej Dziedzic. Carbon/polyesterimide thick-film resistive composites - Experimental characterization and theoretical analysis of physicochemical, electrical and stability properties
363 -- 371Marika P. Immonen, Mikko Karppinen, Jorma K. Kivilahti. Investigation of environmental reliability of optical polymer waveguides embedded on printed circuit boards
372 -- 377J. Tardy, M. Erouel, A. L. Deman, A. Gagnaire, V. Teodorescu, M. G. Blanchin, B. Canut, A. Barau, M. Zaharescu. Organic thin film transistors with HfO::2:: high-k gate dielectric grown by anodic oxidation or deposited by sol-gel
379 -- 383T. K. Chiang. A new two-dimensional threshold voltage model for cylindrical, fully-depleted, surrounding-gate (SG) MOSFETs
384 -- 390F. Schwierz, C. Schippel. Performance trends of Si-based RF transistors
391 -- 394X. Zou, J. P. Xu, C. X. Li, P. T. Lai, W. B. Chen. A threshold-voltage model of SiGe-channel pMOSFET without Si cap layer
395 -- 400W. W. (Bill) Abadeer. Effect of stress voltages on voltage acceleration and lifetime projections for ultra-thin gate oxides
401 -- 408C. Petit, D. Zander. Low voltage stress induced leakage current and time to breakdown in ultra-thin (1.2-2.3nm) oxides
409 -- 418Kazufumi Watanabe, Akinobu Teramoto, Rihito Kuroda, Shigetoshi Sugawa, Tadahiro Ohmi. Examination of degradation mechanism due to negative bias temperature stress from a perspective of hole energy for accurate lifetime prediction
419 -- 421You-Lin Wu, Shi-Tin Lin, Tsung-Min Chang, Juin J. Liou. Reliability study of ultrathin oxide films subject to irradiation-then-stress treatment using conductive atomic force microscopy
422 -- 428Z. Khatir, S. Lefebvre, F. Saint-Eve. Experimental and numerical investigations on delayed short-circuit failure mode of single chip IGBT devices
429 -- 433W. S. Lau, P. W. Qian, Taejoon Han, Nathan P. Sandler, S. T. Che, S. E. Ang, C. H. Tung, T. T. Sheng. Evidence that N::2::O is a stronger oxidizing agent than O::2:: for both Ta::2::O::5:: and bare Si below 1000degreeC and temperature for minimum low-K interfacial oxide for high-K dielectric on Si
434 -- 436Jianyin Zhao, Fang Liu. Reliability assessment of the metallized film capacitors from degradation data
437 -- 443B. Vermeersch, Gilbert De Mey. Influence of substrate thickness on thermal impedance of microelectronic structures
444 -- 449J. W. C. de Vries, M. Y. Jansen, W. D. van Driel. On the difference between thermal cycling and thermal shock testing for board level reliability of soldered interconnections
450 -- 460Jing-en Luan, Tong Yan Tee, Eric Pek, Chwee Teck Lim, Zhaowei Zhong. Dynamic responses and solder joint reliability under board level drop test
461 -- 470Hamid R. Zarandi, Seyed Ghassem Miremadi. Dependability evaluation of Altera FPGA-based embedded systems subjected to SEUs
471 -- 476Maria Teresa Sanz, Santiago Celma, Belén Calvo. Low-distortion 4th order programmable Butterworth filter

Volume 47, Issue 12

1847 -- 1848Peter Sandborn, Michael G. Pecht. Introduction to special section on electronic systems prognostics and health management
1849 -- 1856Jie Gu, Donald Barker, Michael Pecht. Prognostics implementation of electronics under vibration loading
1857 -- 1864E. Scanff, K. L. Feldman, S. Ghelam, Peter Sandborn, M. Glade, B. Foucher. Life cycle cost impact of using prognostic health management (PHM) for helicopter avionics
1874 -- 1881Douglas W. Brown, Patrick W. Kalgren, Carl S. Byington, Michael J. Roemer. Electronic prognostics - A case study using global positioning system (GPS)
1882 -- 1888Richard Heine, Donald Barker. Simplified terrain identification and component fatigue damage estimation model for use in a health and usage monitoring system
1889 -- 1901Peter A. Sandborn, Chris Wilkinson. A maintenance planning and business case development model for the application of prognostics and health management (PHM) to electronic systems
1902 -- 1906Douglas Goodman, James Hofmeister, Justin Judkins. Electronic prognostics for switched mode power supplies
1907 -- 1920Pradeep Lall, Madhura Hande, Chandan Bhat, Nokibul Islam, Jeff Suhling, Jay Lee. Feature extraction and damage-precursors for prognostication of lead-free electronics
1921 -- 1927Vincent Rouet, Frédéric Minault, Guillaume Diancourt, Bruno Foucher. Concept of smart integrated life consumption monitoring system for electronics
1928 -- 1949Yoshikuni Nakadaira, Seyoung Jeong, Jongbo Shim, Jaiseok Seo, Sunhee Min, Taeje Cho, Sayoon Kang, Seyong Oh. Growth of tin whiskers for lead-free plated leadframe packages in high humid environments and during thermal cycling
1950 -- 1957Marina Santo Zarnik, Darko Belavic, Franc Novak. Finite-element model-based fault diagnosis, a case study of a ceramic pressure sensor structure
1958 -- 1966Jinlin Wang. The effects of rheological and wetting properties on underfill filler settling and flow voids in flip chip packages
1967 -- 1968Artur Wymyslowski. Thermal, mechanical and multi-physics simulation and experiments in micro-electronics and micro-systems
1969 -- 1974W. D. van Driel. Facing the challenge of designing for Cu/low-k reliability
1975 -- 1982Olaf van der Sluis, R. A. B. Engelen, Richard B. R. van Silfhout, W. D. van Driel, M. A. J. van Gils. Efficient damage sensitivity analysis of advanced Cu/low-k bond pad structures by means of the area release energy criterion
1983 -- 1988M. van Soestbergen, Leo J. Ernst, Kaspar M. B. Jansen, W. D. van Driel. Measuring the through-plane elastic modulus of thin polymer films in situ
1989 -- 1996Tomasz Falat, Artur Wymyslowski, Jana Kolbe, Kaspar M. B. Jansen, Leo J. Ernst. Influence of matrix viscoelastic properties on thermal conductivity of TCA - Numerical approach
1997 -- 2006Zhiheng Huang, Paul P. Conway, Rachel C. Thomson. Microstructural considerations for ultrafine lead free solder joints
2007 -- 2013G. P. Zhang, C. A. Volkert, R. Schwaiger, R. Mönig, O. Kraft. Fatigue and thermal fatigue damage analysis of thin metal films
2025 -- 2057M. Waleed Shinwari, M. Jamal Deen, Dolf Landheer. Study of the electrolyte-insulator-semiconductor field-effect transistor (EISFET) with applications in biosensor design
2058 -- 2064L. Michalas, M. Exarchos, G. J. Papaioannou, Dimitrios N. Kouvatsos, Apostolos T. Voutsas. An experimental study of the thermally activated processes in polycrystalline silicon thin film transistors
2065 -- 2069Kerem Akarvardar, Abdelkarim Mercha, Eddy Simoen, Vaidyanathan Subramanian, Cor Claeys, Pierre Gentil, Sorin Cristoloveanu. High-temperature performance of state-of-the-art triple-gate transistors
2070 -- 2081C. Petit, D. Zander. Stress induced gate-drain leakage current in ultra-thin gate oxide
2082 -- 2087Z. Tang, P. D. Ye, D. Lee, C. R. Wie. Electrical measurements of voltage stressed Al::2::O::3::/GaAs MOSFET
2088 -- 2093E. Atanassova, D. Spassov, Albena Paskaleva. Metal gates and gate-deposition-induced defects in Ta::2::O::5:: stack capacitors
2094 -- 2099Albena Paskaleva, Martin Lemberger, Anton J. Bauer. Polarity asymmetry of stress and charge trapping behavior of thin Hf- and Zr-silicate layers
2100 -- 2108M. H. Lin, K. P. Chang, K. C. Su, Tahui Wang. Effects of width scaling and layout variation on dual damascene copper interconnect electromigration
2109 -- 2113P. Magnone, C. Pace, F. Crupi, G. Giusi. Low frequency noise in nMOSFETs with subnanometer EOT hafnium-based gate dielectrics
2114 -- 2121Miquel Vellvehí, Xavier Jordà, Philippe Godignon, Carles Ferrer, José Millán. Coupled electro-thermal simulation of a DC/DC converter
2122 -- 2128F. N. Masana. A straightforward analytical method for extraction of semiconductor device transient thermal parameters
2129 -- 2134C. T. Pan, T. T. Wu. Simulation and fabrication of magnetic rotary microgenerator with multipolar Nd/Fe/B magnet
2135 -- 2140Tatsuya Takeshita, Ryuzo Iga, Mitsuo Yamamoto, Mitsuru Sugo. Analysis of interior degradation of a laser waveguide using an OBIC monitor
2141 -- 2146Mayuri Kunchwar, Reza Sedaghat, Vadim Geurkov. Dynamic behavior of resistive faults in nanometer technology
2147 -- 2151Y. Yamada, Y. Takaku, Y. Yagi, I. Nakagawa, T. Atsumi, M. Shirai, I. Ohnuma, K. Ishida. Reliability of wire-bonding and solder joint for high temperature operation of power semiconductor device
2152 -- 2160Daniel T. Rooney, Louis Gullo, Dongji Xie, N. Todd Castello, Dongkai Shanguan. Evaluation of reliability and metallurgical integrity of wire bonds and lead free solder joints on flexible printed circuit board sample modules
2161 -- 2168Weiqun Peng, Eduardo Monlevade, Marco E. Marques. Effect of thermal aging on the interfacial structure of SnAgCu solder joints on Cu
2169 -- 2178Ja-Myeong Koo, Seung-Boo Jung. Effect of displacement rate on ball shear properties for Sn-37Pb and Sn-3.5Ag BGA solder joints during isothermal aging
2179 -- 2187Yi-Shao Lai, Hsiao-Chuan Chang, Chang-Lin Yeh. Evaluation of solder joint strengths under ball impact test
2188 -- 2196Chang-Lin Yeh, Tsung-Yueh Tsai, Yi-Shao Lai. Transient analysis of drop responses of board-level electronic packages using response spectra incorporated with modal superposition
2197 -- 2204Xin Qu, Zhaoyi Chen, Bo Qi, Taekoo Lee, Jiaji Wang. Board level drop test and simulation of leaded and lead-free BGA-PCB assembly
2205 -- 2214A. R. Zbrzezny, Polina Snugovsky, D. D. Perovic. Impact of board and component metallizations on microstructure and reliability of lead-free solder joints
2215 -- 2225Mohammadreza Keimasi, Michael H. Azarian, Michael Pecht. Isothermal aging effects on flex cracking of multilayer ceramic capacitors with standard and flexible terminations
2226 -- 2230Zhanwei Liu, Huimin Xie, Daining Fang, Changzhi Gu, Yonggang Meng, Weining Wang, Yan Fang, Jianmin Miao. Deformation analysis in microstructures and micro-devices
2231 -- 2241Shiang-Yu Teng, Sheng-Jye Hwang. Predicting the process induced warpage of electronic packages using the P-V-T-C equation and the Taguchi method
2242 -- 2248I. Stanimirovic, Milan Jevtic, Z. Stanimirovic. Multiple high-voltage pulse stressing of conventional thick-film resistors
2249 -- 2259Min-Chun Pan, Po-Chun Chen. Drop simulation/experimental verification and shock resistance improvement of TFT-LCD monitors
2260 -- 2274Andy Perkins, Suresh K. Sitaraman. Universal fatigue life prediction equation for ceramic ball grid array (CBGA) packages
2275 -- 2281W. L. Pearn, H. N. Hung, N. F. Peng, C.-Y. Huang. Testing process precision for truncated normal distributions
2282 -- 2283Mile K. Stojcev. Taxonomies for the Development and Verification of Digital Systems, Brian Bailey, Grant Martin, Thomas Anderson (Editors). Springer, New York (2005). 179pp., Hardcover, ISBN: 0-387-24019-5
2284 -- 2286Mile K. Stojcev. William C.Y. Lee, Wireless & Cellular Telecommunications (third ed.), McGraw Hill, New York (2006) ISBN 0-07-143686-3 Hardcover, 822 pp., plus XXIII
2287 -- 2288Mile K. Stojcev. Louis Scheffer, Luciano Lavagno and Grant Martin, Editors, Electronic Design Automation for Integrated Circuits Handbook Vols. I and II, CRC, imprint of Taylor and Francis Group, Boca Raton (2006) ISBN 0-8493-3096-3 Hardcover, 1095 pp., plus XLVIII
2289 -- 2290Mile K. Stojcev. Fast, Efficient and Predictable Memory Access: Optimization Algorithms for Memory Architecture Aware Compilation, Lars Wehmeyer, Peter Marwedel. Springer, Dordercht, The Netherlands (2006). 257pp., Hardcover, plus XI, ISBN: 1-4020-4821-1

Volume 47, Issue 1

1 -- 10Hei Wong, V. Filip, C. K. Wong, P. S. Chung. Silicon integrated photonics begins to revolutionize
11 -- 19Viktor Sverdlov, Hans Kosina, Siegfried Selberherr. Modeling current transport in ultra-scaled field-effect transistors
20 -- 26T. Hattori, H. Nohira, S. Shinagawa, M. Hori, M. Kase, T. Maruizumi. Angle-resolved photoelectron spectroscopy on gate insulators
27 -- 35Ming-Dou Ker, Wei-Jen Chang. Overview on ESD protection design for mixed-voltage I/O interfaces with high-voltage-tolerant power-rail ESD clamp circuits in low-voltage thin-oxide CMOS technology
36 -- 40Sergey Shaimeev, Vladimir Gritsenko, Kaupo Kukli, Hei Wong, Eun-Hong Lee, Chungwoo Kim. Single band electronic conduction in hafnium oxide prepared by atomic layer deposition
41 -- 45C. Leyris, F. Martinez, A. Hoffmann, M. Valenza, J. C. Vildeuil. N-MOSFET oxide trap characterization induced by nitridation process using RTS noise analysis
46 -- 50Y. Fu, H. Wong, J. J. Liou. Characterization and modeling of flicker noise in junction field-effect transistor with source and drain trench isolation
51 -- 58Milan Jevtic, Jovan M. Hadzi-Vukovic. Study of the electrical cycling stressed large area Schottky diodes using I-V and noise measurements
59 -- 64M. A. Belaïd, K. Ketata, M. Gares, K. Mourgues, M. Masmoudi, J. Marcon. Comparative analysis of RF LDMOS capacitance reliability under accelerated ageing tests
65 -- 73Giovanna Sozzi, Roberto Menozzi. A review of the use of electro-thermal simulations for the analysis of heterostructure FETs
74 -- 81Hirotaka Komoda, Chie Moritani, Kazutaka Takahashi, Heiji Watanabe, Kiyoshi Yasutake. Sample tilting technique for preventing electrostatic discharge during high-current FIB gas-assisted etching with XeF::2::
82 -- 87Hongfei Liu, Alin Hou, Hongbo Zhang, Daming Zhang, Maobin Yi. A voltage calibration technique of electro-optic probing for characterization internal to IC s chip
88 -- 92Yuki Fukuda, Michael D. Osterman, Michael G. Pecht. The impact of electrical current, mechanical bending, and thermal annealing on tin whisker growth
93 -- 103J. Varghese, A. Dasgupta. Test methodology for durability estimation of surface mount interconnects under drop testing conditions
104 -- 110Yi-Shao Lai, Tong Hong Wang. Optimal design towards enhancement of board-level thermomechanical reliability of wafer-level chip-scale packages
111 -- 117Yi-Shao Lai, Tong Hong Wang, Han-Hui Tsai, Ming-Hwa R. Jen. Cyclic bending reliability of wafer-level chip-scale packages
118 -- 131J.-G. Lee, K. N. Subramanian. Effects of TMF heating rates on damage accumulation and resultant mechanical behavior of Sn-Ag based solder joints
132 -- 141Stoyan Stoyanov, Robert W. Kay, Chris Bailey, Marc P. Y. Desmulliez. Computational modelling for reliable flip-chip packaging at sub-100mum pitch using isotropic conductive adhesives
142 -- 149Reza Asgary, Karim Mohammadi, Mark Zwolinski. Using neural networks as a fault detection mechanism in MEMS devices
150 -- 154Miro Milanovic, Mitja Truntic, Primoz Slibar, Drago Dolinar. Reconfigurable digital controller for a buck converter based on FPGA
155 -- 156Milorad Tosic. S.V. Nagaraj, Web Caching and its Applications, Kluwer Academic Publishers, Boston/Dordrecht/London, (The Kluwer International Series in Engineering and Computer Science, Vol 772), Hardcover (May 1, 2004), $105.00, pp 236, ISBN 1-4020-8049-2
157 -- 158Mile K. Stojcev. Arithmetic and Logic in Computer Systems, Mi Lu. John Wiley & Sons, Inc., Hoboken, NJ (2004), ISBN: 0-471-46945-9